Shuzo Fujimura

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Device for measuring physical quantity using pulsed laser interfero...
- Patent number 6,168,310
- Issue date Jan 2, 2001
- Fujitsu Limited
- Ryo Kurosaki
- B24 - GRINDING POLISHING
Information Patent Grant
Steam supplying apparatus and method for controlling same
- Patent number 6,115,538
- Issue date Sep 5, 2000
- Fujitsu Limited
- Keisuke Shinagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen plasma downstream treatment equipment and hydrogen plasma...
- Patent number 6,107,215
- Issue date Aug 22, 2000
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device including light etching
- Patent number 6,063,300
- Issue date May 16, 2000
- Fujitsu Limited
- Miki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for fabricating semiconductor device and method for fabri...
- Patent number 6,024,045
- Issue date Feb 15, 2000
- Fujitsu Limited
- Jun Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for hydrogen plasma down-flow processing and apparatus thereof
- Patent number 6,007,671
- Issue date Dec 28, 1999
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of stripping a resist mask
- Patent number 5,998,104
- Issue date Dec 7, 1999
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing organic resist from semiconductor
- Patent number 5,961,775
- Issue date Oct 5, 1999
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for fabricating semiconductor device and method for fabri...
- Patent number 5,919,336
- Issue date Jul 6, 1999
- Fujitsu Limited
- Jun Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing process and apparatus
- Patent number RE36224
- Issue date Jun 8, 1999
- Fujitsu Limited
- Shuzo Fujimura
- 204 - Chemistry: electrical and wave energy
Information Patent Grant
Cleaning of hydrogen plasma down-stream apparatus
- Patent number 5,885,361
- Issue date Mar 23, 1999
- Fujitsu Limited
- Jun Kikuchi
- B08 - CLEANING
Information Patent Grant
Method for controlling apparatus for supplying steam for ashing pro...
- Patent number 5,832,177
- Issue date Nov 3, 1998
- Fujitsu Limited
- Keisuke Shinagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor substrate cleaning method and semiconductor device fa...
- Patent number 5,795,494
- Issue date Aug 18, 1998
- Fujitsu Limited
- Yuka Hayami
- B08 - CLEANING
Information Patent Grant
Method of stripping a resist mask
- Patent number 5,773,201
- Issue date Jun 30, 1998
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for measuring physical quantity, method for fabri...
- Patent number 5,773,316
- Issue date Jun 30, 1998
- Fujitsu Limited
- Ryo Kurosaki
- B24 - GRINDING POLISHING
Information Patent Grant
Silicon oxide film evaluation method
- Patent number 5,595,916
- Issue date Jan 21, 1997
- Fujitsu Limited
- Shuzo Fujimura
- G01 - MEASURING TESTING
Information Patent Grant
Process and apparatus for ashing treatment
- Patent number 5,478,403
- Issue date Dec 26, 1995
- Fujitsu Limited
- Keisuke Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma treating method using hydrogen gas
- Patent number 5,403,436
- Issue date Apr 4, 1995
- Fujitsu Limited
- Shuzo Fujimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing semiconductor integrated circuits and apparatu...
- Patent number 5,397,432
- Issue date Mar 14, 1995
- Fujitsu Limited
- Jun-ichi Konno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing process and apparatus
- Patent number 5,364,519
- Issue date Nov 15, 1994
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing apparatus
- Patent number 5,078,824
- Issue date Jan 7, 1992
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ashing method for removing an organic film on a substance of a semi...
- Patent number 5,057,187
- Issue date Oct 15, 1991
- Fujitsu Ltd.
- Keisuke Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for manufacturing semiconductor device involving dry etchin...
- Patent number 5,034,090
- Issue date Jul 23, 1991
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 5,024,748
- Issue date Jun 18, 1991
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Downstream microwave plasma processing apparatus having an improved...
- Patent number 4,987,284
- Issue date Jan 22, 1991
- Fujitsu Limited
- Shuzo Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing for stripping organic material
- Patent number 4,983,254
- Issue date Jan 8, 1991
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing a layer of organic matter
- Patent number 4,980,022
- Issue date Dec 25, 1990
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ashing method for removing an organic film on a substance of a semi...
- Patent number 4,961,820
- Issue date Oct 9, 1990
- Fujitsu Limited
- Keisuke Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing photoresist on a semiconductor wafer
- Patent number 4,938,839
- Issue date Jul 3, 1990
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ashing process of a resist layer formed on a substrate under fabric...
- Patent number 4,861,424
- Issue date Aug 29, 1989
- Fujitsu Limited
- Shuzo Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shuzo Fujimura

Person

Patents Grantslast 30 patents

Device for measuring physical quantity using pulsed laser interfero...

Steam supplying apparatus and method for controlling same

Hydrogen plasma downstream treatment equipment and hydrogen plasma...

Method of manufacturing semiconductor device including light etching

Apparatus for fabricating semiconductor device and method for fabri...

Method for hydrogen plasma down-flow processing and apparatus thereof

Method of stripping a resist mask

Apparatus for removing organic resist from semiconductor

Apparatus for fabricating semiconductor device and method for fabri...

Microwave plasma processing process and apparatus

Cleaning of hydrogen plasma down-stream apparatus

Method for controlling apparatus for supplying steam for ashing pro...

Semiconductor substrate cleaning method and semiconductor device fa...

Method of stripping a resist mask

Method and device for measuring physical quantity, method for fabri...

Silicon oxide film evaluation method

Process and apparatus for ashing treatment

Plasma treating method using hydrogen gas

Method for producing semiconductor integrated circuits and apparatu...

Microwave plasma processing process and apparatus

Semiconductor device manufacturing apparatus

Ashing method for removing an organic film on a substance of a semi...

Process for manufacturing semiconductor device involving dry etchin...

Microwave plasma processing apparatus

Downstream microwave plasma processing apparatus having an improved...

Processing for stripping organic material

Method of removing a layer of organic matter

Ashing method for removing an organic film on a substance of a semi...

Method of removing photoresist on a semiconductor wafer

Ashing process of a resist layer formed on a substrate under fabric...