Siamak Salimian

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Seal for an assembly in a vapor deposition chamber
- Patent number D1027120
- Issue date May 14, 2024
- Applied Materials, Inc.
- Yao-Hung Yang
- D23 - Environmental heating and cooling
Information Patent Grant
High throughput and metal contamination control oven for chamber co...
- Patent number 11,898,245
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Chien-Min Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for improving the operation of semiconductor proc...
- Patent number 11,856,706
- Issue date Dec 26, 2023
- Applied Materials, Inc.
- Hsui Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Part-life estimation utilizing feature metrology
- Patent number 11,532,466
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Chien-Min Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inline measurement of process gas dissociation using infrared absor...
- Patent number 11,521,839
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Ramesh Gopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for actively tuning a plasma power source
- Patent number 11,398,369
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reclaiming a seal
- Patent number 11,090,893
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Shagun P. Maheshwari
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Protective yttria coating for semiconductor equipment parts
- Patent number 11,047,035
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Ramesh Gopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for improved transient phase deposition
- Patent number 7,722,737
- Issue date May 25, 2010
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-frequency bias power in HDP-CVD processes
- Patent number 7,571,698
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 7,147,719
- Issue date Dec 12, 2006
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...
- Patent number 6,958,112
- Issue date Oct 25, 2005
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Configurable single substrate wet-dry integrated cluster cleaner
- Patent number 6,899,111
- Issue date May 31, 2005
- Applied Materials, Inc.
- Paul E. Luscher
- B08 - CLEANING
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,863,835
- Issue date Mar 8, 2005
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature controlled dome-coil system for high power inductively...
- Patent number 6,822,185
- Issue date Nov 23, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,797,639
- Issue date Sep 28, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,773,544
- Issue date Aug 10, 2004
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,716,302
- Issue date Apr 6, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,647,918
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable single substrate wet-dry integrated cluster cleaner
- Patent number 6,589,361
- Issue date Jul 8, 2003
- Applied Materials Inc.
- Paul E Luscher
- B08 - CLEANING
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,575,622
- Issue date Jun 10, 2003
- Applied Materials Inc.
- Hamid Norrbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor cooled ceiling with an array of thermally isolated p...
- Patent number 6,432,259
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMP...
- Patent number 6,373,679
- Issue date Apr 16, 2002
- Cypress Semiconductor Corp.
- Jianmin Qiao
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,353,210
- Issue date Mar 5, 2002
- Applied Materials Inc.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Grant
Chuck having pressurized zones of heat transfer gas
- Patent number 6,320,736
- Issue date Nov 20, 2001
- Applied Materials, Inc.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for minimizing plasma destabilization within a...
- Patent number 6,304,424
- Issue date Oct 16, 2001
- Applied Materials Inc.
- Richard Mett
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Substrate support for plasma processing
- Patent number 6,273,958
- Issue date Aug 14, 2001
- Applied Materials, Inc.
- Shamouil Shamouilian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for supplying a chucking voltage to an electro...
- Patent number 6,198,616
- Issue date Mar 6, 2001
- Applied Materials, Inc.
- Mahmoud Dahimene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,192,827
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film processing plasma reactor chamber with radially upward sl...
- Patent number 6,076,482
- Issue date Jun 20, 2000
- Applied Materials, Inc.
- Ji Ding
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Elastomer Bonded Door For Vacuum Systems
- Publication number 20240353010
- Publication date Oct 24, 2024
- Chih-Yang CHANG
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
METHODS FOR ELECTROSTATIC CHUCK CERAMIC SURFACING
- Publication number 20230238267
- Publication date Jul 27, 2023
- Ramesh GOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS...
- Publication number 20230051800
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- YIKAI CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH THROUGHPUT AND METAL CONTAMINATION CONTROL OVEN FOR CHAMBER CO...
- Publication number 20220275505
- Publication date Sep 1, 2022
- Chien-Min LIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PART-LIFE ESTIMATION UTILIZING FEATURE METROLOGY
- Publication number 20220020565
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Chien-Min LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR IMPROVING THE OPERATION OF SEMICONDUCTOR PROC...
- Publication number 20210168979
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Hsui YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INLINE MEASUREMENT OF PROCESS GAS DISSOCIATION USING INFRARED ABSOR...
- Publication number 20210159060
- Publication date May 27, 2021
- Applied Materials, Inc.
- Ramesh GOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR ACTIVELY TUNING A PLASMA POWER SOURCE
- Publication number 20200411288
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF RECLAIMING A SEAL
- Publication number 20200079044
- Publication date Mar 12, 2020
- Applied Materials, Inc.
- Shagun P. MAHESHWARI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PROTECTIVE YTTRIA COATING FOR SEMICONDUCTOR EQUIPMENT PARTS
- Publication number 20190264314
- Publication date Aug 29, 2019
- Ramesh Gopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES
- Publication number 20090263594
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Distribution System for Improved Transient Phase Deposition
- Publication number 20080041821
- Publication date Feb 21, 2008
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER
- Publication number 20070091535
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low-frequency bias power in HDP-CVD processes
- Publication number 20060150913
- Publication date Jul 13, 2006
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas distribution system for improved transient phase deposition
- Publication number 20060113038
- Publication date Jun 1, 2006
- Applied Materials, Inc.
- Sudhir Gondhalekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20050003675
- Publication date Jan 6, 2005
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...
- Publication number 20040241342
- Publication date Dec 2, 2004
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Double slit-valve doors for plasma processing
- Publication number 20040083978
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled dome-coil system for high power inductively...
- Publication number 20040065645
- Publication date Apr 8, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030037880
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030038111
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable single substrate wet-dry integrated cluster cleaner
- Publication number 20020189638
- Publication date Dec 19, 2002
- Paul E. Luscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Series chamber for substrate processing
- Publication number 20020096114
- Publication date Jul 25, 2002
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Temperature controlled semiconductor processing chamber liner
- Publication number 20020069970
- Publication date Jun 13, 2002
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Configurable single substrate wet-dry integrated cluster cleaner
- Publication number 20020062848
- Publication date May 30, 2002
- Paul E. Luscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of wafer temperature drift in a plasma reactor based upo...
- Publication number 20020048311
- Publication date Apr 25, 2002
- APPLIED MATERIALS, INC.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032590
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032591
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT FOR PLASMA PROCESSING
- Publication number 20010003298
- Publication date Jun 14, 2001
- SHAMOUIL SHAMOUILIAN
- H01 - BASIC ELECTRIC ELEMENTS

Siamak Salimian

Person

Patents Grantslast 30 patents

Seal for an assembly in a vapor deposition chamber

High throughput and metal contamination control oven for chamber co...

Method and system for improving the operation of semiconductor proc...

Part-life estimation utilizing feature metrology

Inline measurement of process gas dissociation using infrared absor...

Method and apparatus for actively tuning a plasma power source

Method of reclaiming a seal

Protective yttria coating for semiconductor equipment parts

Gas distribution system for improved transient phase deposition

Low-frequency bias power in HDP-CVD processes

Double slit-valve doors for plasma processing

Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...

Configurable single substrate wet-dry integrated cluster cleaner

Magnetic barrier for plasma in chamber exhaust

Temperature controlled dome-coil system for high power inductively...

Dielectric etch chamber with expanded process window

Magnetic barrier for plasma in chamber exhaust

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Configurable single substrate wet-dry integrated cluster cleaner

Correction of wafer temperature drift in a plasma reactor based upo...

Plasma reactor cooled ceiling with an array of thermally isolated p...

ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMP...

Correction of wafer temperature drift in a plasma reactor based upo...

Chuck having pressurized zones of heat transfer gas

Method and apparatus for minimizing plasma destabilization within a...

Substrate support for plasma processing

Method and apparatus for supplying a chucking voltage to an electro...

Double slit-valve doors for plasma processing

Thin film processing plasma reactor chamber with radially upward sl...

Patents Applicationslast 30 patents

Elastomer Bonded Door For Vacuum Systems

METHODS FOR ELECTROSTATIC CHUCK CERAMIC SURFACING

METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS...

HIGH THROUGHPUT AND METAL CONTAMINATION CONTROL OVEN FOR CHAMBER CO...

PART-LIFE ESTIMATION UTILIZING FEATURE METROLOGY

METHOD AND SYSTEM FOR IMPROVING THE OPERATION OF SEMICONDUCTOR PROC...

INLINE MEASUREMENT OF PROCESS GAS DISSOCIATION USING INFRARED ABSOR...

METHOD AND APPARATUS FOR ACTIVELY TUNING A PLASMA POWER SOURCE

METHOD OF RECLAIMING A SEAL

PROTECTIVE YTTRIA COATING FOR SEMICONDUCTOR EQUIPMENT PARTS

LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES

Gas Distribution System for Improved Transient Phase Deposition

TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER

Low-frequency bias power in HDP-CVD processes

Gas distribution system for improved transient phase deposition

Dielectric etch chamber with expanded process window

Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...

Double slit-valve doors for plasma processing

Temperature controlled dome-coil system for high power inductively...

Dielectric etch chamber with expanded process window

Dielectric etch chamber with expanded process window

Configurable single substrate wet-dry integrated cluster cleaner

Series chamber for substrate processing

Temperature controlled semiconductor processing chamber liner

Configurable single substrate wet-dry integrated cluster cleaner

Correction of wafer temperature drift in a plasma reactor based upo...

Magnetic barrier for plasma in chamber exhaust

Magnetic barrier for plasma in chamber exhaust

SUBSTRATE SUPPORT FOR PLASMA PROCESSING