-
-
-
-
-
-
Dry-developable positive resist
-
Patent number 5,733,706
-
Issue date Mar 31, 1998
-
Siemens Aktiengesellschaft
-
Recai Sezi
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Mixed polymers
-
Patent number 5,703,186
-
Issue date Dec 30, 1997
-
Siemens Aktiengesellschaft
-
Recai Sezi
-
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
-
-
Copolymers
-
Patent number 5,616,667
-
Issue date Apr 1, 1997
-
Siemens Aktiengesellschaft
-
Recai Sezi
-
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
-
-
-
-
-
-
-
-
-
Photostructuring process
-
Patent number 5,250,375
-
Issue date Oct 5, 1993
-
Siemens Aktiengesellschaft
-
Michael Sebald
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
Photostructuring method
-
Patent number 5,234,794
-
Issue date Aug 10, 1993
-
Siemens Aktiengesellschaft
-
Michael Sebald
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
Photocell
-
Patent number 5,206,534
-
Issue date Apr 27, 1993
-
Siemens Aktiengesellschaft
-
Siegfried Birkle
-
H01 - BASIC ELECTRIC ELEMENTS
-
-
-
-
-
-