Takahisa Otsuka

Person

Koshi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 11,862,486
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,769,661
- Issue date Sep 26, 2023
- Tokyo Electron Limited
- Hirofumi Takeguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,712,710
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Fumihiro Kamimura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 11,024,518
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 10,770,316
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Kazuki Kosai
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,685,858
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Hiroyuki Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing method, substrate liquid processing app...
- Patent number 9,865,483
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Hiroyuki Higashi
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus having switchable nozzles
- Patent number 9,108,228
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Takahisa Otsuka
- B08 - CLEANING
Information Patent Grant
Coating treatment apparatus, coating treatment method, and non-tran...
- Patent number 8,871,301
- Issue date Oct 28, 2014
- Tokyo Electron Limited
- Kouzou Tachibana
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method, substrate processing system, and compu...
- Patent number 8,587,763
- Issue date Nov 19, 2013
- Tokyo Elctron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist film forming method
- Patent number 8,247,164
- Issue date Aug 21, 2012
- Tokyo Electron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method
- Patent number 8,181,356
- Issue date May 22, 2012
- Tokyo Electron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system, substrate treatment method, and compute...
- Patent number 8,168,378
- Issue date May 1, 2012
- Tokyo Electron Limited
- Takahisa Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing system, and compu...
- Patent number 7,977,038
- Issue date Jul 12, 2011
- Tokyo Electron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, computer storage medium and substrate...
- Patent number 7,938,587
- Issue date May 10, 2011
- Tokyo Electron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 7,877,895
- Issue date Feb 1, 2011
- Tokyo Electron Limited
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system, substrate treatment method, and compute...
- Patent number 7,816,276
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Takahisa Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus, heat treatment method, and computer reada...
- Patent number 7,628,612
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Takahisa Otsuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20230264233
- Publication date Aug 24, 2023
- Tokyo Electron Limited
- Kazuki KOSAI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200381245
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Hirofumi Takeguchi
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20200365424
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200070196
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20200038897
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190006206
- Publication date Jan 3, 2019
- TOKYO ELECTRON LIMITED
- Hiroyuki Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20180337067
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180221925
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF PROCESSING CH...
- Publication number 20170084470
- Publication date Mar 23, 2017
- TOKYO ELECTRON LIMITED
- Hiroyuki Suzuki
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...
- Publication number 20160093517
- Publication date Mar 31, 2016
- TOKYO ELECTRON LIMITED
- Hiroyuki Higashi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20140137893
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...
- Publication number 20130228200
- Publication date Sep 5, 2013
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- B08 - CLEANING
Information Patent Application
COATING TREATMENT APPARATUS, COATING TREATMENT METHOD, AND NON-TRAN...
- Publication number 20120189773
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Kouzou TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...
- Publication number 20110237088
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20110086514
- Publication date Apr 14, 2011
- TOKYO ELECTRON LIMITED
- Takahisa OTSUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT METHOD, AND COMPUTE...
- Publication number 20100323306
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Takahisa OTSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST FILM FORMING METHOD
- Publication number 20100297552
- Publication date Nov 25, 2010
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE...
- Publication number 20090225285
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...
- Publication number 20080153181
- Publication date Jun 26, 2008
- TOKYO ELECTRON LIMITED
- Takahisa Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20070298188
- Publication date Dec 27, 2007
- TOKYO ELECTRON LIMITED
- Takahisa OTSUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT METHOD, AND COMPUTE...
- Publication number 20070190246
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Takahisa OTSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND COMPUTER READA...
- Publication number 20070181557
- Publication date Aug 9, 2007
- TOKYO ELECTRON LIMITED
- Takahisa OTSUKA
- H01 - BASIC ELECTRIC ELEMENTS

Takahisa Otsuka

Person

Patents Grantslast 30 patents

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus, substrate processing method and rec...

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing method and substrate processing apparatus

Substrate liquid processing method, substrate liquid processing app...

Liquid processing apparatus having switchable nozzles

Coating treatment apparatus, coating treatment method, and non-tran...

Substrate processing method, substrate processing system, and compu...

Resist film forming method

Substrate processing method

Substrate treatment system, substrate treatment method, and compute...

Substrate processing method, substrate processing system, and compu...

Substrate processing method, computer storage medium and substrate...

Substrate processing apparatus

Substrate treatment system, substrate treatment method, and compute...

Heat treatment apparatus, heat treatment method, and computer reada...

Patents Applicationslast 30 patents

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

Substrate Processing Apparatus and Substrate Processing Method

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF PROCESSING CH...

SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER...

COATING TREATMENT APPARATUS, COATING TREATMENT METHOD, AND NON-TRAN...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...

SUBSTRATE PROCESSING METHOD AND APPARATUS

SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT METHOD, AND COMPUTE...

RESIST FILM FORMING METHOD

SUBSTRATE PROCESSING METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...

SUBSTRATE PROCESSING METHOD AND APPARATUS

SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT METHOD, AND COMPUTE...

HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND COMPUTER READA...