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Tetsunori Kaji
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Kudamatsu, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Emission spectroscopic processing apparatus and plasma processing m...
Patent number
7,455,790
Issue date
Nov 25, 2008
Hitachi, Ltd.
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Grant
Film thickness measuring method of member to be processed using emi...
Patent number
7,411,684
Issue date
Aug 12, 2008
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Film thickness measuring method of member to be processed using emi...
Patent number
7,230,720
Issue date
Jun 12, 2007
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Method and apparatus for determining endpoint of semiconductor elem...
Patent number
7,126,697
Issue date
Oct 24, 2006
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Plasma processing apparatus and a plasma processing method
Patent number
7,048,869
Issue date
May 23, 2006
Hitachi, Ltd.
Kazue Takahashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for determining endpoint of semiconductor elem...
Patent number
7,009,715
Issue date
Mar 7, 2006
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Method and apparatus for transferring substrate
Patent number
6,979,168
Issue date
Dec 27, 2005
Hitachi High-Technologies Corporation
Yoichi Uchimaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Film thickness measuring method of member to be processed using emi...
Patent number
6,961,131
Issue date
Nov 1, 2005
OpNext Japan, Inc.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Method and apparatus for determining endpoint of semiconductor elem...
Patent number
6,903,826
Issue date
Jun 7, 2005
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,902,683
Issue date
Jun 7, 2005
Hitachi, Ltd.
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing method using spectroscopic processing unit
Patent number
6,890,771
Issue date
May 10, 2005
Hitachi, Ltd.
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Grant
Plasma etching apparatus and plasma etching method
Patent number
6,815,365
Issue date
Nov 9, 2004
Hitachi, Ltd.
Toshio Masuda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Film thickness measuring method of member to be processed using emi...
Patent number
6,815,228
Issue date
Nov 9, 2004
Hitachi, Ltd.
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Grant
System for producing wafers
Patent number
6,758,647
Issue date
Jul 6, 2004
Hitachi High-Technologies Corporation
Tetsunori Kaji
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information
Patent Grant
Emission spectroscopic processing apparatus
Patent number
6,716,300
Issue date
Apr 6, 2004
Hitachi, Ltd.
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Grant
Etching end point judging method, etching end point judging device,...
Patent number
6,596,551
Issue date
Jul 22, 2003
Hitachi, Ltd.
Tatehito Usui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,422,172
Issue date
Jul 23, 2002
Hitachi, Ltd.
Jyunichi Tanaka
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing system and plasma processing method
Patent number
6,245,190
Issue date
Jun 12, 2001
Hitachi, Ltd.
Toshio Masuda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,197,151
Issue date
Mar 6, 2001
Hitachi, Ltd.
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for plasma processing apparatus
Patent number
6,172,321
Issue date
Jan 9, 2001
Hitachi, Ltd.
Ken Yoshioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,171,438
Issue date
Jan 9, 2001
Hitachi, Ltd.
Toshio Masuda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,129,806
Issue date
Oct 10, 2000
Hitachi, Ltd.
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus having insulator disposed on inner surf...
Patent number
6,046,425
Issue date
Apr 4, 2000
Hitachi, Ltd.
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for plasma processing apparatus
Patent number
6,034,346
Issue date
Mar 7, 2000
Hitachi, Ltd.
Ken Yoshioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method in which a...
Patent number
5,895,586
Issue date
Apr 20, 1999
Hitachi, Ltd.
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Microwave plasma processing method and apparatus
Patent number
5,804,033
Issue date
Sep 8, 1998
Hitachi, Ltd.
Saburo Kanai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ion implanter
Patent number
5,729,027
Issue date
Mar 17, 1998
Hitachi, Ltd.
Katsumi Tokiguchi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma generator with mode restricting means
Patent number
5,646,489
Issue date
Jul 8, 1997
Hitachi, Ltd.
Yutaka Kakehi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Vacuum processing apparatus
Patent number
5,607,510
Issue date
Mar 4, 1997
Hitachi, Ltd.
Akitaka Makino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma generating method and apparatus and plasma processing method...
Patent number
5,580,420
Issue date
Dec 3, 1996
Hitachi, Ltd.
Katsuya Watanabe
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Plasma processing apparatus and a plasma processing method
Publication number
20090008363
Publication date
Jan 8, 2009
Kazue Takahashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM THICKNESS MEASURING METHOD OF MEMBER TO BE PROCESSED USING EMI...
Publication number
20070229845
Publication date
Oct 4, 2007
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Plasma processing apparatus and a plasma processing method
Publication number
20060157449
Publication date
Jul 20, 2006
Kazue Takahashi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and plasma processing method
Publication number
20060144518
Publication date
Jul 6, 2006
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for determining endpoint of semiconductor elem...
Publication number
20060132798
Publication date
Jun 22, 2006
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Film thickness measuring method of member to be processed using emi...
Publication number
20060039008
Publication date
Feb 23, 2006
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Plasma etching apparatus and plasma etching method
Publication number
20050236109
Publication date
Oct 27, 2005
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Emission spectroscopic processing apparatus and plasma processing m...
Publication number
20050155952
Publication date
Jul 21, 2005
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Application
Plasma processing apparatus
Publication number
20050082006
Publication date
Apr 21, 2005
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for determining endpoint of semiconductor elem...
Publication number
20050062982
Publication date
Mar 24, 2005
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Film thickness measuring method of member to be processed using emi...
Publication number
20050018207
Publication date
Jan 27, 2005
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Plasma processing apparatus
Publication number
20040178180
Publication date
Sep 16, 2004
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for forming damascene structure, and damascene...
Publication number
20040166676
Publication date
Aug 26, 2004
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for forming damascene structure, and damascene...
Publication number
20040166445
Publication date
Aug 26, 2004
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
System and method of producing wafer
Publication number
20040146379
Publication date
Jul 29, 2004
Tetsunori Kaji
G05 - CONTROLLING REGULATING
Information
Patent Application
Method and apparatus for forming damascene structure, and damascene...
Publication number
20040053498
Publication date
Mar 18, 2004
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching apparatus
Publication number
20040045675
Publication date
Mar 11, 2004
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing method using spectroscopic processing unit
Publication number
20040045933
Publication date
Mar 11, 2004
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Application
Plasma etching apparatus and plasma etching method
Publication number
20040016508
Publication date
Jan 29, 2004
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching apparatus and plasma etching method
Publication number
20040009617
Publication date
Jan 15, 2004
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching apparatus
Publication number
20030203640
Publication date
Oct 30, 2003
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for transferring substrate
Publication number
20030185655
Publication date
Oct 2, 2003
Yoichi Uchimaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
System and method of producing wafer
Publication number
20030113189
Publication date
Jun 19, 2003
Tetsunori Kaji
G05 - CONTROLLING REGULATING
Information
Patent Application
Emission spectroscopic processing apparatus and plasma processing m...
Publication number
20030098290
Publication date
May 29, 2003
Tetsunori Kaji
G01 - MEASURING TESTING
Information
Patent Application
Method and apparatus for determining endpoint of semiconductor elem...
Publication number
20030043383
Publication date
Mar 6, 2003
Tatehito Usui
G01 - MEASURING TESTING
Information
Patent Application
Etching end point judging device
Publication number
20030036282
Publication date
Feb 20, 2003
Tatehito Usui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching apparatus and plasma etching method
Publication number
20030024646
Publication date
Feb 6, 2003
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and plasma processing method
Publication number
20030010453
Publication date
Jan 16, 2003
Jyunichi Tanaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
Publication number
20020119670
Publication date
Aug 29, 2002
TOSHIO MASUDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma processing apparatus and plasma processing method
Publication number
20020069971
Publication date
Jun 13, 2002
Tetsunori Kaji
H01 - BASIC ELECTRIC ELEMENTS