Tetsuo Asaba

Person

Odawara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of treating active material
- Patent number 6,156,657
- Issue date Dec 5, 2000
- Canon Kabushiki Kaisha
- Hideshi Kuwabara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device applicable for liquid crystal display device,...
- Patent number 6,128,052
- Issue date Oct 3, 2000
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- G02 - OPTICS
Information Patent Grant
Ink jet recording head having an oriented p-n junction diode, and r...
- Patent number 5,975,685
- Issue date Nov 2, 1999
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Manufacturing method of a semiconductor apparatus having an electro...
- Patent number 5,963,812
- Issue date Oct 5, 1999
- Canon Kabushiki Kaisha
- Yuzo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recording head and recording apparatus and method of manufacturing...
- Patent number 5,850,242
- Issue date Dec 15, 1998
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 5,776,255
- Issue date Jul 7, 1998
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making a planar wiring in an insulated groove using alkyl...
- Patent number 5,614,439
- Issue date Mar 25, 1997
- Canon Kabushiki Kaisha
- Fumio Murooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a ROM device having contact holes treated w...
- Patent number 5,580,808
- Issue date Dec 3, 1996
- Canon Kabushiki Kaisha
- Yuzo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming metal pattern including a schottky diode
- Patent number 5,569,614
- Issue date Oct 29, 1996
- Canon Kabushiki Kaisha
- Yuzo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition method for forming a deposited film with...
- Patent number 5,547,708
- Issue date Aug 20, 1996
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of treating active material
- Patent number 5,534,069
- Issue date Jul 9, 1996
- Canon Kabushiki Kaisha
- Hideshi Kuwabara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing titanium silicide containing semiconductors
- Patent number 5,534,453
- Issue date Jul 9, 1996
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a capacitor having contact hole treated with hydr...
- Patent number 5,527,730
- Issue date Jun 18, 1996
- Conon Kabushiki Kaisha
- Yuzo Kayaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition method for forming a deposited film with...
- Patent number 5,383,970
- Issue date Jan 24, 1995
- Canon Kabushiki Kaisha
- Tetsuo Asaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making a semiconductor device with buried electrode
- Patent number 5,364,802
- Issue date Nov 15, 1994
- Canon Kabushiki Kaisha
- Yuzo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with buried electrode
- Patent number 5,306,934
- Issue date Apr 26, 1994
- Canon Kabushiki Kaisha
- Yuzo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS

Tetsuo Asaba

Person

Patents Grantslast 30 patents

Method of treating active material

Semiconductor device applicable for liquid crystal display device,...

Ink jet recording head having an oriented p-n junction diode, and r...

Manufacturing method of a semiconductor apparatus having an electro...

Recording head and recording apparatus and method of manufacturing...

Chemical vapor deposition apparatus

Method of making a planar wiring in an insulated groove using alkyl...

Method of manufacturing a ROM device having contact holes treated w...

Method of forming metal pattern including a schottky diode

Chemical vapor deposition method for forming a deposited film with...

Method of treating active material

Method of manufacturing titanium silicide containing semiconductors

Method of forming a capacitor having contact hole treated with hydr...

Chemical vapor deposition method for forming a deposited film with...

Method of making a semiconductor device with buried electrode

Semiconductor device with buried electrode