Thomas L. Ritzdorf

Person

Kalispell, MT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electrolytic copper process using anion permeable barrier
- Patent number 9,234,293
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Rajesh Baskaran
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrolytic process using cation permeable barrier
- Patent number 8,961,771
- Issue date Feb 24, 2015
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic process using anion permeable barrier
- Patent number 8,852,417
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Rajesh Baskaran
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrolytic process using cation permeable barrier
- Patent number 8,236,159
- Issue date Aug 7, 2012
- Applied Materials Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic copper process using anion permeable barrier
- Patent number 8,123,926
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Rajesh Baskaran
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for low temperature annealing of metallization micro-structu...
- Patent number 7,462,269
- Issue date Dec 9, 2008
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electrochemical processing of microelectr...
- Patent number 7,438,788
- Issue date Oct 21, 2008
- Semitool, Inc.
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods and apparatus for rinsing and drying
- Patent number 7,429,537
- Issue date Sep 30, 2008
- Semitool, Inc.
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Grant
Selective treatment of microelectric workpiece surfaces
- Patent number 7,399,713
- Issue date Jul 15, 2008
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for electrochemically depositing metal on a se...
- Patent number 7,332,066
- Issue date Feb 19, 2008
- Semitool, Inc.
- Linlin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Platinum alloy using electrochemical deposition
- Patent number 7,300,562
- Issue date Nov 27, 2007
- Semitool, Inc.
- Zhongmin Hu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus and methods for electrochemical processing of microelectr...
- Patent number 7,264,698
- Issue date Sep 4, 2007
- Semitool, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for filling recessed micro-structures with metallization in...
- Patent number 7,244,677
- Issue date Jul 17, 2007
- Semitool Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling and/or measuring additive concentration i...
- Patent number 7,229,543
- Issue date Jun 12, 2007
- Semitool, Inc.
- Lyndon W. Graham
- G01 - MEASURING TESTING
Information Patent Grant
Tuning electrodes used in a reactor for electrochemically processin...
- Patent number 7,189,318
- Issue date Mar 13, 2007
- Semitool, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus and method for processing a microelectronic workpiece usi...
- Patent number 7,161,689
- Issue date Jan 9, 2007
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Turning electrodes used in a reactor for electrochemically processi...
- Patent number 7,160,421
- Issue date Jan 9, 2007
- Semitool, Inc.
- Gregory J. Wilson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of submicron metallization using electrochemical deposition...
- Patent number 7,144,805
- Issue date Dec 5, 2006
- Semitool, Inc.
- LinLin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for electrochemically depositing metal on a se...
- Patent number 7,115,196
- Issue date Oct 3, 2006
- Semitool, Inc.
- Linlin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing microelectronic workpieces usi...
- Patent number 7,102,763
- Issue date Sep 5, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning electrodes used in a reactor for electrochemically processin...
- Patent number 7,020,537
- Issue date Mar 28, 2006
- Semitool, Inc.
- Gregory J. Wilson
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and apparatus for low-temperature annealing of metallization...
- Patent number 7,001,471
- Issue date Feb 21, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low temperature annealing of metallization...
- Patent number 6,994,776
- Issue date Feb 7, 2006
- Semitool Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for controlling and/or measuring additive concentration in...
- Patent number RE38931
- Issue date Jan 10, 2006
- Semitool, Inc.
- Lyndon W. Graham
- 205 - Electrolysis: processes, compositions used therein, and methods of prep...
Information Patent Grant
Semiconductor plating system workpiece support having workpiece-eng...
- Patent number 6,936,153
- Issue date Aug 30, 2005
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electroplating system having auxiliary electrode exterior to main r...
- Patent number 6,921,468
- Issue date Jul 26, 2005
- Semitool, Inc.
- Lyndon W. Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing tools, components of processing tools, and method of mak...
- Patent number 6,921,467
- Issue date Jul 26, 2005
- Semitool, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Submicron metallization using electrochemical deposition
- Patent number 6,806,186
- Issue date Oct 19, 2004
- Semitool, Inc.
- Linlin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor plating system workpiece support having workpiece eng...
- Patent number 6,776,892
- Issue date Aug 17, 2004
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for filling recessed micro-structures with metallization in...
- Patent number 6,753,251
- Issue date Jun 22, 2004
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROLYTIC COPPER PROCESS USING ANION PERMEABLE BARRIER
- Publication number 20150083600
- Publication date Mar 26, 2015
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS FOR ELECTROCHEMICAL DEPOSITION OF MULTI-COMPONENT SOLDER US...
- Publication number 20140246324
- Publication date Sep 4, 2014
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC PROCESS USING CATION PERMEABLE BARRIER
- Publication number 20140209472
- Publication date Jul 31, 2014
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC PROCESS USING CATION PERMEABLE BARRIER
- Publication number 20120292194
- Publication date Nov 22, 2012
- Applied Materials Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC COPPER PROCESS USING ANION PERMEABLE BARRIER
- Publication number 20120152751
- Publication date Jun 21, 2012
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and method for electrochemically depositing metal on a se...
- Publication number 20100116671
- Publication date May 13, 2010
- Semitool, Inc.
- Linlin Chen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTR...
- Publication number 20080217165
- Publication date Sep 11, 2008
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSSING OF MICROELECT...
- Publication number 20080217166
- Publication date Sep 11, 2008
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTR...
- Publication number 20080217167
- Publication date Sep 11, 2008
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSIN...
- Publication number 20070221502
- Publication date Sep 27, 2007
- Semitool, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
IN-SITU CLEANING PROCESSES FOR SEMICONDUCTOR ELECTROPLATING ELECTRODES
- Publication number 20070215481
- Publication date Sep 20, 2007
- Lyndon W. Graham
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for filling recessed micro-structures with metallization in...
- Publication number 20070114133
- Publication date May 24, 2007
- Semitool, Inc.
- Thomas Ritzdorf
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Tuning electrodes used in a reactor for electrochemically processin...
- Publication number 20070089991
- Publication date Apr 26, 2007
- Semitool, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electrolytic copper process using anion permeable barrier
- Publication number 20070068820
- Publication date Mar 29, 2007
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Tuning electrodes used in a reactor for electrochemically processin...
- Publication number 20070034516
- Publication date Feb 15, 2007
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Copper electrolytic process using cation permeable barrier
- Publication number 20060260946
- Publication date Nov 23, 2006
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electrolytic process using cation permeable barrier
- Publication number 20060237323
- Publication date Oct 26, 2006
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for filling recessed micro-structures with metallization in...
- Publication number 20060208272
- Publication date Sep 21, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for applying metal features onto barrier layers using ion pe...
- Publication number 20060189129
- Publication date Aug 24, 2006
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electrolytic process using anion permeable barrier
- Publication number 20060163072
- Publication date Jul 27, 2006
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electrolytic process using anion permeable barrier
- Publication number 20060157355
- Publication date Jul 20, 2006
- Semitool, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Methods and apparatus for rinsing and drying
- Publication number 20060070638
- Publication date Apr 6, 2006
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Application
Processing tools, components of processing tools, and method of mak...
- Publication number 20060037855
- Publication date Feb 23, 2006
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Tuning electrodes used in a reactor for electrochemically processin...
- Publication number 20060000716
- Publication date Jan 5, 2006
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and method for electrochemically depositing metal on a se...
- Publication number 20050245083
- Publication date Nov 3, 2005
- Semitool, Inc.
- Linlin Chen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Processes for removing residue from a workpiece
- Publication number 20050233589
- Publication date Oct 20, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective processing of microelectronic workpiece surfaces
- Publication number 20050217707
- Publication date Oct 6, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and methods for electrochemical processing of microelectr...
- Publication number 20050211551
- Publication date Sep 29, 2005
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for processing a microfeature workpiece with m...
- Publication number 20050205111
- Publication date Sep 22, 2005
- Thomas L. Ritzdorf
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and methods for electrochemical processing of microelectr...
- Publication number 20050205409
- Publication date Sep 22, 2005
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Thomas L. Ritzdorf

Person

Patents Grantslast 30 patents

Electrolytic copper process using anion permeable barrier

Electrolytic process using cation permeable barrier

Electrolytic process using anion permeable barrier

Electrolytic process using cation permeable barrier

Electrolytic copper process using anion permeable barrier

Method for low temperature annealing of metallization micro-structu...

Apparatus and methods for electrochemical processing of microelectr...

Methods and apparatus for rinsing and drying

Selective treatment of microelectric workpiece surfaces

Apparatus and method for electrochemically depositing metal on a se...

Platinum alloy using electrochemical deposition

Apparatus and methods for electrochemical processing of microelectr...

Method for filling recessed micro-structures with metallization in...

Apparatus for controlling and/or measuring additive concentration i...

Tuning electrodes used in a reactor for electrochemically processin...

Apparatus and method for processing a microelectronic workpiece usi...

Turning electrodes used in a reactor for electrochemically processi...

Method of submicron metallization using electrochemical deposition...

Apparatus and method for electrochemically depositing metal on a se...

Methods and apparatus for processing microelectronic workpieces usi...

Tuning electrodes used in a reactor for electrochemically processin...

Method and apparatus for low-temperature annealing of metallization...

Method and apparatus for low temperature annealing of metallization...

Methods for controlling and/or measuring additive concentration in...

Semiconductor plating system workpiece support having workpiece-eng...

Electroplating system having auxiliary electrode exterior to main r...

Processing tools, components of processing tools, and method of mak...

Submicron metallization using electrochemical deposition

Semiconductor plating system workpiece support having workpiece eng...

Method for filling recessed micro-structures with metallization in...

Patents Applicationslast 30 patents

ELECTROLYTIC COPPER PROCESS USING ANION PERMEABLE BARRIER

METHODS FOR ELECTROCHEMICAL DEPOSITION OF MULTI-COMPONENT SOLDER US...

ELECTROLYTIC PROCESS USING CATION PERMEABLE BARRIER

ELECTROLYTIC PROCESS USING CATION PERMEABLE BARRIER

ELECTROLYTIC COPPER PROCESS USING ANION PERMEABLE BARRIER

Apparatus and method for electrochemically depositing metal on a se...

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTR...

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSSING OF MICROELECT...

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTR...

TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSIN...

IN-SITU CLEANING PROCESSES FOR SEMICONDUCTOR ELECTROPLATING ELECTRODES

Method for filling recessed micro-structures with metallization in...

Tuning electrodes used in a reactor for electrochemically processin...

Electrolytic copper process using anion permeable barrier

Tuning electrodes used in a reactor for electrochemically processin...

Copper electrolytic process using cation permeable barrier

Electrolytic process using cation permeable barrier

Method for filling recessed micro-structures with metallization in...

Method for applying metal features onto barrier layers using ion pe...

Electrolytic process using anion permeable barrier

Electrolytic process using anion permeable barrier

Methods and apparatus for rinsing and drying

Processing tools, components of processing tools, and method of mak...

Tuning electrodes used in a reactor for electrochemically processin...

Apparatus and method for electrochemically depositing metal on a se...

Processes for removing residue from a workpiece

Selective processing of microelectronic workpiece surfaces

Apparatus and methods for electrochemical processing of microelectr...

Method and apparatus for processing a microfeature workpiece with m...

Apparatus and methods for electrochemical processing of microelectr...