Tong-Jyun Huang

Person

Tainan, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with metal gates
- Patent number 10,643,997
- Issue date May 5, 2020
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 10,121,881
- Issue date Nov 6, 2018
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of patterned structure of semiconductor
- Patent number 10,090,398
- Issue date Oct 2, 2018
- United Microelectronics Corp.
- Rai-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin structure cutting process
- Patent number 9,859,147
- Issue date Jan 2, 2018
- United Microelectronics Corp.
- Tong-Jyun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 9,842,760
- Issue date Dec 12, 2017
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having metal gate structure
- Patent number 9,825,144
- Issue date Nov 21, 2017
- United Microelectronics Corp.
- Shih-Fang Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned structure of a semiconductor device and a manufacturing m...
- Patent number 9,755,048
- Issue date Sep 5, 2017
- United Microelectronics Corp.
- Rai-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 9,754,938
- Issue date Sep 5, 2017
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 9,653,603
- Issue date May 16, 2017
- United Microelectronics Corp.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of decreasing fin bending
- Patent number 9,552,978
- Issue date Jan 24, 2017
- United Microelectronics Corp.
- Tong-Jyun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin structure and fin structure cutting process
- Patent number 9,524,909
- Issue date Dec 20, 2016
- United Microelectronics Corp.
- Tong-Jyun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 9,490,342
- Issue date Nov 8, 2016
- United Microelectronics Corp.
- Chien-Ming Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin shaped structure and method of forming the same
- Patent number 9,466,691
- Issue date Oct 11, 2016
- United Microelectronics Corp.
- I-Ming Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen treatment of replacement work-function metals in CMOS transi...
- Patent number 9,384,962
- Issue date Jul 5, 2016
- United Microelectronics Corp.
- Guang-Yaw Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate transistor
- Patent number 9,196,546
- Issue date Nov 24, 2015
- United Microelectronics Corp.
- Shih-Fang Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor device having metal gate
- Patent number 8,951,855
- Issue date Feb 10, 2015
- United Microelectronics Corp.
- Chien-Ming Lai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ASYMMETRICAL FIN STRUCTURE AND METHOD OF FABRICATING THE SAME
- Publication number 20180108656
- Publication date Apr 19, 2018
- UNITED MICROELECTRONICS CORP.
- Chao-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH METAL GATES
- Publication number 20170338227
- Publication date Nov 23, 2017
- UNITED MICROELECTRONICS CORP.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF PATTERNED STRUCTURE OF SEMICONDUCTOR
- Publication number 20170309727
- Publication date Oct 26, 2017
- UNITED MICROELECTRONICS CORP.
- Rai-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING METAL GATE STRUCTURE
- Publication number 20170309722
- Publication date Oct 26, 2017
- UNITED MICROELECTRONICS CORP.
- Shih-Fang Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20170263732
- Publication date Sep 14, 2017
- UNITED MICROELECTRONICS CORP.
- Li-Wei Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN STRUCTURE CUTTING PROCESS
- Publication number 20170047244
- Publication date Feb 16, 2017
- UNITED MICROELECTRONICS CORP.
- Tong-Jyun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED STRUCTURE OF A SEMICONDUCTOR DEVICE AND A MANUFACTURING M...
- Publication number 20160293726
- Publication date Oct 6, 2016
- UNITED MICROELECTRONICS CORP.
- Rai-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN STRUCTURE AND FIN STRUCTURE CUTTING PROCESS
- Publication number 20160293491
- Publication date Oct 6, 2016
- UNITED MICROELECTRONICS CORP.
- Tong-Jyun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20160276429
- Publication date Sep 22, 2016
- UNITED MICROELECTRONICS CORP.
- I-Ming Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN SHAPED STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20160141387
- Publication date May 19, 2016
- UNITED MICROELECTRONICS CORP.
- I-Ming Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20160035854
- Publication date Feb 4, 2016
- UNITED MICROELECTRONICS CORP.
- Shih-Fang Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE TRANSISTOR AND METHOD FOR FABRICATING THE SAME
- Publication number 20150076623
- Publication date Mar 19, 2015
- UNITED MICROELECTRONICS CORP.
- Shih-Fang Tzou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH OXYGEN-CONTAINING METAL GATES
- Publication number 20140339652
- Publication date Nov 20, 2014
- Guang-Yaw Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE HAVING METAL GATE
- Publication number 20130280900
- Publication date Oct 24, 2013
- United Microelectronics Corp.
- Chien-Ming Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120322218
- Publication date Dec 20, 2012
- United Microelectronics Corp.
- Chien-Ming LAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate and Fabricating Method Thereof
- Publication number 20120256276
- Publication date Oct 11, 2012
- Guang-Yaw Hwang
- H01 - BASIC ELECTRIC ELEMENTS

Tong-Jyun Huang

Person

Patents Grantslast 30 patents

Semiconductor device with metal gates

Semiconductor device and method for fabricating the same

Manufacturing method of patterned structure of semiconductor

Fin structure cutting process

Method for fabricating semiconductor device

Semiconductor device having metal gate structure

Patterned structure of a semiconductor device and a manufacturing m...

Semiconductor device and method of fabricating the same

Semiconductor device and method for fabricating the same

Method of decreasing fin bending

Fin structure and fin structure cutting process

Method for fabricating semiconductor device

Fin shaped structure and method of forming the same

Oxygen treatment of replacement work-function metals in CMOS transi...

Metal gate transistor

Manufacturing method for semiconductor device having metal gate

Patents Applicationslast 30 patents

ASYMMETRICAL FIN STRUCTURE AND METHOD OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE WITH METAL GATES

MANUFACTURING METHOD OF PATTERNED STRUCTURE OF SEMICONDUCTOR

SEMICONDUCTOR DEVICE HAVING METAL GATE STRUCTURE

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

FIN STRUCTURE CUTTING PROCESS

PATTERNED STRUCTURE OF A SEMICONDUCTOR DEVICE AND A MANUFACTURING M...

FIN STRUCTURE AND FIN STRUCTURE CUTTING PROCESS

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

FIN SHAPED STRUCTURE AND METHOD OF FORMING THE SAME

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METAL GATE TRANSISTOR AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE WITH OXYGEN-CONTAINING METAL GATES

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE HAVING METAL GATE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

Metal Gate and Fabricating Method Thereof