Toshihide NABATAME

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Dryness/wetness responsive sensor
- Patent number 11,486,843
- Issue date Nov 1, 2022
- National Institute for Materials Science
- Jin Kawakita
- G01 - MEASURING TESTING
Information Patent Grant
Variable resistance device and method for manufacturing same
- Patent number 10,290,802
- Issue date May 14, 2019
- National Insitute for Materials Science
- Toshihide Nabatame
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dryness/wetness responsive sensor having first and second wires spa...
- Patent number 10,267,756
- Issue date Apr 23, 2019
- National Institute for Materials Science
- Jin Kawakita
- G01 - MEASURING TESTING
Information Patent Grant
Thin-film transistor and method for manufacturing same
- Patent number 9,825,180
- Issue date Nov 21, 2017
- National Institute for Materials Science
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film transistor and method for manufacturing same
- Patent number 9,741,864
- Issue date Aug 22, 2017
- National Institute for Materials Science
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing thickness of interfacial layer, method for form...
- Patent number 8,759,925
- Issue date Jun 24, 2014
- National Institute for Materials Science
- Naoto Umezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing thickness of interfacial layer, method for form...
- Patent number 8,575,038
- Issue date Nov 5, 2013
- National Institute for Materials Science
- Naoto Umezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 8,207,584
- Issue date Jun 26, 2012
- Renesas Electronics Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 8,168,547
- Issue date May 1, 2012
- Renesas Electronics Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,044,452
- Issue date Oct 25, 2011
- Rohm Co., Ltd.
- Tominaga Koji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,820,503
- Issue date Oct 26, 2010
- Renesas Electronics Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method of manufacturing the same, and method...
- Patent number 7,790,627
- Issue date Sep 7, 2010
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metallic compound thin film that contains high-k dielectric metal,...
- Patent number 7,772,678
- Issue date Aug 10, 2010
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,618,855
- Issue date Nov 17, 2009
- Renesas Technology Corp.
- Masaru Kadoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic circuit component
- Patent number 7,586,755
- Issue date Sep 8, 2009
- Hitachi, Ltd.
- Toshiya Satoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,511,338
- Issue date Mar 31, 2009
- Renesas Technology Corp.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a metal oxynitride thin film that includes a...
- Patent number 7,482,234
- Issue date Jan 27, 2009
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal thin film and semiconductor comprising a metal thin film
- Patent number 7,419,920
- Issue date Sep 2, 2008
- Horiba, Ltd.
- Koji Tominaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,397,094
- Issue date Jul 8, 2008
- Renesas Technology Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation apparatus
- Patent number 7,387,686
- Issue date Jun 17, 2008
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, process for producing the same and process fo...
- Patent number 7,372,112
- Issue date May 13, 2008
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 7,323,381
- Issue date Jan 29, 2008
- Renesas Technology Corp.
- Masaru Kadoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film capacitor and electronic circuit component
- Patent number 7,294,905
- Issue date Nov 13, 2007
- Hitachi, Ltd.
- Masahiko Ogino
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Fabricating method of semiconductor integrated circuits
- Patent number 7,259,058
- Issue date Aug 21, 2007
- Renesas Techonology Corp.
- Yasuhiro Shimamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having misfet gate electrodes with and without...
- Patent number 7,202,539
- Issue date Apr 10, 2007
- Renesas Technology Corporation
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming capacitor with ruthenium top and bottom electrode...
- Patent number 7,071,053
- Issue date Jul 4, 2006
- Hitachi, Ltd.
- Toshihide Nabatame
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabrication method for semiconductor integrated devices
- Patent number 6,992,022
- Issue date Jan 31, 2006
- Renesas Technology Corp.
- Yasuhiro Shimamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a ruthenium film for a semiconductor device
- Patent number 6,989,304
- Issue date Jan 24, 2006
- Renesas Technology Corp.
- Yuichi Matsui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ferroelectric capacitor and semiconductor device
- Patent number 6,917,065
- Issue date Jul 12, 2005
- Renesas Technology Corp.
- Tetsuo Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 6,821,845
- Issue date Nov 23, 2004
- Hitachi, Ltd.
- Toshihide Nabatame
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
DRYNESS/WETNESS RESPONSIVE SENSOR
- Publication number 20200249185
- Publication date Aug 6, 2020
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Jin KAWAKITA
- G01 - MEASURING TESTING
Information Patent Application
DRYNESS/WETNESS RESPONSIVE SENSOR HAVING FIRST AND SECOND WIRES SPA...
- Publication number 20190145920
- Publication date May 16, 2019
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Jin KAWAKITA
- G01 - MEASURING TESTING
Information Patent Application
RESISTANCE CHANGE ELEMENT AND METHOD FOR MANUFACTURING SAME
- Publication number 20170346006
- Publication date Nov 30, 2017
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Toshihide NABATAME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-SPEED RESPONSE/HIGH-SENSITIVITY DRYNESS/WETNESS RESPONSIVE SENSOR
- Publication number 20170167995
- Publication date Jun 15, 2017
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Jin KAWAKITA
- G01 - MEASURING TESTING
Information Patent Application
Thin-Film Transistor and Method for Manufacturing Same
- Publication number 20160365455
- Publication date Dec 15, 2016
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
- Publication number 20160118501
- Publication date Apr 28, 2016
- National Institute for Materials Science
- Toshihide NABATAME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME
- Publication number 20160056409
- Publication date Feb 25, 2016
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Toshihide NABATAME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Reducing Thickness of Interfacial Layer, Method for Form...
- Publication number 20140061872
- Publication date Mar 6, 2014
- NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Naoto UMEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Thickness of Interfacial Layer, Method for Form...
- Publication number 20120280372
- Publication date Nov 8, 2012
- Naoto Umezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20100301429
- Publication date Dec 2, 2010
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20100187644
- Publication date Jul 29, 2010
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
- Publication number 20090146216
- Publication date Jun 11, 2009
- RENESAS TECHNOLOGY CORP.
- Toshihide NABATAME
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A METAL OXYNITRIDE THIN FILM THAT INCLUDES A...
- Publication number 20090096067
- Publication date Apr 16, 2009
- Rohm Co., Ltd.
- Kunihiko IWAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20090011608
- Publication date Jan 8, 2009
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20080293229
- Publication date Nov 27, 2008
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
- Publication number 20080283929
- Publication date Nov 20, 2008
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Circuit Component
- Publication number 20080174976
- Publication date Jul 24, 2008
- Hitachi, Ltd
- Toshiya SATOH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Semiconductor device, method of manufacturing the same, and method...
- Publication number 20080166867
- Publication date Jul 10, 2008
- Rohm Co., Ltd.
- Kunihiko Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Forming System And Method For Forming Film
- Publication number 20080026148
- Publication date Jan 31, 2008
- Koji Tominaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20070257320
- Publication date Nov 8, 2007
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device and semiconductor device
- Publication number 20070221970
- Publication date Sep 27, 2007
- RENESAS TECHNOLOGY CORP.
- Masaru Kadoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20070218624
- Publication date Sep 20, 2007
- Kabushiki Kaisha Toshiba
- Hideki Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and semiconductor device manufacturing method
- Publication number 20070210354
- Publication date Sep 13, 2007
- RENESAS TECHNOLOGY CORP.
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20070212829
- Publication date Sep 13, 2007
- Masashi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20070170502
- Publication date Jul 26, 2007
- Tominaga Koji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20070096157
- Publication date May 3, 2007
- Toshihide Nabatame
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20070087537
- Publication date Apr 19, 2007
- Masaru Kadoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming an insulating film in a semiconductor device
- Publication number 20070077776
- Publication date Apr 5, 2007
- Tominaga Koji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming method and fabrication process of semiconductor device
- Publication number 20070054503
- Publication date Mar 8, 2007
- TOKYO ELECTRON LIMITED
- Hiroyuki Takaba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20060278937
- Publication date Dec 14, 2006
- Masaru Kadoshima
- H01 - BASIC ELECTRIC ELEMENTS

Toshihide NABATAME

Person

Patents Grantslast 30 patents

Dryness/wetness responsive sensor

Variable resistance device and method for manufacturing same

Dryness/wetness responsive sensor having first and second wires spa...

Thin-film transistor and method for manufacturing same

Thin-film transistor and method for manufacturing same

Method for reducing thickness of interfacial layer, method for form...

Method for reducing thickness of interfacial layer, method for form...

Semiconductor device and manufacturing method of the same

Manufacturing method of semiconductor device

Semiconductor device and method for manufacturing the same

Semiconductor device and manufacturing method of the same

Semiconductor device, method of manufacturing the same, and method...

Metallic compound thin film that contains high-k dielectric metal,...

Manufacturing method of semiconductor device

Electronic circuit component

Semiconductor device and manufacturing method of the same

Method of fabricating a metal oxynitride thin film that includes a...

Metal thin film and semiconductor comprising a metal thin film

Semiconductor device and manufacturing method thereof

Film formation apparatus

Semiconductor device, process for producing the same and process fo...

Semiconductor device and manufacturing method thereof

Thin film capacitor and electronic circuit component

Fabricating method of semiconductor integrated circuits

Semiconductor device having misfet gate electrodes with and without...

Method of forming capacitor with ruthenium top and bottom electrode...

Fabrication method for semiconductor integrated devices

Method for manufacturing a ruthenium film for a semiconductor device

Ferroelectric capacitor and semiconductor device

Semiconductor device and method for manufacturing the same

Patents Applicationslast 30 patents

DRYNESS/WETNESS RESPONSIVE SENSOR

DRYNESS/WETNESS RESPONSIVE SENSOR HAVING FIRST AND SECOND WIRES SPA...

RESISTANCE CHANGE ELEMENT AND METHOD FOR MANUFACTURING SAME

HIGH-SPEED RESPONSE/HIGH-SENSITIVITY DRYNESS/WETNESS RESPONSIVE SENSOR

Thin-Film Transistor and Method for Manufacturing Same

THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME

ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME

Method for Reducing Thickness of Interfacial Layer, Method for Form...

Method for Reducing Thickness of Interfacial Layer, Method for Form...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

METHOD OF FABRICATING A METAL OXYNITRIDE THIN FILM THAT INCLUDES A...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Semiconductor device and manufacturing method of the same

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

Electronic Circuit Component

Semiconductor device, method of manufacturing the same, and method...

Film Forming System And Method For Forming Film

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Manufacturing method of semiconductor device and semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device and semiconductor device manufacturing method

Method of manufacturing a semiconductor device

Semiconductor device and method for manufacturing the same

Semiconductor device and manufacturing method of the same

Manufacturing method of semiconductor device

Method for forming an insulating film in a semiconductor device

Film forming method and fabrication process of semiconductor device

Semiconductor device and manufacturing method of the same