Tsuyoshi Mizuno

Person

Koshi City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, liquid processing method, and stora...
- Patent number 10,643,835
- Issue date May 5, 2020
- Tokyo Electron Limited
- Akira Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid processing apparatus
- Patent number 9,252,009
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 8,864,933
- Issue date Oct 21, 2014
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing method, recording medium having recorded program...
- Patent number 8,815,112
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Tsuyoshi Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid processing apparatus for substrate and liquid processing method
- Patent number 8,684,014
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,192,796
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Hiroshi Shinya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 7,968,468
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming thin film and film-forming device
- Patent number 7,926,444
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and program
- Patent number 7,910,157
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,757,626
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Hiroshi Shinya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for forming thin film and film-forming device
- Patent number 7,757,625
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization apparatus
- Patent number 7,416,474
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Shouichi Terada
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing method
- Patent number 6,878,401
- Issue date Apr 12, 2005
- Tokyo Electron Limited
- Kazuhiro Nishijima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORA...
- Publication number 20170287699
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Akira Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, DEPOSIT REMOVING METHOD OF SUBSTRAT...
- Publication number 20150323250
- Publication date Nov 12, 2015
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140251539
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20130269737
- Publication date Oct 17, 2013
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Method, Recording Medium Having Recorded Program...
- Publication number 20120067846
- Publication date Mar 22, 2012
- Tsuyoshi Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE LIQUID-PROCESSING METHOD, SUBSTRATE LIQUID-PROCESSING APP...
- Publication number 20110062114
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Tsuyoshi MIZUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20110030897
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Shouichi TERADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS FOR SUBSTRATE AND LIQUID PROCESSING METHOD
- Publication number 20110030737
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Yoshifumi AMANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20100221436
- Publication date Sep 2, 2010
- TOKYO ELECTRON LIMITED
- Hiroshi Shinya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20080008835
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLANARIZATION APPARATUS
- Publication number 20070224918
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PROGRAM
- Publication number 20070150112
- Publication date Jun 28, 2007
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming thin film and film-forming device
- Publication number 20070116881
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming thin film and film-forming device
- Publication number 20070098901
- Publication date May 3, 2007
- TOKYO ELECTRON LIMITED
- Shouichi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20070048449
- Publication date Mar 1, 2007
- TOKYO ELECTRON LIMITED
- Hiroshi Shinya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method
- Publication number 20030059534
- Publication date Mar 27, 2003
- TOKYO ELECTRON LIMITED
- Kazuhiro Nishijima
- H01 - BASIC ELECTRIC ELEMENTS

Tsuyoshi Mizuno

Person

Patents Grantslast 30 patents

Substrate processing apparatus, liquid processing method, and stora...

Liquid processing apparatus

Substrate treatment apparatus and substrate treatment method

Liquid processing method, recording medium having recorded program...

Liquid processing apparatus for substrate and liquid processing method

Substrate processing apparatus and substrate processing method

Substrate treatment apparatus and substrate treatment method

Method for forming thin film and film-forming device

Substrate processing method and program

Substrate processing apparatus and substrate processing method

Method for forming thin film and film-forming device

Planarization apparatus

Substrate processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORA...

SUBSTRATE PROCESSING APPARATUS, DEPOSIT REMOVING METHOD OF SUBSTRAT...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LIQUID PROCESSING APPARATUS

Liquid Processing Method, Recording Medium Having Recorded Program...

SUBSTRATE LIQUID-PROCESSING METHOD, SUBSTRATE LIQUID-PROCESSING APP...

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

LIQUID PROCESSING APPARATUS FOR SUBSTRATE AND LIQUID PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

PLANARIZATION APPARATUS

SUBSTRATE PROCESSING METHOD AND PROGRAM

Method for forming thin film and film-forming device

Method for forming thin film and film-forming device

Substrate processing apparatus and substrate processing method

Substrate processing method