Vahid Vahedi

Person

Albany, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System implementing machine learning in complex multivariate wafer...
- Patent number 10,615,009
- Issue date Apr 7, 2020
- Lam Research Corporation
- Joydeep Guha
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,585,347
- Issue date Mar 10, 2020
- Lam Research Corporation
- Saravanapriyan Sriraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable multi-zone gas injection system
- Patent number 10,403,475
- Issue date Sep 3, 2019
- Lam Research Corporation
- David J. Cooperberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High aspect ratio etch of oxide metal oxide metal stack
- Patent number 10,242,883
- Issue date Mar 26, 2019
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 10,224,221
- Issue date Mar 5, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,197,908
- Issue date Feb 5, 2019
- Lam Research Corporation
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adjusting substrate temperature to improve CD uniformity
- Patent number 10,056,225
- Issue date Aug 21, 2018
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and process of implementing machine learning in complex mult...
- Patent number 9,972,478
- Issue date May 15, 2018
- Lam Research Corporation
- Joydeep Guha
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Equipment front end module for transferring wafers and method of tr...
- Patent number 9,818,633
- Issue date Nov 14, 2017
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with combination mask
- Patent number 9,659,783
- Issue date May 23, 2017
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 9,245,761
- Issue date Jan 26, 2016
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with combination mask
- Patent number 9,018,103
- Issue date Apr 28, 2015
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting substrate temperature to improve CD uniformity
- Patent number 8,642,480
- Issue date Feb 4, 2014
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of halogen removal
- Patent number 8,525,139
- Issue date Sep 3, 2013
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge gas injection for critical dimension uniformity improvement
- Patent number 7,932,181
- Issue date Apr 26, 2011
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,682,980
- Issue date Mar 23, 2010
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for tuning a set of plasma processing steps
- Patent number 7,578,945
- Issue date Aug 25, 2009
- Lam Research Corporation
- Vahid Vahedi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for planarization etch with in-situ monitoring by interferom...
- Patent number 7,204,934
- Issue date Apr 17, 2007
- Lam Research Corporation
- Linda Braly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to calibrate a semi-empirical process simulator
- Patent number RE39534
- Issue date Mar 27, 2007
- Lam Research Corporation
- David Cooperberg
- 700 - Data processing: generic control systems or specific applications
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,186,661
- Issue date Mar 6, 2007
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for tuning a set of plasma processing steps
- Patent number 7,138,067
- Issue date Nov 21, 2006
- Lam Research Corporation
- Vahid Vahedi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Enhanced process and profile simulator algorithms
- Patent number 7,139,632
- Issue date Nov 21, 2006
- Lam Research Corporation
- David Cooperberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for controlling and reducing profile variation in photoresi...
- Patent number 7,018,780
- Issue date Mar 28, 2006
- Lam Research Corporation
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ cleaning of a polymer coated plasma processing chamber
- Patent number 6,994,769
- Issue date Feb 7, 2006
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable temperature processes for tunable electrostatic chuck
- Patent number 6,921,724
- Issue date Jul 26, 2005
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor with electrode simultaneously responsive to plural...
- Patent number 6,841,943
- Issue date Jan 11, 2005
- LAM Research Corp.
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced process and profile simulator algorithms
- Patent number 6,804,572
- Issue date Oct 12, 2004
- Lam Research Corporation
- David Cooperberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ cleaning of a polymer coated plasma processing chamber
- Patent number 6,776,851
- Issue date Aug 17, 2004
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for reducing profile variation in photoresist trimming
- Patent number 6,653,058
- Issue date Nov 25, 2003
- Lam Research Corporation
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for scaling processes between different etching chambers and...
- Patent number 6,618,638
- Issue date Sep 9, 2003
- Lam Research Corporation
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20190250501
- Publication date Aug 15, 2019
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK
- Publication number 20180374712
- Publication date Dec 27, 2018
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System Implementing Machine Learning in Complex Multivariate Wafer...
- Publication number 20180247798
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Joydeep Guha
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method and Process of Implementing Machine Learning in Complex Mult...
- Publication number 20180082826
- Publication date Mar 22, 2018
- LAM RESEARCH CORPORATION
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20170363950
- Publication date Dec 21, 2017
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160203990
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160181130
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EQUIPMENT FRONT END MODULE FOR TRANSFERRING WAFERS AND METHOD OF TR...
- Publication number 20160111309
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE MULTI-ZONE GAS INJECTION SYSTEM
- Publication number 20150235811
- Publication date Aug 20, 2015
- LAM RESEARCH CORPORATION
- David J. Cooperberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO ETCH WITH COMBINATION MASK
- Publication number 20150200106
- Publication date Jul 16, 2015
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO ETCH WITH COMBINATION MASK
- Publication number 20150087154
- Publication date Mar 26, 2015
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302681
- Publication date Oct 9, 2014
- LAM RESEARCH CORPORATION
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302680
- Publication date Oct 9, 2014
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING SUBSTRATE TEMPERATURE TO IMPROVE CD UNIFORMITY
- Publication number 20140110060
- Publication date Apr 24, 2014
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTING SUBSTRATE TEMPERATURE TO IMPROVE CD UNIFORMITY
- Publication number 20110143462
- Publication date Jun 16, 2011
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS OF HALOGEN REMOVAL
- Publication number 20110097902
- Publication date Apr 28, 2011
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE MULTI-ZONE GAS INJECTION SYSTEM
- Publication number 20100041238
- Publication date Feb 18, 2010
- LAM RESEARCH CORPORATION
- David J. Cooperberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENTS FOR USE IN A PLASMA CHAMBER HAVING REDUCED PARTICLE GENE...
- Publication number 20090261065
- Publication date Oct 22, 2009
- LAM RESEARCH CORPORATION
- HARMEET SINGH
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Edge gas injection for critical dimension uniformity improvement
- Publication number 20070293043
- Publication date Dec 20, 2007
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070119545
- Publication date May 31, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070117399
- Publication date May 24, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for tuning a set of plasma processing steps
- Publication number 20070034604
- Publication date Feb 15, 2007
- Lam Research Corporation
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for tuning a set of plasma processing steps
- Publication number 20060065628
- Publication date Mar 30, 2006
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced process and profile simulator algorithms
- Publication number 20050278057
- Publication date Dec 15, 2005
- David Cooperberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ cleaning of a polymer coated plasma processing chamber
- Publication number 20040231800
- Publication date Nov 25, 2004
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to improve profile control and n/p loading in dual doped gat...
- Publication number 20040175950
- Publication date Sep 9, 2004
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor with electrode simultaneously responsive to plural...
- Publication number 20040000875
- Publication date Jan 1, 2004
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable temperature processes for tunable electrostatic chuck
- Publication number 20030186545
- Publication date Oct 2, 2003
- Lam Research Corporation, a Delaware Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for controlling and reducing profile variation in photoresi...
- Publication number 20030148224
- Publication date Aug 7, 2003
- LAM RESEARCH CORPORATION
- Vahid Vahedi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Tunable multi-zone gas injection system
- Publication number 20030070620
- Publication date Apr 17, 2003
- David J. Cooperberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Vahid Vahedi

Person

Patents Grantslast 30 patents

System implementing machine learning in complex multivariate wafer...

Photoresist design layout pattern proximity correction through fast...

Tunable multi-zone gas injection system

High aspect ratio etch of oxide metal oxide metal stack

Internal plasma grid for semiconductor fabrication

Photoresist design layout pattern proximity correction through fast...

Adjusting substrate temperature to improve CD uniformity

Method and process of implementing machine learning in complex mult...

Equipment front end module for transferring wafers and method of tr...

High aspect ratio etch with combination mask

Internal plasma grid for semiconductor fabrication

High aspect ratio etch with combination mask

Adjusting substrate temperature to improve CD uniformity

Method and apparatus of halogen removal

Edge gas injection for critical dimension uniformity improvement

Method to improve profile control and N/P loading in dual doped gat...

Method and apparatus for tuning a set of plasma processing steps

Method for planarization etch with in-situ monitoring by interferom...

Method and apparatus to calibrate a semi-empirical process simulator

Method to improve profile control and N/P loading in dual doped gat...

Methods and apparatus for tuning a set of plasma processing steps

Enhanced process and profile simulator algorithms

Methods for controlling and reducing profile variation in photoresi...

In-situ cleaning of a polymer coated plasma processing chamber

Variable temperature processes for tunable electrostatic chuck

Plasma processor with electrode simultaneously responsive to plural...

Enhanced process and profile simulator algorithms

In-situ cleaning of a polymer coated plasma processing chamber

Methods for reducing profile variation in photoresist trimming

Method for scaling processes between different etching chambers and...

Patents Applicationslast 30 patents

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK

System Implementing Machine Learning in Complex Multivariate Wafer...

Method and Process of Implementing Machine Learning in Complex Mult...

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

EQUIPMENT FRONT END MODULE FOR TRANSFERRING WAFERS AND METHOD OF TR...

TUNABLE MULTI-ZONE GAS INJECTION SYSTEM

HIGH ASPECT RATIO ETCH WITH COMBINATION MASK

HIGH ASPECT RATIO ETCH WITH COMBINATION MASK

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

ADJUSTING SUBSTRATE TEMPERATURE TO IMPROVE CD UNIFORMITY

ADJUSTING SUBSTRATE TEMPERATURE TO IMPROVE CD UNIFORMITY

METHOD AND APPARATUS OF HALOGEN REMOVAL

TUNABLE MULTI-ZONE GAS INJECTION SYSTEM

COMPONENTS FOR USE IN A PLASMA CHAMBER HAVING REDUCED PARTICLE GENE...

Edge gas injection for critical dimension uniformity improvement

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...

Method and apparatus for tuning a set of plasma processing steps

Methods and apparatus for tuning a set of plasma processing steps

Enhanced process and profile simulator algorithms

In-situ cleaning of a polymer coated plasma processing chamber

Method to improve profile control and n/p loading in dual doped gat...

Plasma processor with electrode simultaneously responsive to plural...

Variable temperature processes for tunable electrostatic chuck

Methods for controlling and reducing profile variation in photoresi...

Tunable multi-zone gas injection system