Vishnubhai V. Patel

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process to form an adhesion layer and multiphase ultra-low k dielec...
- Patent number 8,637,412
- Issue date Jan 28, 2014
- International Business Machines Corporation
- Alfred Grill
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Materials containing voids with void size controlled on the nanomet...
- Patent number 8,618,183
- Issue date Dec 31, 2013
- International Business Machines Corporation
- Stephen M. Gates
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Materials containing voids with void size controlled on the nanomet...
- Patent number 8,268,411
- Issue date Sep 18, 2012
- International Business Machines Corporation
- Stephen M. Gates
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Structures with improved interfacial strength of SiCOH dielectrics...
- Patent number 7,888,741
- Issue date Feb 15, 2011
- International Business Machines Corporation
- Daniel C. Edelstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Materials containing voids with void size controlled on the nanomet...
- Patent number 7,674,521
- Issue date Mar 9, 2010
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an ultralow dielectric constant material as...
- Patent number 7,312,524
- Issue date Dec 25, 2007
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusion barrier with low dielectric constant and semiconductor de...
- Patent number 7,252,875
- Issue date Aug 7, 2007
- International Business Machines Corporation
- Stephan A. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures with improved interfacial strength of SiCOH dielectrics...
- Patent number 7,067,437
- Issue date Jun 27, 2006
- International Business Machines Corporation
- Daniel C. Edelstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an ultralow dielectric constant material as...
- Patent number 7,049,247
- Issue date May 23, 2006
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced T-gate structure for modulation doped field effect transis...
- Patent number 6,972,440
- Issue date Dec 6, 2005
- International Business Machines Corporation
- Dinkar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenated oxidized silicon carbon material
- Patent number 6,953,984
- Issue date Oct 11, 2005
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultralow dielectric constant material as an intralevel or interleve...
- Patent number 6,790,789
- Issue date Sep 14, 2004
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating an ultralow dielectric constant material
- Patent number 6,770,573
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultralow dielectric constant material as an intralevel or interleve...
- Patent number 6,768,200
- Issue date Jul 27, 2004
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structures with improved adhesion to Si and C containing dielectric...
- Patent number 6,764,774
- Issue date Jul 20, 2004
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilization of fluorine-containing low-k dielectrics in a metal/i...
- Patent number 6,759,321
- Issue date Jul 6, 2004
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an ultralow dielectric constant material as...
- Patent number 6,756,323
- Issue date Jun 29, 2004
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced T-gate structure for modulation doped field effect transis...
- Patent number 6,740,535
- Issue date May 25, 2004
- International Business Machines Corporation
- Dinkar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenated oxidized silicon carbon material
- Patent number 6,724,086
- Issue date Apr 20, 2004
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultralow dielectric constant material as an intralevel or interleve...
- Patent number 6,541,398
- Issue date Apr 1, 2003
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable vapor deposited materials as antireflective coatings, hardm...
- Patent number 6,514,667
- Issue date Feb 4, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogenated oxidized silicon carbon material
- Patent number 6,497,963
- Issue date Dec 24, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiphase low dielectric constant material and method of deposition
- Patent number 6,479,110
- Issue date Nov 12, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stabilization of fluorine-containing low-k dielectrics in a metal/i...
- Patent number 6,448,655
- Issue date Sep 10, 2002
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual damascene processing for semiconductor chip interconnects
- Patent number 6,448,176
- Issue date Sep 10, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultralow dielectric constant material as an intralevel or interleve...
- Patent number 6,441,491
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiphase low dielectric constant material and method of deposition
- Patent number 6,437,443
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable and removable plasma deposited antireflective coatings
- Patent number 6,428,894
- Issue date Aug 6, 2002
- International Business Machines Corporation
- Katherina E. Babich
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating a thermally stable diamond-like carbon film...
- Patent number 6,346,747
- Issue date Feb 12, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low dielectric constant amorphous fluorinated carbon and method of...
- Patent number 6,337,518
- Issue date Jan 8, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADHESION LAYER AND MULTIPHASE ULTRA-LOW k DIELECTRIC MATERIAL
- Publication number 20140203336
- Publication date Jul 24, 2014
- International Business Machines Corporation
- ALFRED GRILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...
- Publication number 20140050860
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPHASE ULTRA LOW K DIELECTRIC MATERIAL
- Publication number 20130043514
- Publication date Feb 21, 2013
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...
- Publication number 20120328796
- Publication date Dec 27, 2012
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...
- Publication number 20090297729
- Publication date Dec 3, 2009
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiCOH DIELECTRIC
- Publication number 20080265381
- Publication date Oct 30, 2008
- International Business Machines Corporation
- Ali Afzali-Ardakani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods to form SiCOH or SiCNH dielectrics and structures including...
- Publication number 20080009141
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Geraud Dubois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIFFUSION BARRIER WITH LOW DIELECTRIC CONSTANT AND SEMICONDUCTOR DE...
- Publication number 20070237970
- Publication date Oct 11, 2007
- International Business Machines Corporation
- Stephan A. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High pretilt homogeneous alignment and tilted vertical alignment by...
- Publication number 20070224365
- Publication date Sep 27, 2007
- Alessandro C. Callegari
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Materials containing voids with void size controlled on the nanomet...
- Publication number 20070196639
- Publication date Aug 23, 2007
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiCOH dielectric
- Publication number 20070173071
- Publication date Jul 26, 2007
- International Business Machines Corporation
- Ali Afzali-Ardakani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Structures with improved interfacial strength of SiCOH dielectrics...
- Publication number 20060189153
- Publication date Aug 24, 2006
- International Business Machines Corporation
- Daniel C. Edelstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating an ultralow dielectric constant material as...
- Publication number 20060110937
- Publication date May 25, 2006
- International Business Machine Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating an ultralow dielectric constant material as...
- Publication number 20050245096
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structures with improved interfacial strength of SiCOH dielectrics...
- Publication number 20050059258
- Publication date Mar 17, 2005
- International Business Machines Corporation
- Daniel C. Edelstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hydrogenated oxidized silicon carbon material
- Publication number 20040195659
- Publication date Oct 7, 2004
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced T-gate structure for modulation doped field effect transis...
- Publication number 20040140506
- Publication date Jul 22, 2004
- International Business Machines Corporation
- Dinkar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffusion barrier with low dielectric constant and semiconductor de...
- Publication number 20040115407
- Publication date Jun 17, 2004
- International Business Machines Corporation
- Stephan A. Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED T-GATE STRUCTURE FOR MODULATION DOPED FIELD EFFECT TRANSIS...
- Publication number 20040016972
- Publication date Jan 29, 2004
- Dinkar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultralow dielectric constant material as an intralevel or interleve...
- Publication number 20030234450
- Publication date Dec 25, 2003
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Structures with improved adhesion to Si and C containing dielectric...
- Publication number 20030235710
- Publication date Dec 25, 2003
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultralow dielectric constant material as an intralevel or interleve...
- Publication number 20030143865
- Publication date Jul 31, 2003
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating an ultralow dielectric constant material
- Publication number 20030139062
- Publication date Jul 24, 2003
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Stabilization of fluorine-containing low-k dielectrics in a metal/i...
- Publication number 20020185741
- Publication date Dec 12, 2002
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultralow dielectric constant material as an intralevel or interleve...
- Publication number 20020180051
- Publication date Dec 5, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultralow dielectric constant material as an intralevel or interleve...
- Publication number 20020137359
- Publication date Sep 26, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating an ultralow dielectric constant material as...
- Publication number 20020098714
- Publication date Jul 25, 2002
- International Business Machines Corporation
- Alfred Grill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiphase low dielectric constant material and method of deposition
- Publication number 20020037442
- Publication date Mar 28, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STABILIZATION OF FLUORINE-CONTAINING LOW-K DIELECTRICS IN A METAL/I...
- Publication number 20020033535
- Publication date Mar 21, 2002
- KATHERINA BABICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiphase low dielectric constant material and method of deposition
- Publication number 20020034625
- Publication date Mar 21, 2002
- International Business Machines Corporation
- Alfred Grill
- H01 - BASIC ELECTRIC ELEMENTS

Vishnubhai V. Patel

Person

Patents Grantslast 30 patents

Process to form an adhesion layer and multiphase ultra-low k dielec...

Materials containing voids with void size controlled on the nanomet...

Materials containing voids with void size controlled on the nanomet...

Structures with improved interfacial strength of SiCOH dielectrics...

Materials containing voids with void size controlled on the nanomet...

Method for fabricating an ultralow dielectric constant material as...

Diffusion barrier with low dielectric constant and semiconductor de...

Structures with improved interfacial strength of SiCOH dielectrics...

Method for fabricating an ultralow dielectric constant material as...

Enhanced T-gate structure for modulation doped field effect transis...

Hydrogenated oxidized silicon carbon material

Ultralow dielectric constant material as an intralevel or interleve...

Method for fabricating an ultralow dielectric constant material

Ultralow dielectric constant material as an intralevel or interleve...

Structures with improved adhesion to Si and C containing dielectric...

Stabilization of fluorine-containing low-k dielectrics in a metal/i...

Method for fabricating an ultralow dielectric constant material as...

Enhanced T-gate structure for modulation doped field effect transis...

Hydrogenated oxidized silicon carbon material

Ultralow dielectric constant material as an intralevel or interleve...

Tunable vapor deposited materials as antireflective coatings, hardm...

Hydrogenated oxidized silicon carbon material

Multiphase low dielectric constant material and method of deposition

Stabilization of fluorine-containing low-k dielectrics in a metal/i...

Dual damascene processing for semiconductor chip interconnects

Ultralow dielectric constant material as an intralevel or interleve...

Multiphase low dielectric constant material and method of deposition

Tunable and removable plasma deposited antireflective coatings

Method for fabricating a thermally stable diamond-like carbon film...

Low dielectric constant amorphous fluorinated carbon and method of...

Patents Applicationslast 30 patents

ADHESION LAYER AND MULTIPHASE ULTRA-LOW k DIELECTRIC MATERIAL

MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...

MULTIPHASE ULTRA LOW K DIELECTRIC MATERIAL

MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...

MATERIALS CONTAINING VOIDS WITH VOID SIZE CONTROLLED ON THE NANOMET...

SiCOH DIELECTRIC

Methods to form SiCOH or SiCNH dielectrics and structures including...

DIFFUSION BARRIER WITH LOW DIELECTRIC CONSTANT AND SEMICONDUCTOR DE...

High pretilt homogeneous alignment and tilted vertical alignment by...

Materials containing voids with void size controlled on the nanomet...

SiCOH dielectric

Structures with improved interfacial strength of SiCOH dielectrics...

Method for fabricating an ultralow dielectric constant material as...

Method for fabricating an ultralow dielectric constant material as...

Structures with improved interfacial strength of SiCOH dielectrics...

Hydrogenated oxidized silicon carbon material

Enhanced T-gate structure for modulation doped field effect transis...

Diffusion barrier with low dielectric constant and semiconductor de...

ENHANCED T-GATE STRUCTURE FOR MODULATION DOPED FIELD EFFECT TRANSIS...

Ultralow dielectric constant material as an intralevel or interleve...

Structures with improved adhesion to Si and C containing dielectric...

Ultralow dielectric constant material as an intralevel or interleve...

Method for fabricating an ultralow dielectric constant material

Stabilization of fluorine-containing low-k dielectrics in a metal/i...

Ultralow dielectric constant material as an intralevel or interleve...

Ultralow dielectric constant material as an intralevel or interleve...

Method for fabricating an ultralow dielectric constant material as...

Multiphase low dielectric constant material and method of deposition

STABILIZATION OF FLUORINE-CONTAINING LOW-K DIELECTRICS IN A METAL/I...

Multiphase low dielectric constant material and method of deposition