Wenge Yang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Controlling critical dimensions of structures formed on a wafer in...
- Patent number 7,566,181
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming highly conductive semiconductor structures via pl...
- Patent number 7,217,652
- Issue date May 15, 2007
- Spansion LLC
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming SAC using a dielectric as a BARC and FICD enlarger
- Patent number 6,878,622
- Issue date Apr 12, 2005
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined optical profilometry and projection microscopy of integrat...
- Patent number 6,645,824
- Issue date Nov 11, 2003
- Timbre Technologies, Inc.
- Wenge Yang
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating a conductive structure for a semiconductor d...
- Patent number 6,627,526
- Issue date Sep 30, 2003
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of organic spin on materials as a stop-layer for local intercon...
- Patent number 6,596,623
- Issue date Jul 22, 2003
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of high density plasma metal etching
- Patent number 6,534,411
- Issue date Mar 18, 2003
- Advanced Micro Devices, Inc.
- Lewis Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with reduced control gate dimensions
- Patent number 6,515,328
- Issue date Feb 4, 2003
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned contacts and local interconnects us...
- Patent number 6,482,699
- Issue date Nov 19, 2002
- Advanced Micro Devices, Inc.
- YongZhong Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure of etching a memory cell polysilicon gate laye...
- Patent number 6,452,225
- Issue date Sep 17, 2002
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a shallow trench isolation structure with red...
- Patent number 6,423,612
- Issue date Jul 23, 2002
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing the step height of shallow trench isolation str...
- Patent number 6,420,240
- Issue date Jul 16, 2002
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to produce small space pattern using plasma polymerization l...
- Patent number 6,416,933
- Issue date Jul 9, 2002
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching memory gate stack using thin resist layer
- Patent number 6,383,939
- Issue date May 7, 2002
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for eliminating anti-reflective coating in semiconductors
- Patent number 6,376,389
- Issue date Apr 23, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for trimming a photoresist pattern line for memory gate etching
- Patent number 6,372,651
- Issue date Apr 16, 2002
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method using a dielectric photomask
- Patent number 6,365,509
- Issue date Apr 2, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned contacts and interconnection lines...
- Patent number 6,359,307
- Issue date Mar 19, 2002
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a low dielectric constant layer as a semiconductor...
- Patent number 6,348,406
- Issue date Feb 19, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming self-aligned contacts and local interconnects fo...
- Patent number 6,306,713
- Issue date Oct 23, 2001
- Advanced Micro Devices, Inc.
- YongZhong Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing anti-reflective coating layer using plasma etch...
- Patent number 6,291,296
- Issue date Sep 18, 2001
- Advanced Micro Devices, Inc.
- Angela T. Hui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for treating a deep-UV resist mask prior to gate formation...
- Patent number 6,271,154
- Issue date Aug 7, 2001
- Advanced Micro Devices, Inc.
- Lewis Shen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
RTA methods for treating a deep-UV resist mask prior to gate format...
- Patent number 6,218,310
- Issue date Apr 17, 2001
- Advanced Micro Devices, Inc.
- Lewis Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local interconnect etch characterization using AFM
- Patent number 6,207,575
- Issue date Mar 27, 2001
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for removing silicide residue in a semiconductor device
- Patent number 6,159,794
- Issue date Dec 12, 2000
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching layers on a semiconductor wafer in a single etch...
- Patent number 6,159,860
- Issue date Dec 12, 2000
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing anti-reflective coating layer using plasma etch...
- Patent number 6,136,649
- Issue date Oct 24, 2000
- Advanced Micro Devices, Inc.
- Angela T. Hui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure of etching a memory cell polysilicon gate laye...
- Patent number 6,110,779
- Issue date Aug 29, 2000
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preventing silicide residue formation in a semiconductor...
- Patent number 6,074,956
- Issue date Jun 13, 2000
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching memory gate stack using thin resist layer
- Patent number 5,977,601
- Issue date Nov 2, 1999
- Advanced Micro Devices, Inc.
- Wenge Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Controlling critical dimensions of structures formed on a wafer in...
- Publication number 20060046166
- Publication date Mar 2, 2006
- Timbre Technologies, Inc.
- Wenge Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINED OPTICAL PROFILOMETRY AND PROJECTION MICROSCOPY OF INTEGRAT...
- Publication number 20030203590
- Publication date Oct 30, 2003
- Wenge Yang
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Controlling critical dimensions of structures formed on a wafer in...

Method of forming highly conductive semiconductor structures via pl...

Method for forming SAC using a dielectric as a BARC and FICD enlarger

Combined optical profilometry and projection microscopy of integrat...

Method for fabricating a conductive structure for a semiconductor d...

Use of organic spin on materials as a stop-layer for local intercon...

Method of high density plasma metal etching

Semiconductor devices with reduced control gate dimensions

Method for forming self-aligned contacts and local interconnects us...

Method and structure of etching a memory cell polysilicon gate laye...

Method of fabricating a shallow trench isolation structure with red...

Method for reducing the step height of shallow trench isolation str...

Method to produce small space pattern using plasma polymerization l...

Method for etching memory gate stack using thin resist layer

Method for eliminating anti-reflective coating in semiconductors

Method for trimming a photoresist pattern line for memory gate etching

Semiconductor manufacturing method using a dielectric photomask

Method for forming self-aligned contacts and interconnection lines...

Method for using a low dielectric constant layer as a semiconductor...

Method for forming self-aligned contacts and local interconnects fo...

Method for removing anti-reflective coating layer using plasma etch...

Methods for treating a deep-UV resist mask prior to gate formation...

RTA methods for treating a deep-UV resist mask prior to gate format...

Local interconnect etch characterization using AFM

Methods for removing silicide residue in a semiconductor device

Method for etching layers on a semiconductor wafer in a single etch...

Method for removing anti-reflective coating layer using plasma etch...

Method and structure of etching a memory cell polysilicon gate laye...

Method for preventing silicide residue formation in a semiconductor...

Method for etching memory gate stack using thin resist layer

Patents Applicationslast 30 patents

Controlling critical dimensions of structures formed on a wafer in...

COMBINED OPTICAL PROFILOMETRY AND PROJECTION MICROSCOPY OF INTEGRAT...