Willard E. Conley

Person

Schenectady, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-exposure lithography employing a single anti-reflective coati...
- Patent number 8,507,187
- Issue date Aug 13, 2013
- International Business Machines Corporation
- Veeraraghavan S. Basker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of making a semiconductor device using negative photoresist
- Patent number 8,119,334
- Issue date Feb 21, 2012
- FREESCALE SEMICONDUCTOR, INC.
- Willard E. Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography for pitch reduction
- Patent number 7,883,829
- Issue date Feb 8, 2011
- International Business Machines Corporation
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified positive photoresists
- Patent number 6,300,035
- Issue date Oct 9, 2001
- Shipley Company, L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist formulation which minimizes blistering during etching
- Patent number 6,207,353
- Issue date Mar 27, 2001
- International Business Machines Corporation
- Michael D. Armacost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Making of microlithographic structures with an underlayer film cont...
- Patent number 5,795,701
- Issue date Aug 18, 1998
- International Business Machines Corporation
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic structure with an underlayer film containing a th...
- Patent number 5,783,361
- Issue date Jul 21, 1998
- International Business Machines Corporation
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic structure with an underlayer film comprising a th...
- Patent number 5,663,036
- Issue date Sep 2, 1997
- International Business Machines Corporation
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazo compound containing non-metallic atom
- Patent number 5,644,038
- Issue date Jul 1, 1997
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing a positive pattern utilizing naphtho quinone...
- Patent number 5,567,569
- Issue date Oct 22, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition containing naphthoquinonediazide compou...
- Patent number 5,552,256
- Issue date Sep 3, 1996
- International Business Machines Corporation
- Ari Aviram
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Dry developable photoresist compositions and method for use thereof
- Patent number 5,322,765
- Issue date Jun 21, 1994
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Crosslinkable aqueous developable photoresist compositions and meth...
- Patent number 5,296,332
- Issue date Mar 22, 1994
- International Business Machines Corporation
- Harbans S. Sachdev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top coat for acid catalyzed resists
- Patent number 5,240,812
- Issue date Aug 31, 1993
- International Business Machines Corporation
- Willard E. Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly sensitive dry developable deep UV photoresist
- Patent number 5,023,164
- Issue date Jun 11, 1991
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally stable photoresists with high sensitivity
- Patent number 4,939,070
- Issue date Jul 3, 1990
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity resists having autodecomposition temperatures grea...
- Patent number 4,931,379
- Issue date Jun 5, 1990
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyimide formulation for forming a patterned film on a substrate
- Patent number 4,828,964
- Issue date May 9, 1989
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A CONTACT THROUGH AN INSULATING LAYER
- Publication number 20100099255
- Publication date Apr 22, 2010
- Willard E. Conley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY FOR PITCH REDUCTION
- Publication number 20100028801
- Publication date Feb 4, 2010
- International Businesss Machines Corporation
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-EXPOSURE LITHOGRAPHY EMPLOYING A SINGLE ANTI-REFLECTIVE COATI...
- Publication number 20100009131
- Publication date Jan 14, 2010
- International Business Machines Corporation
- Veeraraghavan S. Basker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Implant Imaging with Spin-on Hard Masks
- Publication number 20090325106
- Publication date Dec 31, 2009
- Willard E. Conley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING A SEMICONDUCTOR DEVICE USING NEGATIVE PHOTORESIST
- Publication number 20090274982
- Publication date Nov 5, 2009
- Willard E. Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Willard E. Conley

Person

Patents Grantslast 30 patents

Multi-exposure lithography employing a single anti-reflective coati...

Method of making a semiconductor device using negative photoresist

Lithography for pitch reduction

Chemically amplified positive photoresists

Resist formulation which minimizes blistering during etching

Making of microlithographic structures with an underlayer film cont...

Microlithographic structure with an underlayer film containing a th...

Microlithographic structure with an underlayer film comprising a th...

Quinone diazo compound containing non-metallic atom

Process for producing a positive pattern utilizing naphtho quinone...

Positive resist composition containing naphthoquinonediazide compou...

Dry developable photoresist compositions and method for use thereof

Crosslinkable aqueous developable photoresist compositions and meth...

Top coat for acid catalyzed resists

Highly sensitive dry developable deep UV photoresist

Thermally stable photoresists with high sensitivity

High sensitivity resists having autodecomposition temperatures grea...

Polyimide formulation for forming a patterned film on a substrate

Patents Applicationslast 30 patents

METHOD OF FORMING A CONTACT THROUGH AN INSULATING LAYER

LITHOGRAPHY FOR PITCH REDUCTION

MULTI-EXPOSURE LITHOGRAPHY EMPLOYING A SINGLE ANTI-REFLECTIVE COATI...

Method for Implant Imaging with Spin-on Hard Masks

METHOD OF MAKING A SEMICONDUCTOR DEVICE USING NEGATIVE PHOTORESIST