William H. Mullee

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Purification of organic solvent fluids
- Patent number 7,329,354
- Issue date Feb 12, 2008
- PPT Technologies, LLC
- William H. Mullee
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Removal of CMP and post-CMP residue from semiconductors using super...
- Patent number 7,064,070
- Issue date Jun 20, 2006
- Tokyo Electron Limited
- William H. Mullee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Removal of photoresist and photoresist residue from semiconductors...
- Patent number 6,871,656
- Issue date Mar 29, 2005
- Tokyo Electron Limited
- William H. Mullee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation of high performance silica slurry using a centrifuge
- Patent number 6,802,983
- Issue date Oct 12, 2004
- Advanced Technology Materials, Inc.
- William Mullee
- B24 - GRINDING POLISHING
Information Patent Grant
Ion exchange purification of dielectric condensate precursor fluids...
- Patent number 6,660,875
- Issue date Dec 9, 2003
- PPT Technologies, LLC
- William H. Mullee
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Removal of CMP residue from semiconductor substrate using supercrit...
- Patent number 6,537,916
- Issue date Mar 25, 2003
- Tokyo Electron Limited
- William H. Mullee
- B08 - CLEANING
Information Patent Grant
Removal of photoresist and photoresist residue from semiconductors...
- Patent number 6,509,141
- Issue date Jan 21, 2003
- Tokyo Electron Limited
- William H. Mullee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of photoresist and residue from substrate using supercritic...
- Patent number 6,500,605
- Issue date Dec 31, 2002
- Tokyo Electron Limited
- William H. Mullee
- B08 - CLEANING
Information Patent Grant
Planarization compositions and methods for removing interlayer diel...
- Patent number 6,322,600
- Issue date Nov 27, 2001
- Advanced Technology Materials, Inc.
- Richard Brewer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Removal of resist or residue from semiconductors using supercritica...
- Patent number 6,306,564
- Issue date Oct 23, 2001
- Tokyo Electron Limited
- William H. Mullee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removal of CMP residue from semiconductors using supercritical carb...
- Patent number 6,277,753
- Issue date Aug 21, 2001
- Supercritical Systems Inc.
- William H. Mullee
- B08 - CLEANING
Information Patent Grant
Process for manufacture of ultra-high purity ammonium hydroxide
- Patent number 5,746,993
- Issue date May 5, 1998
- Advanced Micro Devices, Inc.
- William H. Mullee
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PURIFICATION OF ORGANIC SOLVENT FLUIDS
- Publication number 20070084792
- Publication date Apr 19, 2007
- William H. Mullee
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Removal of CMP and post-CMP residue from semiconductors using super...
- Publication number 20040142564
- Publication date Jul 22, 2004
- William H. Mullee
- B08 - CLEANING
Information Patent Application
Preparation of high performance silica slurry using a centrifuge
- Publication number 20030054734
- Publication date Mar 20, 2003
- William Mullee
- B24 - GRINDING POLISHING
Information Patent Application
Removal of photoresist and photoresist residue from semiconductors...
- Publication number 20030027085
- Publication date Feb 6, 2003
- William H. Mullee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Purification of organic solvent fluids
- Publication number 20030024883
- Publication date Feb 6, 2003
- William H. Mullee
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Removal of CMP residue from semiconductor substrate using supercrit...
- Publication number 20020086537
- Publication date Jul 4, 2002
- Supercritical Systems Inc.
- William H. Mullee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF PHOTORESIST AND PHOTORESIST RESIDUE FROM SEMICONDUCTORS...
- Publication number 20020048731
- Publication date Apr 25, 2002
- WILLIAM H MULLEE
- H01 - BASIC ELECTRIC ELEMENTS

William H. Mullee

Person

Patents Grantslast 30 patents

Purification of organic solvent fluids

Removal of CMP and post-CMP residue from semiconductors using super...

Removal of photoresist and photoresist residue from semiconductors...

Preparation of high performance silica slurry using a centrifuge

Ion exchange purification of dielectric condensate precursor fluids...

Removal of CMP residue from semiconductor substrate using supercrit...

Removal of photoresist and photoresist residue from semiconductors...

Removal of photoresist and residue from substrate using supercritic...

Planarization compositions and methods for removing interlayer diel...

Removal of resist or residue from semiconductors using supercritica...

Removal of CMP residue from semiconductors using supercritical carb...

Process for manufacture of ultra-high purity ammonium hydroxide

Patents Applicationslast 30 patents

PURIFICATION OF ORGANIC SOLVENT FLUIDS

Removal of CMP and post-CMP residue from semiconductors using super...

Preparation of high performance silica slurry using a centrifuge

Removal of photoresist and photoresist residue from semiconductors...

Purification of organic solvent fluids

Removal of CMP residue from semiconductor substrate using supercrit...

REMOVAL OF PHOTORESIST AND PHOTORESIST RESIDUE FROM SEMICONDUCTORS...