William Harshbarger

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Shadow frame with cross beam for semiconductor equipment
- Patent number 8,002,896
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Sakae Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature process for TFT fabrication
- Patent number 7,915,114
- Issue date Mar 29, 2011
- Applied Materials, Inc.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of silicon layers for active matrix liquid crystal displ...
- Patent number 7,439,191
- Issue date Oct 21, 2008
- Applied Materials, Inc.
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature process for TFT fabrication
- Patent number 7,300,829
- Issue date Nov 27, 2007
- Applied Materials, Inc.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dechucking a substrate
- Patent number 7,160,392
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma display panel with a low K dielectric layer
- Patent number 7,122,962
- Issue date Oct 17, 2006
- Applied Materials, Inc.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature process for passivation applications
- Patent number 7,086,918
- Issue date Aug 8, 2006
- Applied Materials, Inc.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On-site cleaning gas generation for process chamber cleaning
- Patent number 6,981,508
- Issue date Jan 3, 2006
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for controlling thin film uniformity and products produced...
- Patent number 6,962,732
- Issue date Nov 8, 2005
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shadow frame with cross beam for semiconductor equipment
- Patent number 6,960,263
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- Sakae Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorine process for cleaning semiconductor process chamber
- Patent number 6,880,561
- Issue date Apr 19, 2005
- Applied Materials, Inc.
- Haruhiro Harry Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of passivation layers for active matrix liquid crystal d...
- Patent number 6,869,838
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- Kam Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for enhanced chamber cleaning
- Patent number 6,863,077
- Issue date Mar 8, 2005
- Applied Materials, Inc.
- Sheng Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of carbon doped silicon oxide film to flat panel industry
- Patent number 6,858,548
- Issue date Feb 22, 2005
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
On-site cleaning gas generation for process chamber cleaning
- Patent number 6,843,258
- Issue date Jan 18, 2005
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing an electrostatic charge on a substrate during a...
- Patent number 6,827,987
- Issue date Dec 7, 2004
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of film layers by alternately pulsing a precursor and hi...
- Patent number 6,825,134
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for dechucking a substrate
- Patent number 6,676,761
- Issue date Jan 13, 2004
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of annealing large area glass substrates
- Patent number 6,610,374
- Issue date Aug 26, 2003
- Applied Materials, Inc.
- Chuang-Chuang Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma display panel with a low k dielectric layer
- Patent number 6,610,354
- Issue date Aug 26, 2003
- Applied Materials, Inc.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etching silicon using fluorine without plasma
- Patent number 6,500,356
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of TEOS oxide using pulsed RF plasma
- Patent number 6,451,390
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method and apparatus for enhancing chamber cleaning
- Patent number 6,432,255
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Sheng Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing amorphous silicon based films having controlle...
- Patent number 6,352,910
- Issue date Mar 5, 2002
- Applied Komatsu Technology, Inc.
- William R. Harshbarger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of annealing large area glass substrates
- Patent number 6,294,219
- Issue date Sep 25, 2001
- Applied Komatsu Technology, Inc.
- Chuang-Chuang Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of chemical vapor deposition in a vacuum plasma processor re...
- Patent number 6,200,651
- Issue date Mar 13, 2001
- Lam Research Corporation
- Gregory A. Roche
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of in-situ cleaning of a chuck within a plasma chamber
- Patent number 5,911,833
- Issue date Jun 15, 1999
- Lam Research Corporation
- Dean Denison
- B08 - CLEANING
Information Patent Grant
Method for monitoring process endpoints in a plasma chamber and a p...
- Patent number 5,846,373
- Issue date Dec 8, 1998
- Lam Research Corporation
- David R. Pirkle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma cleaning method for removing residues in a plasma process ch...
- Patent number 5,647,953
- Issue date Jul 15, 1997
- Lam Research Corporation
- Larry Williams
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Low Temperature Process for TFT Fabrication
- Publication number 20080087960
- Publication date Apr 17, 2008
- APPLIED MATERIALS, INC.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DECHUCKING A SUBSTRATE
- Publication number 20070062454
- Publication date Mar 22, 2007
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shadow frame with cross beam for semiconductor equipment
- Publication number 20060030088
- Publication date Feb 9, 2006
- APPLIED MATERIALS, INC.
- Sakae Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for controlling thin film uniformity and products produced...
- Publication number 20050233155
- Publication date Oct 20, 2005
- APPLIED MATERIALS, INC.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low temperature process for TFT fabrication
- Publication number 20040241920
- Publication date Dec 2, 2004
- APPLIED MATERIALS, INC.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
On-site cleaning gas generation for process chamber cleaning
- Publication number 20040216768
- Publication date Nov 4, 2004
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low temperature process for passivation applications
- Publication number 20040113542
- Publication date Jun 17, 2004
- APPLIED MATERIALS, INC.
- Mark Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for dechucking a substrate
- Publication number 20040089239
- Publication date May 13, 2004
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma display panel with a low k dielectric layer
- Publication number 20030218424
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shadow frame with cross beam for semiconductor equipment
- Publication number 20030200928
- Publication date Oct 30, 2003
- Sakae Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for metal induced crystallization of polycrystall...
- Publication number 20030203123
- Publication date Oct 30, 2003
- APPLIED MATERIALS, INC.
- Quanyaun Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Application of carbon doped silicon oxide film to flat panel industry
- Publication number 20030198817
- Publication date Oct 23, 2003
- APPLIED MATERIALS, INC.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fluorine process for cleaning semiconductor process chamber
- Publication number 20030192569
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of gate metallization for active matrix liquid crystal d...
- Publication number 20030194825
- Publication date Oct 16, 2003
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of passivation layers for active matrix liquid crystal d...
- Publication number 20030189232
- Publication date Oct 9, 2003
- APPLIED MATERIALS, INC.
- Kam Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition of silicon layers for active matrix liquid crystal displ...
- Publication number 20030189208
- Publication date Oct 9, 2003
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of film layers
- Publication number 20030186561
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selectively etching silicon using fluorine without plasma
- Publication number 20030109144
- Publication date Jun 12, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for dechucking a substrate
- Publication number 20030079691
- Publication date May 1, 2003
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for enhanced chamber cleaning
- Publication number 20030066541
- Publication date Apr 10, 2003
- Sheng Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for controlling thin film uniformity and products produced...
- Publication number 20030044621
- Publication date Mar 6, 2003
- APPLIED MATERIALS, INC.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reduction of electrostatic charge on a substrate during PECVD process
- Publication number 20030031792
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER
- Publication number 20030010354
- Publication date Jan 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of TEOS oxide using pulsed RF plasma
- Publication number 20020192475
- Publication date Dec 19, 2002
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Plasma display panel with a low k dielectric layer
- Publication number 20020190651
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for enhanced chamber cleaning
- Publication number 20020174885
- Publication date Nov 28, 2002
- Sheng Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING SILICON USING FLUORINE WITHOUT PLASMA
- Publication number 20020134755
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing amorphous silicon based films having controlle...
- Publication number 20020115269
- Publication date Aug 22, 2002
- APPLIED MATERIALS, INC.
- William R. Harshbarger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
On-site cleaning gas generation for process chamber cleaning
- Publication number 20020074013
- Publication date Jun 20, 2002
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR ENHANCED CHAMBER CLEANING
- Publication number 20020033183
- Publication date Mar 21, 2002
- SHENG SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

William Harshbarger

Person

Patents Grantslast 30 patents

Shadow frame with cross beam for semiconductor equipment

Low temperature process for TFT fabrication

Deposition of silicon layers for active matrix liquid crystal displ...

Low temperature process for TFT fabrication

Method for dechucking a substrate

Plasma display panel with a low K dielectric layer

Low temperature process for passivation applications

On-site cleaning gas generation for process chamber cleaning

Process for controlling thin film uniformity and products produced...

Shadow frame with cross beam for semiconductor equipment

Fluorine process for cleaning semiconductor process chamber

Deposition of passivation layers for active matrix liquid crystal d...

Method and apparatus for enhanced chamber cleaning

Application of carbon doped silicon oxide film to flat panel industry

On-site cleaning gas generation for process chamber cleaning

Method of reducing an electrostatic charge on a substrate during a...

Deposition of film layers by alternately pulsing a precursor and hi...

Method and apparatus for dechucking a substrate

Method of annealing large area glass substrates

Plasma display panel with a low k dielectric layer

Selectively etching silicon using fluorine without plasma

Deposition of TEOS oxide using pulsed RF plasma

Method and apparatus for enhancing chamber cleaning

Method of depositing amorphous silicon based films having controlle...

Method of annealing large area glass substrates

Method of chemical vapor deposition in a vacuum plasma processor re...

Method of in-situ cleaning of a chuck within a plasma chamber

Method for monitoring process endpoints in a plasma chamber and a p...

Plasma cleaning method for removing residues in a plasma process ch...

Patents Applicationslast 30 patents

Low Temperature Process for TFT Fabrication

METHOD FOR DECHUCKING A SUBSTRATE

Shadow frame with cross beam for semiconductor equipment

Process for controlling thin film uniformity and products produced...

Low temperature process for TFT fabrication

On-site cleaning gas generation for process chamber cleaning

Low temperature process for passivation applications

Method for dechucking a substrate

Plasma display panel with a low k dielectric layer

Shadow frame with cross beam for semiconductor equipment

System and method for metal induced crystallization of polycrystall...

Application of carbon doped silicon oxide film to flat panel industry

Fluorine process for cleaning semiconductor process chamber

Deposition of gate metallization for active matrix liquid crystal d...

Deposition of passivation layers for active matrix liquid crystal d...

Deposition of silicon layers for active matrix liquid crystal displ...

Deposition of film layers

Selectively etching silicon using fluorine without plasma

Method and apparatus for dechucking a substrate

Method and apparatus for enhanced chamber cleaning

Process for controlling thin film uniformity and products produced...

Reduction of electrostatic charge on a substrate during PECVD process

FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER

Deposition of TEOS oxide using pulsed RF plasma

Plasma display panel with a low k dielectric layer

Method and apparatus for enhanced chamber cleaning

SELECTIVELY ETCHING SILICON USING FLUORINE WITHOUT PLASMA

Method of depositing amorphous silicon based films having controlle...

On-site cleaning gas generation for process chamber cleaning

METHOD AND APPARATUS FOR ENHANCED CHAMBER CLEANING