Yasuaki Fukuda

Person

Hadano, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure apparatus, and device manufacturing method
- Patent number 6,819,396
- Issue date Nov 16, 2004
- Canon Kabushiki Kaisha
- Masayuki Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus for synchrotron radiation lithography
- Patent number 6,167,111
- Issue date Dec 26, 2000
- Canon Kabushiki Kaisha
- Yutaka Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and process for inspecting and repairing an original
- Patent number 5,808,312
- Issue date Sep 15, 1998
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask structure, preparation thereof and X-ray exposure method
- Patent number 5,751,780
- Issue date May 12, 1998
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making X-ray mask structure
- Patent number 5,656,398
- Issue date Aug 12, 1997
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing an X-ray mask structure
- Patent number 5,607,733
- Issue date Mar 4, 1997
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray exposure method and apparatus and device manufacturing method
- Patent number 5,606,586
- Issue date Feb 25, 1997
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Multilayer film for X-rays
- Patent number 5,528,654
- Issue date Jun 18, 1996
- Canon Kabushiki Kaisha
- Masahito Niibe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Production method of an x-ray mask structure, an x-ray mask structu...
- Patent number 5,469,489
- Issue date Nov 21, 1995
- Canon Kabushiki Kaisha
- Akira Miyake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray
- Patent number 5,433,988
- Issue date Jul 18, 1995
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and apparatus for stabilizing shapes of objects, such as...
- Patent number 5,390,228
- Issue date Feb 14, 1995
- Canon Kabushiki Kaisha
- Masahito Niibe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask structure
- Patent number 5,356,686
- Issue date Oct 18, 1994
- Canon Kabushiki Kaisha
- Hidehiko Fujioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray exposure apparatus
- Patent number 5,335,259
- Issue date Aug 2, 1994
- Canon Kabushiki Kaisha
- Masami Hayashida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure for x-ray exposure and x-ray exposure device and met...
- Patent number 5,333,167
- Issue date Jul 26, 1994
- Canon Kabushiki Kaisha
- Takashi Iizuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray
- Patent number 5,310,603
- Issue date May 10, 1994
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask for lithography
- Patent number 5,262,257
- Issue date Nov 16, 1993
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray microscope
- Patent number 5,204,887
- Issue date Apr 20, 1993
- Canon Kabushiki Kaisha
- Masami Hayashida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection device
- Patent number 5,182,763
- Issue date Jan 26, 1993
- Canon Kabushiki Kaisha
- Takashi Iizuka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray transmitting window and method of mounting the same
- Patent number 5,159,621
- Issue date Oct 27, 1992
- Canon Kabushiki Kaisha
- Yutaka Watanabe
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray reduction projection exposure system of reflection type
- Patent number 5,153,898
- Issue date Oct 6, 1992
- Canon Kabushiki Kaisha
- Masayuki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for cleaning an optical element for use with a radiation...
- Patent number 5,145,649
- Issue date Sep 8, 1992
- Canon Kabushiki Kaisha
- Takashi Iizuka
- B08 - CLEANING
Information Patent Grant
X-Ray exposure apparatus
- Patent number 5,123,036
- Issue date Jun 16, 1992
- Canon Kabushiki Kaisha
- Shinichiro Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask support and process for preparation thereof
- Patent number 5,101,420
- Issue date Mar 31, 1992
- Canon Kabushiki Kaisha
- Nobuo Kushibiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection type mask
- Patent number 5,052,033
- Issue date Sep 24, 1991
- Canon Kabushiki Kaisha
- Tsutomu Ikeda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray exposure process for preventing electrostatic attraction or c...
- Patent number 5,048,066
- Issue date Sep 10, 1991
- Canon Kabushiki Kaisha
- Yasuaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask structure and device for positioning the same
- Patent number 5,042,945
- Issue date Aug 27, 1991
- Canon Kabushiki Kaisha
- Hirofumi Shibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask support member, X-ray mask, and X-ray exposure process u...
- Patent number 5,012,500
- Issue date Apr 30, 1991
- Canon Kabushiki Kaisha
- Yutaka Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yasuaki Fukuda

Person

Patents Grantslast 30 patents

Exposure apparatus, and device manufacturing method

Exposure apparatus for synchrotron radiation lithography

System and process for inspecting and repairing an original

X-ray mask structure, preparation thereof and X-ray exposure method

Method of making X-ray mask structure

Process for preparing an X-ray mask structure

X-ray exposure method and apparatus and device manufacturing method

Multilayer film for X-rays

Production method of an x-ray mask structure, an x-ray mask structu...

Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

Method of and apparatus for stabilizing shapes of objects, such as...

X-ray mask structure

X-ray exposure apparatus

Mask structure for x-ray exposure and x-ray exposure device and met...

Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

Mask for lithography

X-ray microscope

Reflection device

X-ray transmitting window and method of mounting the same

X-ray reduction projection exposure system of reflection type

Apparatus for cleaning an optical element for use with a radiation...

X-Ray exposure apparatus

X-ray mask support and process for preparation thereof

Reflection type mask

X-ray exposure process for preventing electrostatic attraction or c...

Lithographic mask structure and device for positioning the same

X-ray mask support member, X-ray mask, and X-ray exposure process u...