Yaxin WANG

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of electroless plating using a solution with at least two bo...
- Patent number 9,818,617
- Issue date Nov 14, 2017
- Lam Research Corporation
- Artur Kolics
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electroless plating solution with at least two borane containing re...
- Patent number 9,551,074
- Issue date Jan 24, 2017
- Lam Research Corporation
- Artur Kolics
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process to reduce nodule formation in electroless plating
- Patent number 9,142,416
- Issue date Sep 22, 2015
- Lam Research Corporation
- Nanhai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous dielectrics K value restoration by thermal treatment and or...
- Patent number 8,603,913
- Issue date Dec 10, 2013
- Lam Research Corporation
- Nanhai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adhesion and minimizing oxidation on electroless CO alloy films for...
- Patent number 7,910,476
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Hongbin Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Raman spectroscopy as integrated chemical metrology
- Patent number 7,542,132
- Issue date Jun 2, 2009
- Applied Materials, Inc.
- Hongbin Fang
- G01 - MEASURING TESTING
Information Patent Grant
Method for silicon based dielectric chemical vapor deposition
- Patent number 7,473,655
- Issue date Jan 6, 2009
- Applied Materials, Inc.
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 7,413,627
- Issue date Aug 19, 2008
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,833,052
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Patent number 6,814,814
- Issue date Nov 9, 2004
- Applied Materials, Inc.
- Alan W. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber seasoning method to improve adhesion of F-containing dielec...
- Patent number 6,624,064
- Issue date Sep 23, 2003
- Applied Materials, Inc.
- Turgut Sahin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,589,610
- Issue date Jul 8, 2003
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of stable dielectric films
- Patent number 6,511,923
- Issue date Jan 28, 2003
- Applied Materials, Inc.
- Yaxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD ruthenium seed for CVD ruthenium deposition
- Patent number 6,479,100
- Issue date Nov 12, 2002
- Applied Materials, Inc.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal electrodes
- Patent number 6,475,854
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Pravin K. Narwankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition of ruthenium films for metal electrode ap...
- Patent number 6,440,495
- Issue date Aug 27, 2002
- Applied Materials, Inc.
- Christopher P. Wade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,416,823
- Issue date Jul 9, 2002
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitrogen treatment of polished halogen-doped silicon glass
- Patent number 6,413,871
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Hichem M'Saad
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Process gas distribution for forming stable fluorine-doped silicate...
- Patent number 6,383,954
- Issue date May 7, 2002
- Applied Materials, Inc.
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD deposition method to improve adhesion of F-containing dielectri...
- Patent number 6,323,119
- Issue date Nov 27, 2001
- Applied Materials, Inc.
- Ming Xi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing and amorphous fluorocarbon film using HDP-CVD
- Patent number 6,211,065
- Issue date Apr 3, 2001
- Applied Materials, Inc.
- Ming Xi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition chamber and method for depositing low dielectric constan...
- Patent number 6,070,551
- Issue date Jun 6, 2000
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ELECTROLESS PLATING SOLUTION WITH AT LEAST TWO BORANE CONTAINING RE...
- Publication number 20170092499
- Publication date Mar 30, 2017
- LAM RESEARCH CORPORATION
- Artur KOLICS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROLESS PLATING WITH AT LEAST TWO BORANE REDUCING AGENTS
- Publication number 20150354064
- Publication date Dec 10, 2015
- LAM RESEARCH CORPORATION
- Artur KOLICS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED TOOL SETS AND PROCESS TO KEEP SUBSTRATE SURFACE WET DURI...
- Publication number 20110143553
- Publication date Jun 16, 2011
- LAM RESEARCH CORPORATION
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION
- Publication number 20090111284
- Publication date Apr 30, 2009
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION AND MINIMIZING OXIDATION ON ELECTROLESS CO ALLOY FILMS FOR...
- Publication number 20090029544
- Publication date Jan 29, 2009
- Hongbin Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAMAN SPECTROSCOPY AS INTEGRATED CHEMICAL METROLOGY
- Publication number 20080024762
- Publication date Jan 31, 2008
- APPLIED MATERIALS, INC.
- HONGBIN FANG
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED ELECTROLESS DEPOSITION SYSTEM
- Publication number 20070111519
- Publication date May 17, 2007
- APPLIED MATERIALS, INC.
- Dmitry Lubomirsky
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Adhesion and minimizing oxidation on electroless CO alloy films for...
- Publication number 20070099417
- Publication date May 3, 2007
- APPLIED MATERIALS, INC.
- Hongbin Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for atomic layer cleaning and polishing
- Publication number 20070095367
- Publication date May 3, 2007
- Yaxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for silicon based dielectric chemical vapor deposition
- Publication number 20060286818
- Publication date Dec 21, 2006
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated electroless deposition system
- Publication number 20060033678
- Publication date Feb 16, 2006
- APPLIED MATERIALS, INC.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low thermal budget silicon nitride formation for advance transistor...
- Publication number 20060019032
- Publication date Jan 26, 2006
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20050150454
- Publication date Jul 14, 2005
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tandem wafer processing system and process
- Publication number 20030213560
- Publication date Nov 20, 2003
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Publication number 20030183243
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Alan W. Collins
- B08 - CLEANING
Information Patent Application
Chemical vapor deposition of ruthenium films for metal electrode ap...
- Publication number 20030129306
- Publication date Jul 10, 2003
- Applied Materials, Inc.
- Christopher P. Wade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20030056900
- Publication date Mar 27, 2003
- APPLIED MATERIALS, INCORPORATED a Delaware corporation
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD BST film composition and property control with thickness below...
- Publication number 20030012875
- Publication date Jan 16, 2003
- Shreyas Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low thermal budget metal oxide deposition for capacitor structures
- Publication number 20020197793
- Publication date Dec 26, 2002
- Charles N Dornfest
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20020160113
- Publication date Oct 31, 2002
- APPLIED MATERIALS, INCORPORATED
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION
- Publication number 20020146513
- Publication date Oct 10, 2002
- APPLIED MATERIALS, INC.
- Xiaoliang Jin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition chamber and method for depositing low dielectric constan...
- Publication number 20010053423
- Publication date Dec 20, 2001
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming metal electrodes
- Publication number 20010043453
- Publication date Nov 22, 2001
- Pravin K. Narwankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS
- Publication number 20010033900
- Publication date Oct 25, 2001
- HICHEM M'SAAD
- C03 - GLASS MINERAL OR SLAG WOOL

Person

Patents Grantslast 30 patents

Method of electroless plating using a solution with at least two bo...

Electroless plating solution with at least two borane containing re...

Process to reduce nodule formation in electroless plating

Porous dielectrics K value restoration by thermal treatment and or...

Adhesion and minimizing oxidation on electroless CO alloy films for...

Raman spectroscopy as integrated chemical metrology

Method for silicon based dielectric chemical vapor deposition

Deposition chamber and method for depositing low dielectric constan...

Deposition chamber and method for depositing low dielectric constan...

Cleaning residues from surfaces in a chamber by sputtering sacrific...

Chamber seasoning method to improve adhesion of F-containing dielec...

Deposition chamber and method for depositing low dielectric constan...

Deposition of stable dielectric films

CVD ruthenium seed for CVD ruthenium deposition

Method of forming metal electrodes

Chemical vapor deposition of ruthenium films for metal electrode ap...

Deposition chamber and method for depositing low dielectric constan...

Nitrogen treatment of polished halogen-doped silicon glass

Process gas distribution for forming stable fluorine-doped silicate...

CVD deposition method to improve adhesion of F-containing dielectri...

Method of depositing and amorphous fluorocarbon film using HDP-CVD

Deposition chamber and method for depositing low dielectric constan...

Patents Applicationslast 30 patents

ELECTROLESS PLATING SOLUTION WITH AT LEAST TWO BORANE CONTAINING RE...

ELECTROLESS PLATING WITH AT LEAST TWO BORANE REDUCING AGENTS

INTEGRATED TOOL SETS AND PROCESS TO KEEP SUBSTRATE SURFACE WET DURI...

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION

ADHESION AND MINIMIZING OXIDATION ON ELECTROLESS CO ALLOY FILMS FOR...

RAMAN SPECTROSCOPY AS INTEGRATED CHEMICAL METROLOGY

INTEGRATED ELECTROLESS DEPOSITION SYSTEM

Adhesion and minimizing oxidation on electroless CO alloy films for...

Apparatus and method for atomic layer cleaning and polishing

Method for silicon based dielectric chemical vapor deposition

Integrated electroless deposition system

Low thermal budget silicon nitride formation for advance transistor...

Deposition chamber and method for depositing low dielectric constan...

Tandem wafer processing system and process

Cleaning residues from surfaces in a chamber by sputtering sacrific...

Chemical vapor deposition of ruthenium films for metal electrode ap...

Deposition chamber and method for depositing low dielectric constan...

CVD BST film composition and property control with thickness below...

Low thermal budget metal oxide deposition for capacitor structures

Deposition chamber and method for depositing low dielectric constan...

CVD RUTHENIUM SEED FOR CVD RUTHENIUM DEPOSITION

Deposition chamber and method for depositing low dielectric constan...

Method of forming metal electrodes

NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS