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SUBSTRATE PROCESSING METHOD
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Publication number 20240376625
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Publication date Nov 14, 2024
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ACM RESEARCH (SHANGHAI), INC.
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Meng Wu
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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ELECTROPLATING APPARATUS
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Publication number 20240376627
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Publication date Nov 14, 2024
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ACM RESEARCH (SHANGHAI), INC.
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Jian Wang
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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PLATING APPARATUS AND PLATING METHOD
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Publication number 20240026561
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Publication date Jan 25, 2024
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ACM RESEARCH (SHANGHAI), INC.
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Zhaowei Jia
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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PLATING CHUCK
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Publication number 20210066106
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Publication date Mar 4, 2021
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ACM Research (Shanghai) Inc.
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Hui Wang
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H01 - BASIC ELECTRIC ELEMENTS
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PLATING APPARATUS
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Publication number 20200354851
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Publication date Nov 12, 2020
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ACM Research (Shanghai) Inc.
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Zhaowei Jia
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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APPARATUS FOR HOLDING A SUBSTRATE
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Publication number 20180320285
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Publication date Nov 8, 2018
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ACM Research (Shanghai) Inc.
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Hui Wang
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C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
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SYSTEM FOR CLEANING SEMICONDUCTOR WAFERS
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Publication number 20180071794
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Publication date Mar 15, 2018
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ACM Research (Shanghai) Inc.
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Hui Wang
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B06 - GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
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