Zhijun Chen

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods to form airgaps
- Patent number 11,335,565
- Issue date May 17, 2022
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods utilizing solid-phase etchants
- Patent number 10,872,778
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting selective etching systems and methods
- Patent number 10,755,941
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND high aspect ratio structure etch
- Patent number 10,692,880
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Zhenjiang Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods to form airgaps
- Patent number 10,615,047
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-free etching methods
- Patent number 10,497,579
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-free etching methods
- Patent number 10,468,267
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 10,424,463
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 10,424,464
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective SiN lateral recess
- Patent number 10,319,603
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen treatment for nitride etching
- Patent number 10,283,324
- Issue date May 7, 2019
- Applied Materials, Inc.
- Zhijun Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow distribution plate for surface fluorine reduction
- Patent number 10,204,795
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Jiayin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal methods for high aspect ratio structures
- Patent number 10,186,428
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Grant
Silicon pretreatment for nitride removal
- Patent number 10,128,086
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Jiayin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective SiN lateral recess
- Patent number 10,062,579
- Issue date Aug 28, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,991,134
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Determining a user's rank in a social network
- Patent number 9,972,057
- Issue date May 15, 2018
- Microsoft Technology Licensing, LLC
- Jinchun Xia
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Oxide etch selectivity enhancement
- Patent number 9,837,284
- Issue date Dec 5, 2017
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal methods for high aspect ratio structures
- Patent number 9,768,034
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,704,723
- Issue date Jul 11, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,659,792
- Issue date May 23, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide etch selectivity enhancement
- Patent number 9,613,822
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide selective removal
- Patent number 9,478,432
- Issue date Oct 25, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,449,850
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective titanium nitride etching
- Patent number 9,449,845
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Jie Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical-component oxide etch
- Patent number 9,437,451
- Issue date Sep 6, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly selective doped oxide removal method
- Patent number 9,406,523
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-carbon-nitride selective etch
- Patent number 9,390,937
- Issue date Jul 12, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-local plasma oxide etch
- Patent number 9,355,863
- Issue date May 31, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 9,349,605
- Issue date May 24, 2016
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
4F2 VERTICAL ACCESS TRANSISTOR WITH REDUCED FLOATING BODY EFFECT
- Publication number 20240341082
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Zhijun Chen
Information Patent Application
METHOD OF MAKING SILICIDE IN HIGH-ASPECT RATIO STRUCTURES BY HYBRID...
- Publication number 20240332023
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Ying-Bing JIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEMORY DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20240334683
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Tong Liu
Information Patent Application
SYSTEMS AND METHODS FOR NANOHOLE WET CLEANS
- Publication number 20240331999
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Ying-Bing Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED VERTICAL BITLINE FOR THREE-DIMENSIONAL (3D) DYNAMIC RA...
- Publication number 20230380145
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Zhijun CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS TO FORM AIRGAPS
- Publication number 20200234971
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING SELECTIVE ETCHING SYSTEMS AND METHODS
- Publication number 20200013628
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS UTILIZING SOLID-PHASE ETCHANTS
- Publication number 20200013632
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS TO FORM AIRGAPS
- Publication number 20190267248
- Publication date Aug 29, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXYGEN TREATMENT FOR NITRIDE ETCHING
- Publication number 20190122865
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Zhijun Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WATER-FREE ETCHING METHODS
- Publication number 20180350619
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER-FREE ETCHING METHODS
- Publication number 20180350617
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D NAND HIGH ASPECT RATIO STRUCTURE ETCH
- Publication number 20180182777
- Publication date Jun 28, 2018
- Applied Materials, Inc.
- Zhenjiang CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL METHODS FOR HIGH ASPECT RATIO STRUCTURES
- Publication number 20180138055
- Publication date May 17, 2018
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Application
SELECTIVE SiN LATERAL RECESS
- Publication number 20180102256
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SiN LATERAL RECESS
- Publication number 20180102255
- Publication date Apr 12, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE REDUCTION WITH SCOPE WITH CONTROLLED OXIDATION
- Publication number 20170291199
- Publication date Oct 12, 2017
- Applied Materials, Inc.
- Xing ZHONG
- B08 - CLEANING
Information Patent Application
FLOW DISTRIBUTION PLATE FOR SURFACE FLUORINE REDUCTION
- Publication number 20170229309
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Jiayin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE ETCH SELECTIVITY SYSTEMS AND METHODS
- Publication number 20170229287
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Lin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE ETCH SELECTIVITY ENHANCEMENT
- Publication number 20170178924
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTENT PLATFORM
- Publication number 20170091629
- Publication date Mar 30, 2017
- Linkedin Corporation
- Lizabeth Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OXIDE ETCH SELECTIVITY SYSTEMS AND METHODS
- Publication number 20170040175
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETERMINING A USER'S RANK IN A SOCIAL NETWORK
- Publication number 20160275080
- Publication date Sep 22, 2016
- Linkedin Corporation
- JINCHUN XIA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SILICON OXIDE SELECTIVE REMOVAL
- Publication number 20160093506
- Publication date Mar 31, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE ETCH SELECTIVITY ENHANCEMENT
- Publication number 20160093505
- Publication date Mar 31, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160064233
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160027673
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY GAS PHASE SILICON NITRIDE REMOVAL
- Publication number 20150371865
- Publication date Dec 24, 2015
- Zhijun Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD
- Publication number 20150371866
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE SILICON OXIDE PATTERNING
- Publication number 20150371861
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Zihui LI
- H01 - BASIC ELECTRIC ELEMENTS

Zhijun Chen

Person

Patents Grantslast 30 patents

Systems and methods to form airgaps

Systems and methods utilizing solid-phase etchants

Self-limiting selective etching systems and methods

3D NAND high aspect ratio structure etch

Systems and methods to form airgaps

Water-free etching methods

Water-free etching methods

Oxide etch selectivity systems and methods

Oxide etch selectivity systems and methods

Selective SiN lateral recess

Oxygen treatment for nitride etching

Flow distribution plate for surface fluorine reduction

Removal methods for high aspect ratio structures

Silicon pretreatment for nitride removal

Selective SiN lateral recess

Processing systems and methods for halide scavenging

Determining a user's rank in a social network

Oxide etch selectivity enhancement

Removal methods for high aspect ratio structures

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Oxide etch selectivity enhancement

Silicon oxide selective removal

Processing systems and methods for halide scavenging

Selective titanium nitride etching

Radical-component oxide etch

Highly selective doped oxide removal method

Silicon-carbon-nitride selective etch

Non-local plasma oxide etch

Oxide etch selectivity systems and methods

Patents Applicationslast 30 patents

4F2 VERTICAL ACCESS TRANSISTOR WITH REDUCED FLOATING BODY EFFECT

METHOD OF MAKING SILICIDE IN HIGH-ASPECT RATIO STRUCTURES BY HYBRID...

MEMORY DEVICES AND METHODS OF FORMING THE SAME

SYSTEMS AND METHODS FOR NANOHOLE WET CLEANS

SELF-ALIGNED VERTICAL BITLINE FOR THREE-DIMENSIONAL (3D) DYNAMIC RA...

SYSTEMS AND METHODS TO FORM AIRGAPS

SELF-LIMITING SELECTIVE ETCHING SYSTEMS AND METHODS

SYSTEMS AND METHODS UTILIZING SOLID-PHASE ETCHANTS

SYSTEMS AND METHODS TO FORM AIRGAPS

OXYGEN TREATMENT FOR NITRIDE ETCHING

WATER-FREE ETCHING METHODS

WATER-FREE ETCHING METHODS

3D NAND HIGH ASPECT RATIO STRUCTURE ETCH

REMOVAL METHODS FOR HIGH ASPECT RATIO STRUCTURES

SELECTIVE SiN LATERAL RECESS

SELECTIVE SiN LATERAL RECESS

FLUORINE REDUCTION WITH SCOPE WITH CONTROLLED OXIDATION

FLOW DISTRIBUTION PLATE FOR SURFACE FLUORINE REDUCTION

OXIDE ETCH SELECTIVITY SYSTEMS AND METHODS

OXIDE ETCH SELECTIVITY ENHANCEMENT

INTENT PLATFORM

OXIDE ETCH SELECTIVITY SYSTEMS AND METHODS

DETERMINING A USER'S RANK IN A SOCIAL NETWORK

SILICON OXIDE SELECTIVE REMOVAL

OXIDE ETCH SELECTIVITY ENHANCEMENT

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

HIGH SELECTIVITY GAS PHASE SILICON NITRIDE REMOVAL

HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD

PROTECTIVE SILICON OXIDE PATTERNING