Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industry

CPC
G03F1/70

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/70Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industries

Patents Grantslast 30 patents

Information Patent Grant
Modifying segments and vertices of mask shapes for mask synthesis
- Patent number 11,977,324
- Issue date May 7, 2024
- Synopsys, Inc.
- Yung-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition method
- Patent number 11,977,335
- Issue date May 7, 2024
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,977,327
- Issue date May 7, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography mask repair by simulation of photoresist thickness evol...
- Patent number 11,966,156
- Issue date Apr 23, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
- Patent number 11,960,201
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Autofocusing method for an imaging device
- Patent number 11,947,185
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Dirk Seidel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of managing critical dimension error of photomask and method...
- Patent number 11,934,095
- Issue date Mar 19, 2024
- Samsung Display Co., Ltd.
- Jaehyuk Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, display device, and manufacturing method thereof
- Patent number 11,923,383
- Issue date Mar 5, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay correcting method, and photolithography method, semiconduct...
- Patent number 11,921,421
- Issue date Mar 5, 2024
- Samsung Electronics Co., Ltd.
- Jeongjin Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography alignment process for bonded wafers
- Patent number 11,916,022
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit layout generation method
- Patent number 11,907,636
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ke-Ying Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stochastic-aware lithographic models for mask synthesis
- Patent number 11,900,042
- Issue date Feb 13, 2024
- Synopsys, Inc.
- Kevin Dean Lucas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Thick photo resist layer metrology target
- Patent number 11,874,102
- Issue date Jan 16, 2024
- KLA Corporation
- Lingyi Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for identification and elimination of geometric...
- Patent number 11,853,682
- Issue date Dec 26, 2023
- GBT Tokenize Corp.
- Danny Rittman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining equivalence of design rule manual...
- Patent number 11,842,133
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chin-Chou Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 11,835,862
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sub-resolution assist features
- Patent number 11,829,066
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dose information generation and communication for lithography manuf...
- Patent number 11,822,232
- Issue date Nov 21, 2023
- Synopsys, Inc.
- Thomas Cecil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device including standard cell having split portions
- Patent number 11,803,682
- Issue date Oct 31, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ta-Pen Guo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,796,922
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating patterning device pattern at patch boundary
- Patent number 11,797,748
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for overlay error correction and method for manufacturing a...
- Patent number 11,796,924
- Issue date Oct 24, 2023
- NANYA TECHNOLOGY CORPORATION
- Shih-Yuan Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay correction method, method of evaluating overlay correction...
- Patent number 11,796,923
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Hyunjay Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for coloring circuit layout and system for performing the same
- Patent number 11,790,145
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ping Chiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reticle enhancement technology of a design pattern to be...
- Patent number 11,783,110
- Issue date Oct 10, 2023
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inverse lithography and machine learning for mask synthesis
- Patent number 11,762,283
- Issue date Sep 19, 2023
- Synopsys, Inc.
- Amyn A. Poonawala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing method and apparatus thereof
- Patent number 11,756,789
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
- Publication number 20240152043
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Minseung SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...
- Publication number 20240152046
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Jeongjin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY
- Publication number 20240095437
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Quan ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...
- Publication number 20240061327
- Publication date Feb 22, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRAINING METHOD AND APPARATUS FOR LITHOGRAPHIC MASK GENERATION MODE...
- Publication number 20240019777
- Publication date Jan 18, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Xingyu MA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CELL REGION INCLUDING PORTION OF CONDUCTOR OF ANOTHER CELL REGION A...
- Publication number 20240020457
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fong-Yuan CHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20240019787
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING EQUIVALENCE OF DESIGN RULE MANUAL...
- Publication number 20240012971
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIN-CHOU LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR FORMING PHOTOMASK
- Publication number 20230408900
- Publication date Dec 21, 2023
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN CORRECTION METHOD
- Publication number 20230400759
- Publication date Dec 14, 2023
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REGISTERING STRUCTURES ON MICROLITHOGRAPHIC MASKS, COMPU...
- Publication number 20230393488
- Publication date Dec 7, 2023
- Carl Zeiss SMT GMBH
- Dirk Seidel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME
- Publication number 20230385518
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- John LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR FULL-CHIP QUICK SIMULATION OF NEGATIVE TONE DEVELOPMENT...
- Publication number 20230384692
- Publication date Nov 30, 2023
- DONGFANG JINGYUAN ELECTRON LIMITED SHENZHEN BRANCH
- Shijia GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED MASK STITCHING
- Publication number 20230384690
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sagar TRIVEDI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20230385508
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Jen CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR IMPROVED POLYSILICON ETCH DIMENSIONAL CONTROL
- Publication number 20230386857
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Jui HE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUB-RESOLUTION ASSIST FEATURES
- Publication number 20230384665
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK
- Publication number 20230375917
- Publication date Nov 23, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiuxuan ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS
- Publication number 20230375916
- Publication date Nov 23, 2023
- Synopsys, Inc.
- Amyn A. POONAWALA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20230367229
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR STRUCTURE, DEVICE, AND METHOD
- Publication number 20230367950
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME
- Publication number 20230367942
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Ping CHIANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING STANDARD CELL HAVING SPLIT PORTIONS
- Publication number 20230367948
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- TA-PEN GUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT METHOD FOR SEMICONDUCTOR CHIP, METHOD OF MANUFACTURING SEMIC...
- Publication number 20230359805
- Publication date Nov 9, 2023
- SAMSUNG ELECTRONICS CO,. LTD.
- Kihyun KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR REDUCING MIGRATION ERRORS
- Publication number 20230351081
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sandeep Kumar GOEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR LAYOUT ENHANCEMENT BASED ON INTER-CELL CORREL...
- Publication number 20230341765
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- WEI-LIN CHU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20230333482
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Automated Standard Cell Design
- Publication number 20230325574
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Lars Liebmann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR ALTERING LITHOGRAPHIC PATTERNS TO ADJUST...
- Publication number 20230304183
- Publication date Sep 28, 2023
- Marvin Louis BERNT
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Modifying segments and vertices of mask shapes for mask synthesis

Pattern decomposition method

Enforcing mask synthesis consistency across random areas of integra...

Lithography mask repair by simulation of photoresist thickness evol...

Method of critical dimension control by oxygen and nitrogen plasma...

Autofocusing method for an imaging device

Method of fabricating reticle

Method of managing critical dimension error of photomask and method...

Photomask, display device, and manufacturing method thereof

Overlay correcting method, and photolithography method, semiconduct...

Photolithography alignment process for bonded wafers

Integrated circuit layout generation method

Stochastic-aware lithographic models for mask synthesis

Thick photo resist layer metrology target

Systems and methods for identification and elimination of geometric...

Method and system for determining equivalence of design rule manual...

Model for calculating a stochastic variation in an arbitrary pattern

Sub-resolution assist features

Dose information generation and communication for lithography manuf...

Semiconductor device including standard cell having split portions

Method of manufacturing semiconductor devices

Method for generating patterning device pattern at patch boundary

Method for overlay error correction and method for manufacturing a...

Overlay correction method, method of evaluating overlay correction...

Method for coloring circuit layout and system for performing the same

Method for reticle enhancement technology of a design pattern to be...

Method of making semiconductor device and semiconductor device

Inverse lithography and machine learning for mask synthesis

Method and system for determining a charged particle beam exposure...

Semiconductor manufacturing method and apparatus thereof

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...

METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...

METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY

LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...

TRAINING METHOD AND APPARATUS FOR LITHOGRAPHIC MASK GENERATION MODE...

CELL REGION INCLUDING PORTION OF CONDUCTOR OF ANOTHER CELL REGION A...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD AND SYSTEM FOR DETERMINING EQUIVALENCE OF DESIGN RULE MANUAL...

METHOD FOR FORMING PHOTOMASK

PHOTOMASK DESIGN CORRECTION METHOD

METHOD FOR REGISTERING STRUCTURES ON MICROLITHOGRAPHIC MASKS, COMPU...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME

METHOD FOR FULL-CHIP QUICK SIMULATION OF NEGATIVE TONE DEVELOPMENT...

OPTIMIZED MASK STITCHING

SEMICONDUCTOR DEVICE

METHOD FOR IMPROVED POLYSILICON ETCH DIMENSIONAL CONTROL

SUB-RESOLUTION ASSIST FEATURES

METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK

INVERSE LITHOGRAPHY AND MACHINE LEARNING FOR MASK SYNTHESIS

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

SEMICONDUCTOR STRUCTURE, DEVICE, AND METHOD

METHOD FOR COLORING CIRCUIT LAYOUT AND SYSTEM FOR PERFORMING THE SAME

SEMICONDUCTOR DEVICE INCLUDING STANDARD CELL HAVING SPLIT PORTIONS

LAYOUT METHOD FOR SEMICONDUCTOR CHIP, METHOD OF MANUFACTURING SEMIC...

METHOD AND SYSTEM FOR REDUCING MIGRATION ERRORS

METHOD AND SYSTEM FOR LAYOUT ENHANCEMENT BASED ON INTER-CELL CORREL...

METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS

Method for Automated Standard Cell Design

METHODS AND APPARATUS FOR ALTERING LITHOGRAPHIC PATTERNS TO ADJUST...