Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industry

CPC
G03F1/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/70Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industries

Patents Grantslast 30 patents

Information Patent Grant
Memory device, integrated circuit device and method
- Patent number 12,361,192
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Sheng Chang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated circuit layout generation method
- Patent number 12,361,199
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ke-Ying Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
- Patent number 12,339,579
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,340,164
- Issue date Jun 24, 2025
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization using a non-uniform illumination intensity profile
- Patent number 12,339,583
- Issue date Jun 24, 2025
- ASML Holding N.V.
- Janardan Nath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having power rail with non-linear edge
- Patent number 12,340,165
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Chan Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for obtaining an exposure data and method for manufacturing...
- Patent number 12,321,093
- Issue date Jun 3, 2025
- Samsung Electronics Co., Ltd.
- Soeun Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full die and partial die tape outs from common design
- Patent number 12,321,681
- Issue date Jun 3, 2025
- Apple Inc.
- Haim Hauzi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Two-dimensional (2D) patterns using multiple exposures of one-dimen...
- Patent number 12,306,540
- Issue date May 20, 2025
- Google LLC
- Lu Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus, measurement apparatus, lithography apparatus,...
- Patent number 12,307,643
- Issue date May 20, 2025
- Canon Kabushiki Kaisha
- Satoru Jimbo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image stitching method for stitching product
- Patent number 12,292,692
- Issue date May 6, 2025
- Shanghai Huali Microelectronics Corporation
- Xiaobin Zhu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Full-chip cell critical dimension correction method and method of m...
- Patent number 12,282,249
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Standard cell characterization for internal conductive line of cell
- Patent number 12,282,723
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shi-Han Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 12,278,204
- Issue date Apr 15, 2025
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inverse lithography and machine learning for mask synthesis
- Patent number 12,265,325
- Issue date Apr 1, 2025
- Synopsys, Inc.
- Amyn A. Poonawala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for reducing lithography defects and pattern transfer
- Patent number 12,265,326
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Angélique D. Raley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask data generation method and mask data generation program
- Patent number 12,248,244
- Issue date Mar 11, 2025
- Nikon Corporation
- Yosuke Okudaira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 12,243,712
- Issue date Mar 4, 2025
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 12,242,183
- Issue date Mar 4, 2025
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for reducing migration errors
- Patent number 12,229,483
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sandeep Kumar Goel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifter circuit, phase shifter layout and method of forming t...
- Patent number 12,229,488
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography alignment process for bonded wafers
- Patent number 12,230,585
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for optimizing mask parameters
- Patent number 12,222,641
- Issue date Feb 11, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Jianfang He
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for decision making in a semiconductor manufacturing process
- Patent number 12,204,252
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Arnaud Hubaux
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 12,189,308
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming semiconductor device
- Patent number 12,189,284
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask synthesis using tensor-based computing platforms
- Patent number 12,181,793
- Issue date Dec 31, 2024
- Synopsys, Inc.
- Peng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,174,529
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wei-Chung Hu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask, display device, and manufacturing method thereof
- Patent number 12,170,295
- Issue date Dec 17, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method, and program product for manufacturing a photomask
- Patent number 12,164,225
- Issue date Dec 10, 2024
- Photronics, Inc.
- Mohamed Ramadan
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK DESIGN METHOD, SEMICONDUCTOR MANUFACTURING PROCESS, AND S...
- Publication number 20250237942
- Publication date Jul 24, 2025
- United Microelectronics Corp.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPTIMIZING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20250224666
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Min-Cheol KANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STANDARD CELL CHARACTERIZATION FOR INTERNAL CONDUCTIVE LINE OF CELL
- Publication number 20250217563
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- SHI-HAN ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask Stitching for Extreme Ultraviolet Lithography
- Publication number 20250199397
- Publication date Jun 19, 2025
- Synopsys, Inc.
- Robert Michal Iwanow
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS
- Publication number 20250189881
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Ya LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR REDUCING MIGRATION ERRORS
- Publication number 20250190663
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sandeep Kumar GOEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHASE SHIFTER CIRCUIT, PHASE SHIFTER LAYOUT AND METHOD OF FORMING T...
- Publication number 20250190677
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsien LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, SYSTEM AND ELECTRONIC APPARATUS FOR MASK FEATURE OPTIMIZATION
- Publication number 20250180980
- Publication date Jun 5, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS
- Publication number 20250157943
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD, AND PROGRAM PRODUCT FOR MANUFACTURING A PHOTOMASK
- Publication number 20250130489
- Publication date Apr 24, 2025
- PHOTRONICS, INC.
- Mohamed Ramadan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...
- Publication number 20250123554
- Publication date Apr 17, 2025
- POSTECH Research and Business Development Foundation
- Jun Suk RHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION
- Publication number 20250123553
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Chen CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS
- Publication number 20250068056
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS
- Publication number 20250068057
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMORY CELL WITH BURIED POWER GRID, AND METHOD OF FABRICATING SAME
- Publication number 20250063709
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hidehiro FUJIWARA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK GENERATION MODEL TRAINING METHOD, MASK GENERATION METHOD AND A...
- Publication number 20250053079
- Publication date Feb 13, 2025
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Xingyu MA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...
- Publication number 20250028235
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Heungsuk OH
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20250004383
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji YAMAZOE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK
- Publication number 20240427229
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Katsuyoshi KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE, AND METHOD OF FORMING SAME
- Publication number 20240394455
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- Chung-Hui CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGN METHOD OF PHOTOMASK STRUCTURE
- Publication number 20240393676
- Publication date Nov 28, 2024
- United Microelectronics Corp.
- Ming-Hsien Kuo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240393677
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Min WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Full Die and Partial Die Tape Outs from Common Design
- Publication number 20240394461
- Publication date Nov 28, 2024
- Apple Inc.
- Haim Hauzi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20240377755
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
- Publication number 20240370635
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED CIRCUIT MANUFACTURING METHOD
- Publication number 20240370633
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fong-Yuan CHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...
- Publication number 20240353748
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul YEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Adapting basic layout or design of masks to lithographic process requirement, e.g., second iteration correction of mask patterns for imaging

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Memory device, integrated circuit device and method

Integrated circuit layout generation method

Method of critical dimension control by oxygen and nitrogen plasma...

Methods and systems for reticle enhancement technology of a design...

Optimization using a non-uniform illumination intensity profile

Semiconductor device having power rail with non-linear edge

Method for obtaining an exposure data and method for manufacturing...

Full die and partial die tape outs from common design

Two-dimensional (2D) patterns using multiple exposures of one-dimen...

Processing apparatus, measurement apparatus, lithography apparatus,...

Image stitching method for stitching product

Full-chip cell critical dimension correction method and method of m...

Standard cell characterization for internal conductive line of cell

Pattern decomposition lithography techniques

Inverse lithography and machine learning for mask synthesis

Method for reducing lithography defects and pattern transfer

Mask data generation method and mask data generation program

Method and system for determining a charged particle beam exposure...

Enforcing mask synthesis consistency across random areas of integra...

Method and system for reducing migration errors

Phase shifter circuit, phase shifter layout and method of forming t...

Photolithography alignment process for bonded wafers

Method and device for optimizing mask parameters

Method for decision making in a semiconductor manufacturing process

Method for adjusting a target feature in a model of a patterning pr...

Method for forming semiconductor device

Mask synthesis using tensor-based computing platforms

Method for manufacturing semiconductor device

Photomask, display device, and manufacturing method thereof

System, method, and program product for manufacturing a photomask

Patents Applicationslast 30 patents

PHOTOMASK DESIGN METHOD, SEMICONDUCTOR MANUFACTURING PROCESS, AND S...

METHOD FOR OPTIMIZING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...

STANDARD CELL CHARACTERIZATION FOR INTERNAL CONDUCTIVE LINE OF CELL

Mask Stitching for Extreme Ultraviolet Lithography

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

METHOD AND SYSTEM FOR REDUCING MIGRATION ERRORS

PHASE SHIFTER CIRCUIT, PHASE SHIFTER LAYOUT AND METHOD OF FORMING T...

METHOD, SYSTEM AND ELECTRONIC APPARATUS FOR MASK FEATURE OPTIMIZATION

PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS

SYSTEM, METHOD, AND PROGRAM PRODUCT FOR MANUFACTURING A PHOTOMASK

MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...

SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION

MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS

CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS

MEMORY CELL WITH BURIED POWER GRID, AND METHOD OF FABRICATING SAME

MASK GENERATION MODEL TRAINING METHOD, MASK GENERATION METHOD AND A...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

OPTICAL PROXIMITY CORRECTION METHODS AND MASK MANUFACTURING METHODS...

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING

MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK

SEMICONDUCTOR DEVICE, AND METHOD OF FORMING SAME

DESIGN METHOD OF PHOTOMASK STRUCTURE

METHOD FOR FORMING SEMICONDUCTOR DEVICE

Full Die and Partial Die Tape Outs from Common Design

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD

INTEGRATED CIRCUIT MANUFACTURING METHOD

METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD...