Air gaps

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H01L21/764

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/764Air gaps

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,368,071
- Issue date Jul 22, 2025
- SK Hynix Inc.
- Byung Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with leakage current suppression and method fo...
- Patent number 12,363,989
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bo-Yu Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-gate device and related methods
- Patent number 12,363,937
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Lin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned source/drain metal contact
- Patent number 12,356,645
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for preparing the same
- Patent number 12,347,686
- Issue date Jul 1, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Hsiang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device isolation features
- Patent number 12,336,236
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory structure including low dielectric constant capping layer
- Patent number 12,328,868
- Issue date Jun 10, 2025
- NANYA TECHNOLOGY CORPORATION
- Jhen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with air gaps and the method thereof
- Patent number 12,324,218
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ko-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,315,759
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo-Cyuan Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,310,002
- Issue date May 20, 2025
- NANYA TECHNOLOGY CORPORATION
- Jhen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air gap in inner spacers and methods of fabricating the same in fie...
- Patent number 12,300,735
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien Ning Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of forming a porous low-k structure
- Patent number 12,300,486
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bo-Jiun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure and method for preparing the same
- Patent number 12,293,914
- Issue date May 6, 2025
- NANYA TECHNOLOGY CORPORATION
- Cheng-Hsiang Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cut metal gate refill with void
- Patent number 12,283,485
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Gang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low warpage high density trench capacitor
- Patent number 12,272,725
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jyun-Ying Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming air spacers in semiconductor devices
- Patent number 12,243,940
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chao-Hsun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain feature for multigate device performance and method of...
- Patent number 12,243,912
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having air spacer
- Patent number 12,238,920
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Jihee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with leakage current suppression and method fo...
- Patent number 12,237,230
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bo-Yu Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures including middle-of-line (MOL) capacitance...
- Patent number 12,237,368
- Issue date Feb 25, 2025
- Adeia Semiconductor Solutions LLC
- Injo Ok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for FinFet fabrication and structure thereof
- Patent number 12,224,210
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with backside air gap dielectric
- Patent number 12,224,212
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact structure for a trench power MOSFET with a split gate...
- Patent number 12,224,342
- Issue date Feb 11, 2025
- STMicroelectronics Pte Ltd
- Yean Ching Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain silicide for multigate device performance and method o...
- Patent number 12,218,214
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ching Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,218,210
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing method
- Patent number 12,218,000
- Issue date Feb 4, 2025
- ASM IP Holding B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductors with airgap electrical isolation
- Patent number 12,211,886
- Issue date Jan 28, 2025
- GLOBALFOUNDRIES U.S. Inc.
- Prateek Kumar Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 12,207,470
- Issue date Jan 21, 2025
- Kioxia Corporation
- Shinya Arai
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor memory device and production method thereof
- Patent number 12,200,931
- Issue date Jan 14, 2025
- Kioxia Corporation
- Tadashi Iguchi
- G11 - INFORMATION STORAGE
Information Patent Grant
Laterally-diffused metal-oxide-semiconductor devices with an air gap
- Patent number 12,191,351
- Issue date Jan 7, 2025
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Bong Woong Mun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR
- Publication number 20250240981
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Jyun-Ying LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE
- Publication number 20250233012
- Publication date Jul 17, 2025
- WINBOND ELECTRONICS CORP.
- Hung-Yu Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLASH MEMORY AND METHOD FOR FORMING THE SAME
- Publication number 20250220898
- Publication date Jul 3, 2025
- WINBOND ELECTRONICS CORP.
- Taku KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH MIM CAPACITOR AND FABRICATING METHOD O...
- Publication number 20250212424
- Publication date Jun 26, 2025
- UNITED MICROELECTRONICS CORP.
- Da-Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-GAPPED ISOLATION WALLS
- Publication number 20250210522
- Publication date Jun 26, 2025
- Intel Corporation
- Ehren Mannebach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE/DRAIN FEATURE FOR MULTIGATE DEVICE PERFORMANCE AND METHOD OF...
- Publication number 20250203966
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRGAP IN SINGLE DIFFUSION BREAK
- Publication number 20250194168
- Publication date Jun 12, 2025
- International Business Machines Corporation
- Tsung-Sheng Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE DIMENSIONAL STRUCTRUE WITH FD-SOI TRANSISTOR
- Publication number 20250194244
- Publication date Jun 12, 2025
- UNITED MICROELECTRONICS CORP.
- Purakh Raj Verma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices With Backside Air Gap Dielectric
- Publication number 20250185348
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For FinFET Fabrication And Structure Thereof
- Publication number 20250185346
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH TWO AIR GAPS ON TWO SIDES OF A TOP SOU...
- Publication number 20250185337
- Publication date Jun 5, 2025
- International Business Machines Corporation
- Liqiao Qin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250167141
- Publication date May 22, 2025
- Samsung Electronics, Co., Ltd.
- YoungJun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH SHALLOW TRENCH ISOLATION PROTECTION LAYER
- Publication number 20250149379
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Hung CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Assemblies Having Conductive Structures Along Pillars of Semiconduc...
- Publication number 20250142875
- Publication date May 1, 2025
- Micron Technology, Inc.
- Sanh D. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE/DRAIN FEATURE SEPARATION STRUCTURE
- Publication number 20250133716
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING METHOD
- Publication number 20250132192
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- HeeSung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUT METAL GATE REFILL WITH VOID
- Publication number 20250125150
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ting-Gang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING MEMORY STRUCTURES FOR THREE-DIMENSIONAL NONVOLAT...
- Publication number 20250118547
- Publication date Apr 10, 2025
- IMEC vzw
- Sana Rachidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20250120083
- Publication date Apr 10, 2025
- KIOXIA Corporation
- Shinya ARAI
- G11 - INFORMATION STORAGE
Information Patent Application
Methods of Forming One or More Covered Voids in a Semiconductor Sub...
- Publication number 20250112086
- Publication date Apr 3, 2025
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A BIPOLAR TRANSISTOR
- Publication number 20250113511
- Publication date Apr 3, 2025
- STMicroelectronics International N.V.
- Edoardo BREZZA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH AIR GAP AND METHOD SEALING THE AIR GAP
- Publication number 20250105054
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chang Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND PRODUCTION METHOD THEREOF
- Publication number 20250107095
- Publication date Mar 27, 2025
- KIOXIA Corporation
- Tadashi IGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC DEVICES HAVING AIR GAP STRUCTURES INTEGRATED WITH I...
- Publication number 20250079292
- Publication date Mar 6, 2025
- Tahoe Research, Ltd.
- Han Wui THEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIELD EFFECT TRANSISTOR WITH ISOLATED SOURCE/DRAINS AND METHOD
- Publication number 20250072065
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jung-Hung CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH CAPACITOR PROFILE TO DECREASE SUBSTRATE WARPAGE
- Publication number 20250063744
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Li Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
- Publication number 20250046649
- Publication date Feb 6, 2025
- DB HiTek Co., Ltd.
- Sang Il HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Assemblies Having Conductive Structures Along Pillars of Semiconduc...
- Publication number 20250022955
- Publication date Jan 16, 2025
- Micron Technology, Inc.
- Sanh D. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR...
- Publication number 20250024680
- Publication date Jan 16, 2025
- SK HYNIX INC.
- Kang Sik CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYERED INSULATING FILM STACK
- Publication number 20250006560
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh-Ping Wang
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and method for fabricating the same

Semiconductor device with leakage current suppression and method fo...

Multi-gate device and related methods

Self-aligned source/drain metal contact

Semiconductor device structure and method for preparing the same

Semiconductor device isolation features

Memory structure including low dielectric constant capping layer

Semiconductor devices with air gaps and the method thereof

FinFET device and method of forming same

Semiconductor device

Air gap in inner spacers and methods of fabricating the same in fie...

System and method of forming a porous low-k structure

Semiconductor device structure and method for preparing the same

Cut metal gate refill with void

Low warpage high density trench capacitor

Methods of forming air spacers in semiconductor devices

Source/drain feature for multigate device performance and method of...

Semiconductor devices having air spacer

Semiconductor device with leakage current suppression and method fo...

Semiconductor structures including middle-of-line (MOL) capacitance...

Method for FinFet fabrication and structure thereof

Semiconductor devices with backside air gap dielectric

Gate contact structure for a trench power MOSFET with a split gate...

Source/drain silicide for multigate device performance and method o...

Semiconductor device

Semiconductor processing method

Inductors with airgap electrical isolation

Semiconductor device and method for manufacturing same

Semiconductor memory device and production method thereof

Laterally-diffused metal-oxide-semiconductor devices with an air gap

Patents Applicationslast 30 patents

LOW WARPAGE HIGH DENSITY TRENCH CAPACITOR

SEMICONDUCTOR STRUCTURE

FLASH MEMORY AND METHOD FOR FORMING THE SAME

SEMICONDUCTOR STRUCTURE WITH MIM CAPACITOR AND FABRICATING METHOD O...

AIR-GAPPED ISOLATION WALLS

SOURCE/DRAIN FEATURE FOR MULTIGATE DEVICE PERFORMANCE AND METHOD OF...

AIRGAP IN SINGLE DIFFUSION BREAK

THREE DIMENSIONAL STRUCTRUE WITH FD-SOI TRANSISTOR

Semiconductor Devices With Backside Air Gap Dielectric

Method For FinFET Fabrication And Structure Thereof

SEMICONDUCTOR STRUCTURE WITH TWO AIR GAPS ON TWO SIDES OF A TOP SOU...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE WITH SHALLOW TRENCH ISOLATION PROTECTION LAYER

Assemblies Having Conductive Structures Along Pillars of Semiconduc...

SOURCE/DRAIN FEATURE SEPARATION STRUCTURE

SEMICONDUCTOR PROCESSING METHOD

CUT METAL GATE REFILL WITH VOID

METHODS OF FORMING MEMORY STRUCTURES FOR THREE-DIMENSIONAL NONVOLAT...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

Methods of Forming One or More Covered Voids in a Semiconductor Sub...

METHOD OF MANUFACTURING A BIPOLAR TRANSISTOR

SEMICONDUCTOR STRUCTURE WITH AIR GAP AND METHOD SEALING THE AIR GAP

SEMICONDUCTOR MEMORY DEVICE AND PRODUCTION METHOD THEREOF

MICROELECTRONIC DEVICES HAVING AIR GAP STRUCTURES INTEGRATED WITH I...

FIELD EFFECT TRANSISTOR WITH ISOLATED SOURCE/DRAINS AND METHOD

TRENCH CAPACITOR PROFILE TO DECREASE SUBSTRATE WARPAGE

HIGH VOLTAGE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

Assemblies Having Conductive Structures Along Pillars of Semiconduc...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR...

MULTI-LAYERED INSULATING FILM STACK