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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Aqueous alkaline compositions
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last 30 patents
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Patent Grant
Substrate treating apparatus and substrate treating method
Patent number
11,977,332
Issue date
May 7, 2024
Semes Co., Ltd.
Hae-Won Choi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Photoresist developer and method of developing photoresist
Patent number
11,971,657
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Organometallic solution based high resolution patterning compositions
Patent number
11,966,159
Issue date
Apr 23, 2024
Inpria Corporation
Stephen T. Meyers
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photoresist composition, coated substrate including the photoresist...
Patent number
11,960,206
Issue date
Apr 16, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
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Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
Patent number
11,951,476
Issue date
Apr 9, 2024
Rutgers, The State University of New Jersey
Umer Hassan
G06 - COMPUTING CALCULATING COUNTING
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Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,953,832
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Developer composition for flexographic printing plate, developer, a...
Patent number
11,940,735
Issue date
Mar 26, 2024
TOYOBO MC CORPORATION
Hiroto Yamada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photoresist topcoat compositions and methods of processing photores...
Patent number
11,940,731
Issue date
Mar 26, 2024
Rohm and Haas Electronic Materials LLC
Irvinder Kaur
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Composition for forming silicon-containing resist underlayer film a...
Patent number
11,934,100
Issue date
Mar 19, 2024
Shin-Etsu Chemical Co., Ltd.
Daisuke Kori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Monomers, polymers and lithographic compositions comprising same
Patent number
11,932,713
Issue date
Mar 19, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
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Patent Grant
Positive resist composition and pattern forming process
Patent number
11,914,294
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Manufacturing method of semiconductor device and semiconductor proc...
Patent number
11,899,368
Issue date
Feb 13, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Kai Chen
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Storage container storing treatment liquid for manufacturing semico...
Patent number
11,892,775
Issue date
Feb 6, 2024
FUJIFILM Corporation
Tetsuya Shimizu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Photoresist compositions and pattern formation methods
Patent number
11,880,135
Issue date
Jan 23, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
C07 - ORGANIC CHEMISTRY
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Negative type photosensitive siloxane composition and methods for p...
Patent number
11,868,048
Issue date
Jan 9, 2024
Merck Patent GmbH
Masanobu Hayashi
C07 - ORGANIC CHEMISTRY
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Patent Grant
Photoresist compositions and methods
Patent number
11,829,069
Issue date
Nov 28, 2023
Rohm and Haas Electronic Materials LLC
Joshua Kaitz
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Negative-type photosensitive resin composition, cured film, element...
Patent number
11,822,243
Issue date
Nov 21, 2023
Toray Industries, Inc.
Yugo Tanigaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive compositions, quantum dot polymer composite pattern...
Patent number
11,815,800
Issue date
Nov 14, 2023
Samsung Electronics Co., Ltd.
Jonggi Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Pattern forming method and template manufacturing method
Patent number
11,809,082
Issue date
Nov 7, 2023
Kioxia Corporation
Mitsuru Kondo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Method of forming a patterned structure and device thereof
Patent number
11,803,125
Issue date
Oct 31, 2023
Singapore University of Technology and Design
You Sin Tan
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Radiation-sensitive composition and pattern-forming method
Patent number
11,796,912
Issue date
Oct 24, 2023
JSR Corporation
Motohiro Shiratani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Salt and photoresist composition containing the same
Patent number
11,782,342
Issue date
Oct 10, 2023
Sumitomo Chemical Company, Limited
Katsuhiro Komuro
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Bottom antireflective coating materials
Patent number
11,782,345
Issue date
Oct 10, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chien-Chih Chen
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Lithography patterning technique
Patent number
11,774,855
Issue date
Oct 3, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Lilin Chang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
Patent number
11,768,434
Issue date
Sep 26, 2023
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method and apparatus of patterning a semiconductor device
Patent number
11,762,296
Issue date
Sep 19, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silicon-containing underlayers
Patent number
11,733,609
Issue date
Aug 22, 2023
Rohm and Haas Electronic Materials LLC
Charlotte A. Cutler
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Thermal conductive layer, photosensitive layer, photosensitive comp...
Patent number
11,697,754
Issue date
Jul 11, 2023
FUJIFILM Corporation
Kosuke Yamashita
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Patents Applications
last 30 patents
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Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240149197
Publication date
May 9, 2024
FUJIFILM CORPORATION
Hiroyuki YONEZAWA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
Publication number
20240142876
Publication date
May 2, 2024
JSR Corporation
Hiroyuki MIYAUCHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTORESIST UNDERLAYER COMPOSITION
Publication number
20240126172
Publication date
Apr 18, 2024
Rohm and Haas Electronic Materials L.L.C.
Anton CHAVEZ
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Application
Polymer, Resist Composition, And Patterning Process
Publication number
20240118617
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING M...
Publication number
20240103374
Publication date
Mar 28, 2024
FUJIFILM CORPORATION
Tetsuya SHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...
Publication number
20240085791
Publication date
Mar 14, 2024
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Seung-Keun KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20230393464
Publication date
Dec 7, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Li-Po YANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230393470
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND...
Publication number
20230384671
Publication date
Nov 30, 2023
FUJIFILM CORPORATION
Shumpei WATANABE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR DEVELOPING AND METHOD OF FORMING PATTERN USING THE...
Publication number
20230375936
Publication date
Nov 23, 2023
SAMSUNG ELECTRONICS CO,. LTD.
Sangjin KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
Publication number
20230367213
Publication date
Nov 16, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
Publication number
20230367216
Publication date
Nov 16, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chien-Chih Chen
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
A Lithographic Printing Plate Precursor
Publication number
20230350291
Publication date
Nov 2, 2023
AGFA Offset BV
Thomas Billiet
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...
Publication number
20230340266
Publication date
Oct 26, 2023
JSR Corporation
Tomoaki SEKO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC...
Publication number
20230333479
Publication date
Oct 19, 2023
FUJIFILM CORPORATION
Kazuki WATANABE
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
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Patent Application
AQUEOUS DEVELOPER FOR FLEXOGRAPHIC PRINTING PLATE AND MANUFACTURING...
Publication number
20230294393
Publication date
Sep 21, 2023
FUJIFILM CORPORATION
Masato SHIRAKAWA
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
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Patent Application
Photoresist and Method of Formation and Use
Publication number
20230251571
Publication date
Aug 10, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Keng-Chu Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE AND PHOTORESIST COM...
Publication number
20230236507
Publication date
Jul 27, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Tzu-Yang LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
AQUEOUS DEVELOPER FOR FLEXOGRAPHIC PRINTING PLATE AND MANUFACTURING...
Publication number
20230221647
Publication date
Jul 13, 2023
FUJIFILM CORPORATION
Masato SHIRAKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPP...
Publication number
20230213857
Publication date
Jul 6, 2023
NISSAN CHEMICAL CORPORATION
Satoshi KAMIBAYASHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230194986
Publication date
Jun 22, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
Publication number
20230161246
Publication date
May 25, 2023
NISSAN CHEMICAL CORPORATION
Hikaru TOKUNAGA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM-FORMING COMPOSITION
Publication number
20230152700
Publication date
May 18, 2023
NISSAN CHEMICAL CORPORATION
Wataru SHIBAYAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM-FORMING COMPOSITION
Publication number
20230152699
Publication date
May 18, 2023
NISSAN CHEMICAL CORPORATION
Kodai KATO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20230132653
Publication date
May 4, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION SENSITIVE COMPOSITION
Publication number
20230125270
Publication date
Apr 27, 2023
Nissan Chemical Industries, Ltd.
Makoto NAKAJIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230118534
Publication date
Apr 20, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
Publication number
20230123180
Publication date
Apr 20, 2023
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM
Publication number
20230109843
Publication date
Apr 13, 2023
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Jong Han YANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...
Publication number
20230094313
Publication date
Mar 30, 2023
Rohm and Haas Electronic Materials L.L.C.
Emad Aqad
C07 - ORGANIC CHEMISTRY