by plasma EUV sources

Industry

CPC
G03F7/70033

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70033by plasma EUV sources

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for coating photo resist over a substrate
- Patent number 12,362,179
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Hung Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation collector
- Patent number 12,360,458
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng Hung Tsai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV radiation system including maximizing droplet velocity change t...
- Patent number 12,363,818
- Issue date Jul 15, 2025
- ASML Netherlands B.V.
- Gijs Dingemans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,353,142
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices and pattern formation...
- Patent number 12,354,874
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,023
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical assembly with coating and methods of use
- Patent number 12,346,020
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for and method of monitoring droplets in a droplet stream
- Patent number 12,339,214
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Joshua Mark Lukens
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic system provided with a deflection apparatus for changi...
- Patent number 12,332,570
- Issue date Jun 17, 2025
- ASML Holding N.V.
- Ronald Peter Albright
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target control in extreme ultraviolet lithography systems using abe...
- Patent number 12,332,571
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-performance EUV microscope with free form illumination system
- Patent number 12,332,188
- Issue date Jun 17, 2025
- ESOL, Inc.
- Dong Gun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,332,575
- Issue date Jun 17, 2025
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical component
- Patent number 12,326,663
- Issue date Jun 10, 2025
- Carl Zeiss SMT GmbH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for forming a patterned layer of material
- Patent number 12,325,911
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Tamara Druzhinina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling droplet generator performance
- Patent number 12,324,084
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Pooriya Beyhaghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source device and protection method for r...
- Patent number 12,321,107
- Issue date Jun 3, 2025
- USHIO DENKI KABUSHIKI KAISHA
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 12,309,908
- Issue date May 20, 2025
- Gigaphoton Inc.
- Atsushi Ueda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of manufacturing integrated circuit device
- Patent number 12,300,490
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Sookyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet generator and method of servicing extreme ultraviolet imagi...
- Patent number 12,302,484
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chih Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Width adjustment of EUV radiation beam
- Patent number 12,292,687
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insert for a source chamber of an EUV radiation source
- Patent number 12,292,690
- Issue date May 6, 2025
- Carl Zeiss SMT GmbH
- Michael Hagg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid droplet generator for extreme ultraviolet light sources in l...
- Patent number 12,295,088
- Issue date May 6, 2025
- ASML Netherlands B.V.
- Benjamin Andrew Sams
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Low-temperature direct growth method of multilayer graphene, pellic...
- Patent number 12,287,568
- Issue date Apr 29, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for operating an EUV lithography apparatus, and EUV lithogra...
- Patent number 12,287,588
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Moritz Becker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target delivery system
- Patent number 12,273,986
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,265,336
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20250231482
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20250234444
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Shogo KITASAKA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250231481
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231483
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20250234445
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20250224662
- Publication date Jul 10, 2025
- ASML NETHERLANDS B.V.
- Paul Alexander VERMEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
- Publication number 20250224675
- Publication date Jul 10, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WIDTH ADJUSTMENT OF EUV RADIATION BEAM
- Publication number 20250216789
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...
- Publication number 20250216793
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Soojung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250216780
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...
- Publication number 20250218718
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
- Publication number 20250216792
- Publication date Jul 3, 2025
- Carl Zeiss SMT GMBH
- Joerg ZIMMERMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...
- Publication number 20250207247
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208511
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LIGHT SOURCE, EUV LITHOGRAPHY APPARATUS, AND METHOD FOR GENERAT...
- Publication number 20250208513
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Kyungwan YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY
- Publication number 20250208517
- Publication date Jun 26, 2025
- Brewer Science, Inc.
- Si Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE EQUIPMENT
- Publication number 20250208519
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Jisu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION ARRANGEMENT FOR A METROLOGY DEVICE AND ASSOCIATED METHOD
- Publication number 20250207978
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Theodorus Thomas Marinus VAN SCHAIJK
- G01 - MEASURING TESTING
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208512
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...
- Publication number 20250201577
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Jiyeon YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTROMECHANICAL DEVICE
- Publication number 20250199414
- Publication date Jun 19, 2025
- ROBERT BOSCH GmbH
- Ralf NOLTEMEYER
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...
- Publication number 20250197782
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...
- Publication number 20250172875
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250164875
- Publication date May 22, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164878
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

by plasma EUV sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for coating photo resist over a substrate

Radiation collector

EUV radiation system including maximizing droplet velocity change t...

Semiconductor processing tool and methods of operation

Method of manufacturing semiconductor devices and pattern formation...

Optical assembly with coating and methods of use

Optical assembly with coating and methods of use

Apparatus for and method of monitoring droplets in a droplet stream

Lithographic system provided with a deflection apparatus for changi...

Target control in extreme ultraviolet lithography systems using abe...

High-performance EUV microscope with free form illumination system

Target supply system, extreme ultraviolet light generation apparatu...

Optical component

Method and apparatus for forming a patterned layer of material

Apparatus for and method of controlling droplet generator performance

Extreme ultraviolet light source device and protection method for r...

Method for generating EUV radiation

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Extreme ultraviolet light generation apparatus and electronic devic...

Method of manufacturing integrated circuit device

Droplet generator and method of servicing extreme ultraviolet imagi...

Width adjustment of EUV radiation beam

Insert for a source chamber of an EUV radiation source

Hybrid droplet generator for extreme ultraviolet light sources in l...

Low-temperature direct growth method of multilayer graphene, pellic...

Method for operating an EUV lithography apparatus, and EUV lithogra...

Method for controlling extreme ultraviolet light

Method of manufacturing a semiconductor device

Target delivery system

Semiconductor processing tool and methods of operation

Patents Applicationslast 30 patents

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

PELLICLE FOR EUV LITHOGRAPHY

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

WIDTH ADJUSTMENT OF EUV RADIATION BEAM

METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND E...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

CONTAMINATION PREVENTION DEVICE FOR EXTREME ULTRA-VIOLET (EUV) RETI...

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM

METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...

Compound For Forming Metal-Containing Film, Composition For Forming...

EUV LIGHT SOURCE, EUV LITHOGRAPHY APPARATUS, AND METHOD FOR GENERAT...

ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY

EXPOSURE EQUIPMENT

ILLUMINATION ARRANGEMENT FOR A METROLOGY DEVICE AND ASSOCIATED METHOD

Compound For Forming Metal-Containing Film, Composition For Forming...

METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...

MICROELECTROMECHANICAL DEVICE

RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

RESIST COMPOSITION AND PATTERN FORMING PROCESS