by pulsed sources

Industry

CPC
G03F7/70041

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70041by pulsed sources

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for and methods of combining multiple laser beams
- Patent number 12,298,670
- Issue date May 13, 2025
- Cymer, LLC
- Rabin Paudel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure system, laser control parameter production method, and ele...
- Patent number 12,216,409
- Issue date Feb 4, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure system and method for manufacturing electronic devices
- Patent number 12,197,132
- Issue date Jan 14, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source generation apparatus, light source generating method,...
- Patent number 12,191,621
- Issue date Jan 7, 2025
- National Tsing Hua University
- Andrew Hing Cheong Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High voltage pulse generation device, gas laser apparatus, and elec...
- Patent number 12,166,329
- Issue date Dec 10, 2024
- National University Corporation Nagaoka University of Technology
- Weihua Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowed gas laser apparatus, control method therefor, electro...
- Patent number 12,140,869
- Issue date Nov 12, 2024
- Gigaphoton Inc.
- Yousuke Fujimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation system for controlling bursts of pulses of radiation
- Patent number 12,130,558
- Issue date Oct 29, 2024
- Cymer, LLC
- Yingbo Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method, exposure system, and method for manufacturing elec...
- Patent number 12,105,425
- Issue date Oct 1, 2024
- Gigaphoton Inc.
- Koichi Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line narrowed gas laser apparatus, control method therefor, electro...
- Patent number 12,105,426
- Issue date Oct 1, 2024
- Gigaphoton Inc.
- Yousuke Fujimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse width expansion apparatus and electronic device manufacturing...
- Patent number 12,038,567
- Issue date Jul 16, 2024
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Burst statistics data aggregation filter
- Patent number 12,007,696
- Issue date Jun 11, 2024
- Cymer, LLC
- Matthew Minakais
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 12,001,144
- Issue date Jun 4, 2024
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 11,953,831
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Shoichi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy correction module for an optical source apparatus
- Patent number 11,947,268
- Issue date Apr 2, 2024
- Cymer, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling droplet in extreme ultraviolet...
- Patent number 11,914,302
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,768,438
- Issue date Sep 26, 2023
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser system and method for manufacturing electronic device
- Patent number 11,764,541
- Issue date Sep 19, 2023
- Gigaphoton Inc.
- Taisuke Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed light generation device, pulsed light generation method, exp...
- Patent number 11,757,247
- Issue date Sep 12, 2023
- Nikon Corporation
- Akira Tokuhisa
- G01 - MEASURING TESTING
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,686,951
- Issue date Jun 27, 2023
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser and drum control for continuous generation of broadband light
- Patent number 11,617,256
- Issue date Mar 28, 2023
- KLA Corporation
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser processing method and laser processing system
- Patent number 11,604,416
- Issue date Mar 14, 2023
- Gigaphoton Inc.
- Koji Kakizaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse stretcher and method
- Patent number 11,569,628
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Herman Philip Godfried
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light generation system and electronic device m...
- Patent number 11,553,583
- Issue date Jan 10, 2023
- Gigaphoton Inc.
- Takayuki Yabu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 11,526,082
- Issue date Dec 13, 2022
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,526,083
- Issue date Dec 13, 2022
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser apparatus for generating extreme ultraviolet light
- Patent number 11,477,877
- Issue date Oct 18, 2022
- Gigaphoton Inc.
- Hitoshi Nagano
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV chamber apparatus, extreme ultraviolet light generation system,...
- Patent number 11,452,196
- Issue date Sep 20, 2022
- Gigaphoton Inc.
- Kouichiro Kouge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS
- Publication number 20250237961
- Publication date Jul 24, 2025
- CYMER, LLC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...
- Publication number 20250237960
- Publication date Jul 24, 2025
- Carl Zeiss SMS Ltd.
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250233382
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Takamitsu KOMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250208516
- Publication date Jun 26, 2025
- Gigaphoton Inc.
- Yousuke FUJIMAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD
- Publication number 20250199416
- Publication date Jun 19, 2025
- Gigaphoton Inc.
- Akira SUWA
- G02 - OPTICS
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250183611
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Keita KOUZAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250180933
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...
- Publication number 20250174956
- Publication date May 29, 2025
- TRUMPF LASER GMBH
- Jonathan Brons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE DISPLAY DEVICE, LASER DEVICE, AND ELECTRONIC DEVICE MANUFAC...
- Publication number 20250155819
- Publication date May 15, 2025
- Gigaphoton Inc.
- Yutaka IGARASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR AND METHOD OF CONDITIONING LASER ELECTRODES
- Publication number 20250155821
- Publication date May 15, 2025
- CYMER, LLC
- Yuda Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...
- Publication number 20250137844
- Publication date May 1, 2025
- KLA Corporation
- Earl Jensen
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20240429672
- Publication date Dec 26, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LINE NARROWING LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING ME...
- Publication number 20240413600
- Publication date Dec 12, 2024
- Gigaphoton Inc.
- Shigeto KISHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...
- Publication number 20240353758
- Publication date Oct 24, 2024
- University of Pittsburgh of the Commonwealth System of Higher Education
- Hrvoje Petek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE
- Publication number 20240319612
- Publication date Sep 26, 2024
- CYMER, LLC
- Russell Allen BURDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...
- Publication number 20240322521
- Publication date Sep 26, 2024
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20240310736
- Publication date Sep 19, 2024
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEPOSITING LAYERS OF MATERIALS ON SUBSTRATES AND STRUCT...
- Publication number 20240302748
- Publication date Sep 12, 2024
- ASM IP HOLDING B.V.
- João Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...
- Publication number 20240291220
- Publication date Aug 29, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- G02 - OPTICS
Information Patent Application
OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MAN...
- Publication number 20240291219
- Publication date Aug 29, 2024
- Gigaphoton Inc.
- Yuki TAMARU
- G02 - OPTICS
Information Patent Application
PULSED POWER SYSTEMS WITH CONTROLLED REACTOR RESET
- Publication number 20240283210
- Publication date Aug 22, 2024
- CYMER, LLC
- Paul Christopher Melcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSE STRETCHER AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240258757
- Publication date Aug 1, 2024
- Gigaphoton Inc.
- Yousuke FUJIMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC MODULE FOR A MAGNETIC SWITCHING NETWORK TO PRODUCE A PUL...
- Publication number 20240222927
- Publication date Jul 4, 2024
- CYMER, LLC
- Paul Christopher Melcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20240184220
- Publication date Jun 6, 2024
- Gigaphoton Inc.
- Yuichi NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM
- Publication number 20240170905
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Herman Philip GODFRIED
- H01 - BASIC ELECTRIC ELEMENTS

by pulsed sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for and methods of combining multiple laser beams

Method for controlling extreme ultraviolet light

Exposure system, laser control parameter production method, and ele...

Exposure system and method for manufacturing electronic devices

Light source generation apparatus, light source generating method,...

Calibration system for an extreme ultraviolet light source

High voltage pulse generation device, gas laser apparatus, and elec...

Line narrowed gas laser apparatus, control method therefor, electro...

Radiation system for controlling bursts of pulses of radiation

Exposure method, exposure system, and method for manufacturing elec...

Line narrowed gas laser apparatus, control method therefor, electro...

Laser system for target metrology and alteration in an EUV light so...

Pulse width expansion apparatus and electronic device manufacturing...

Burst statistics data aggregation filter

Forming multiple aerial images in a single lithography exposure pass

Photosensitive composition

Energy correction module for an optical source apparatus

Method and apparatus for controlling droplet in extreme ultraviolet...

Spectral feature selection and pulse timing control of a pulsed lig...

Laser system and method for manufacturing electronic device

Pulsed light generation device, pulsed light generation method, exp...

Reducing speckle in an excimer light source

Laser and drum control for continuous generation of broadband light

Laser processing method and laser processing system

Pulse stretcher and method

Extreme ultraviolet light generation system and electronic device m...

Forming multiple aerial images in a single lithography exposure pass

Spectral feature selection and pulse timing control of a pulsed lig...

Laser apparatus for generating extreme ultraviolet light

EUV chamber apparatus, extreme ultraviolet light generation system,...

Patents Applicationslast 30 patents

APPARATUS FOR AND METHODS OF COMBINING MULTIPLE LASER BEAMS

METHODS, COMPUTER PROGRAMS AND APPARATUSES FOR TREATING AN OPTICAL...

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...

PROFILE DISPLAY DEVICE, LASER DEVICE, AND ELECTRONIC DEVICE MANUFAC...

APPARATUS FOR AND METHOD OF CONDITIONING LASER ELECTRODES

METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

LINE NARROWING LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING ME...

LITHOGRAPHY SYSTEM AND METHODS

SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...

PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE

ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

METHODS FOR DEPOSITING LAYERS OF MATERIALS ON SUBSTRATES AND STRUCT...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...

OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MAN...

PULSED POWER SYSTEMS WITH CONTROLLED REACTOR RESET

PULSE STRETCHER AND ELECTRONIC DEVICE MANUFACTURING METHOD

ELECTRONIC MODULE FOR A MAGNETIC SWITCHING NETWORK TO PRODUCE A PUL...

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

LASER SYSTEM