Capping layer

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CPC
Y10S438/902

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

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Y10S438/902Capping layer

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Patents Grantslast 30 patents

Information Patent Grant
Ultra-thin film formation using gas cluster ion beam processing
- Patent number 8,226,835
- Issue date Jul 24, 2012
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device having an organic anti-reflective coating (ARC...
- Patent number 8,039,389
- Issue date Oct 18, 2011
- FREESCALE SEMICONDUCTOR, INC.
- Douglas M. Reber
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method using multiple layer annealing cap for fabricating group III...
- Patent number 7,977,224
- Issue date Jul 12, 2011
- The United States of America as represented by the Secretary of the Army
- Carl Emmett Hager, IV
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of improving adhesion between two dielectric films
- Patent number 7,705,431
- Issue date Apr 27, 2010
- Novellius Systems, Inc.
- Mahesh Sanganeria
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving adhesion between two dielectric films
- Patent number 7,622,380
- Issue date Nov 24, 2009
- Novellus Systems, Inc.
- Mahesh Sanganeria
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical treatment of semiconductor substrates
- Patent number 7,314,837
- Issue date Jan 1, 2008
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer film stack for extinction of substrate reflections duri...
- Patent number 7,291,552
- Issue date Nov 6, 2007
- Intel Corporation
- Sanjay S. Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to strain NMOS devices while mitigating dopant diffusion for...
- Patent number 7,211,481
- Issue date May 1, 2007
- Texas Instruments Incorporated
- Manoj Mehrotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an organic anti-reflective coating (ARC...
- Patent number 7,199,429
- Issue date Apr 3, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Douglas M. Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer film stack for extinction of substrate reflections duri...
- Patent number 7,172,960
- Issue date Feb 6, 2007
- Intel Corporation
- Sanjay S. Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing tungsten film roughness and improving step cove...
- Patent number 7,141,494
- Issue date Nov 28, 2006
- Novellus Systems, Inc.
- Sang-Hyeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect-free semiconductor templates for epitaxial growth
- Patent number 7,101,444
- Issue date Sep 5, 2006
- NL Nanosemiconductor GmbH
- Vitaly Shchukin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an apparatus including a sealed cavity
- Patent number 7,091,601
- Issue date Aug 15, 2006
- Joel A. Philliber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming capping layer over metal wire structure using selective ato...
- Patent number 7,084,060
- Issue date Aug 1, 2006
- International Business Machines Corporation
- Toshiharu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell with selective deposition of refractory metals
- Patent number 7,078,755
- Issue date Jul 18, 2006
- Micron Technology, Inc.
- Allen McTeer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical treatment of semiconductor substrates
- Patent number 7,008,885
- Issue date Mar 7, 2006
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an organic anti-reflective coating (ARC...
- Patent number 6,972,255
- Issue date Dec 6, 2005
- FREESCALE SEMICONDUCTOR, INC.
- Douglas M. Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving adhesion between two dielectric films
- Patent number 6,972,252
- Issue date Dec 6, 2005
- Novellus Systems, Inc.
- Mahesh Sanganeria
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming nitride films
- Patent number 6,929,831
- Issue date Aug 16, 2005
- Trikon Holdings Limited
- Jashu Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making an ultimate low dielectric device
- Patent number 6,913,946
- Issue date Jul 5, 2005
- Aptos Corporation
- Charles Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Site-specific methodology for localization and analyzing junction d...
- Patent number 6,884,641
- Issue date Apr 26, 2005
- International Business Machines Corporation
- John Bruley
- G01 - MEASURING TESTING
Information Patent Grant
Method for forming contact hole of semiconductor device
- Patent number 6,838,369
- Issue date Jan 4, 2005
- Hynix Semiconductor Inc.
- Ho Seok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a self-aligned contact hole in a semiconductor d...
- Patent number 6,808,975
- Issue date Oct 26, 2004
- Samsung Electronics Co., Ltd.
- Jong-Heui Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for capping over a copper layer
- Patent number 6,790,778
- Issue date Sep 14, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Lung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having buried metal wi...
- Patent number 6,787,462
- Issue date Sep 7, 2004
- Kabushiki Kaisha Toshiba
- Tadashi Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect-free semiconductor templates for epitaxial growth and method...
- Patent number 6,784,074
- Issue date Aug 31, 2004
- NSC Nanosemiconductor GmbH
- Vitaly Shchukin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device capable of reducing sea...
- Patent number 6,784,084
- Issue date Aug 31, 2004
- Hynix Semiconductor Inc.
- Hyeok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical treatment of semiconductor substrates
- Patent number 6,774,058
- Issue date Aug 10, 2004
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a capping layer over a low-k dielectric with imp...
- Patent number 6,756,321
- Issue date Jun 29, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Chi Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a gate with metal silicide
- Patent number 6,689,673
- Issue date Feb 10, 2004
- United Microelectronics Corp.
- Kirk Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ULTRA-THIN FILM FORMATION USING GAS CLUSTER ION BEAM PROCESSING
- Publication number 20100227142
- Publication date Sep 9, 2010
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Using Multiple Layer Annealing Cap for Fabricating Group III...
- Publication number 20100133656
- Publication date Jun 3, 2010
- United States Government as represented by the Secretary of the Army
- CARL EMMETT HAGER, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN ORGANIC ANTI-REFLECTIVE COATING (ARC...
- Publication number 20070141770
- Publication date Jun 21, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Douglas M. Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Memory cell with selective deposition of refractory metals
- Publication number 20070012987
- Publication date Jan 18, 2007
- Allen McTeer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to strain NMOS devices while mitigating dopant diffusion for...
- Publication number 20060189048
- Publication date Aug 24, 2006
- TEXAS INSTRUMENTS INCORPORATED
- Manoj Mehrotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical treatment of semiconductor substrates
- Publication number 20060128164
- Publication date Jun 15, 2006
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer film stack for extinction of substrate reflections duri...
- Publication number 20060094251
- Publication date May 4, 2006
- Sanjay S. Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer film stack for extinction of substrate reflections duri...
- Publication number 20060086954
- Publication date Apr 27, 2006
- Sanjay S. Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating an apparatus including a sealed cavity and an...
- Publication number 20050242419
- Publication date Nov 3, 2005
- Joel A. Philliber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having an organic anti-reflective coating (ARC...
- Publication number 20050181596
- Publication date Aug 18, 2005
- Douglas M. Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SITE-SPECIFIC METHODOLOGY FOR LOCALIZATION AND ANALYZING JUNCTION D...
- Publication number 20050064610
- Publication date Mar 24, 2005
- International Business Machines Corporation
- JOHN BRULEY
- G01 - MEASURING TESTING
Information Patent Application
Method for reducing tungsten film roughness and improving step cove...
- Publication number 20050031786
- Publication date Feb 10, 2005
- Novellus Systems, Inc.
- Sang-Hyeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having an organic anti-reflective coating (ARC...
- Publication number 20050026338
- Publication date Feb 3, 2005
- Douglas M. Reber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical treatment of semiconductor substrates
- Publication number 20050009308
- Publication date Jan 13, 2005
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ultimate low dielectric device and method of making the same
- Publication number 20040253801
- Publication date Dec 16, 2004
- Aptos Corporation
- Charles Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE
- Publication number 20040214421
- Publication date Oct 28, 2004
- Ho Seok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect-free semiconductor templates for epitaxial growth
- Publication number 20040150001
- Publication date Aug 5, 2004
- Vitaly Shchukin
- C30 - CRYSTAL GROWTH
Information Patent Application
Semiconductor device and method of making same
- Publication number 20040087055
- Publication date May 6, 2004
- NSC-Nanosemiconductor GmbH
- Nikolai Ledentsov
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE CAPABLE OF REDUCING SEA...
- Publication number 20040082162
- Publication date Apr 29, 2004
- Hyeok Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a capping layer over a low-k dielectric with imp...
- Publication number 20040067658
- Publication date Apr 8, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Chi Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a self-aligned contact hole in a semiconductor d...
- Publication number 20040005786
- Publication date Jan 8, 2004
- Jong-Heui Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect-free semiconductor templates for epitaxial growth and method...
- Publication number 20030203531
- Publication date Oct 30, 2003
- Vitaly Shchukin
- C30 - CRYSTAL GROWTH
Information Patent Application
Methods of forming nitride films
- Publication number 20030118872
- Publication date Jun 26, 2003
- Jashu Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integrated circuit device having cyanate ester buffer coat and meth...
- Publication number 20020195687
- Publication date Dec 26, 2002
- Micron Technology, Inc.
- J. Mike Brooks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Memory cell with selective deposition of refractory metals
- Publication number 20020179956
- Publication date Dec 5, 2002
- Allen McTeer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of making same
- Publication number 20020167022
- Publication date Nov 14, 2002
- Nikolai Ledentsov
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing semiconductor device having buried metal wi...
- Publication number 20020142622
- Publication date Oct 3, 2002
- Kabushiki Kaisha Toshiba
- Tadashi Iijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical treatment of semiconductor substrates
- Publication number 20020098662
- Publication date Jul 25, 2002
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer film stack for extinction of substrate reflections duri...
- Publication number 20020079558
- Publication date Jun 27, 2002
- Sanjay S. Natarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon wafer with embedded optoelectronic material for monolithic...
- Publication number 20020066899
- Publication date Jun 6, 2002
- Eugene A. Fitzergald
- G02 - OPTICS

Capping layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ultra-thin film formation using gas cluster ion beam processing

Semiconductor device having an organic anti-reflective coating (ARC...

Method using multiple layer annealing cap for fabricating group III...

Method of improving adhesion between two dielectric films

Method of improving adhesion between two dielectric films

Chemical treatment of semiconductor substrates

Multi-layer film stack for extinction of substrate reflections duri...

Method to strain NMOS devices while mitigating dopant diffusion for...

Semiconductor device having an organic anti-reflective coating (ARC...

Multi-layer film stack for extinction of substrate reflections duri...

Method for reducing tungsten film roughness and improving step cove...

Defect-free semiconductor templates for epitaxial growth

Method of fabricating an apparatus including a sealed cavity

Forming capping layer over metal wire structure using selective ato...

Memory cell with selective deposition of refractory metals

Chemical treatment of semiconductor substrates

Semiconductor device having an organic anti-reflective coating (ARC...

Method of improving adhesion between two dielectric films

Methods of forming nitride films

Method of making an ultimate low dielectric device

Site-specific methodology for localization and analyzing junction d...

Method for forming contact hole of semiconductor device

Method for forming a self-aligned contact hole in a semiconductor d...

Method for capping over a copper layer

Method of manufacturing semiconductor device having buried metal wi...

Defect-free semiconductor templates for epitaxial growth and method...

Method for fabricating semiconductor device capable of reducing sea...

Chemical treatment of semiconductor substrates

Method for forming a capping layer over a low-k dielectric with imp...

Method for forming a gate with metal silicide

Patents Applicationslast 30 patents

ULTRA-THIN FILM FORMATION USING GAS CLUSTER ION BEAM PROCESSING

Method Using Multiple Layer Annealing Cap for Fabricating Group III...

SEMICONDUCTOR DEVICE HAVING AN ORGANIC ANTI-REFLECTIVE COATING (ARC...

Memory cell with selective deposition of refractory metals

Method to strain NMOS devices while mitigating dopant diffusion for...

Chemical treatment of semiconductor substrates

Multi-layer film stack for extinction of substrate reflections duri...

Multi-layer film stack for extinction of substrate reflections duri...

Method of fabricating an apparatus including a sealed cavity and an...

Semiconductor device having an organic anti-reflective coating (ARC...

SITE-SPECIFIC METHODOLOGY FOR LOCALIZATION AND ANALYZING JUNCTION D...

Method for reducing tungsten film roughness and improving step cove...

Semiconductor device having an organic anti-reflective coating (ARC...

Chemical treatment of semiconductor substrates

Ultimate low dielectric device and method of making the same

METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE

Defect-free semiconductor templates for epitaxial growth

Semiconductor device and method of making same

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE CAPABLE OF REDUCING SEA...

Method for forming a capping layer over a low-k dielectric with imp...

Method for forming a self-aligned contact hole in a semiconductor d...

Defect-free semiconductor templates for epitaxial growth and method...

Methods of forming nitride films

Integrated circuit device having cyanate ester buffer coat and meth...

Memory cell with selective deposition of refractory metals

Semiconductor device and method of making same

Method of manufacturing semiconductor device having buried metal wi...

Chemical treatment of semiconductor substrates

Multi-layer film stack for extinction of substrate reflections duri...

Silicon wafer with embedded optoelectronic material for monolithic...