Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

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G03F7/0043

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0043Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

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Patents Grantslast 30 patents

Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-performance metal grids for solar cells formed by cracked film...
- Patent number 12,132,129
- Issue date Oct 29, 2024
- Alliance for Sustainable Energy, LLC
- Christopher Paul Muzzillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 12,105,418
- Issue date Oct 1, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
- Patent number 12,055,852
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Shang Hyeun Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing resist layer, method of forming a pattern and m...
- Patent number 12,013,645
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositio...
- Patent number 11,988,959
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,988,961
- Issue date May 21, 2024
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a picoscopic scale/ nanoscopic scale circuit pattern
- Patent number 11,953,828
- Issue date Apr 9, 2024
- LONGSERVING TECHNOLOGY CO., LTD
- Ko-Cheng Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,934,101
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating copolymer chain scission photoresists
- Patent number 11,906,901
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 11,868,046
- Issue date Jan 9, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Multi-metal fill with self-aligned patterning and dielectric with v...
- Patent number 11,860,550
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-I Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chain scission photoresists and methods for forming chain scission...
- Patent number 11,846,883
- Issue date Dec 19, 2023
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250224682
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Jin-Hee BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...
- Publication number 20250226236
- Publication date Jul 10, 2025
- Resonac Corporation
- Yuko KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216779
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Sanghee JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216778
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Sumin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT FOR METAL-OXIDE PHOTO RESISTS
- Publication number 20250180987
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- NASRIN KAZEM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20250164891
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250155804
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Min-Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...
- Publication number 20250138416
- Publication date May 1, 2025
- Inha University Research and Business Foundation
- JIN-KYUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATION OF MULTILINE ETCH SUBSTRATES
- Publication number 20250132166
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250130491
- Publication date Apr 24, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...
- Publication number 20250110407
- Publication date Apr 3, 2025
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250076756
- Publication date Mar 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250053086
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- MADHUR SACHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...
- Publication number 20250054759
- Publication date Feb 13, 2025
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ATOMIC LAYER ETCH OF Si-BASED MATERIALS
- Publication number 20250046614
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Mehrdad Rostami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...
- Publication number 20240427237
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Publication number 20240419081
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Lin ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE
- Publication number 20240402598
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAMATERIAL AND LAMINATE
- Publication number 20240402597
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE
- Publication number 20240379376
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...
- Publication number 20240369922
- Publication date Nov 7, 2024
- FUJIFILM CORPORATION
- Kentaro TOYOOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...
- Publication number 20240369931
- Publication date Nov 7, 2024
- JSR Corporation
- Yuki OZAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal oxide resists for EUV patterning and methods for developing t...

Semiconductor photoresist composition and method of forming pattern...

Treatment liquid and pattern forming method

Organotin oxide hydroxide patterning compositions, precursors, and...

Photosensitive, inorganic ligand-capped inorganic nanocrystals

Organometallic solution based high resolution patterning compositions

Method of forming an enhanced unexposed photoresist layer

Metal-compound-removing solvent and method in lithography

Organometallic solution based high resolution patterning compositions

High-performance metal grids for solar cells formed by cracked film...

Film processing method

Photoresist development with halide chemistries

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Vapor phase thermal etch solutions for metal oxo photoresists

Photosensitive compositions, preparation methods thereof, and quant...

Vapor phase thermal etch solutions for metal oxo photoresists

Method for removing resist layer, method of forming a pattern and m...

Organometallic solution based high resolution patterning compositio...

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Radiation based patterning methods

Organometallic solution based high resolution patterning compositions

Method of making a picoscopic scale/ nanoscopic scale circuit pattern

Photoresist composition and method of forming photoresist pattern

Alternating copolymer chain scission photoresists

Deposition of semiconductor integration films

Ligand-capped main group nanoparticles as high absorption extreme u...

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Multi-metal fill with self-aligned patterning and dielectric with v...

Chain scission photoresists and methods for forming chain scission...

Patents Applicationslast 30 patents

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACK...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

DRY DEVELOPMENT FOR METAL-OXIDE PHOTO RESISTS

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

PHOTORESIST COMPOSITION

RESIST COMPOSITIONS, METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE...

GENERATION OF MULTILINE ETCH SUBSTRATES

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

Compound For Forming Metal-Containing Film, Composition For Forming...

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

POST DEVELOPMENT TREATMENT FOR METAL-OXIDE PHOTORESISTS

METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...

SELECTIVE ATOMIC LAYER ETCH OF Si-BASED MATERIALS

RADIATION BASED PATTERNING METHODS

STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS

Compound For Forming Metal-Containing Film, Composition For Forming...

BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE

METAMATERIAL AND LAMINATE

IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE

TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...

METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES