Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Industry

CPC
G03F7/0043

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0043Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Industries

Patents Grantslast 30 patents

Information Patent Grant
High-performance metal grids for solar cells formed by cracked film...
- Patent number 12,132,129
- Issue date Oct 29, 2024
- Alliance for Sustainable Energy, LLC
- Christopher Paul Muzzillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 12,105,418
- Issue date Oct 1, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photosensitive compositions, preparation methods thereof, and quant...
- Patent number 12,055,852
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Shang Hyeun Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing resist layer, method of forming a pattern and m...
- Patent number 12,013,645
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic solution based high resolution patterning compositio...
- Patent number 11,988,959
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,988,961
- Issue date May 21, 2024
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a picoscopic scale/ nanoscopic scale circuit pattern
- Patent number 11,953,828
- Issue date Apr 9, 2024
- LONGSERVING TECHNOLOGY CO., LTD
- Ko-Cheng Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,934,101
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating copolymer chain scission photoresists
- Patent number 11,906,901
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ligand-capped main group nanoparticles as high absorption extreme u...
- Patent number 11,874,600
- Issue date Jan 16, 2024
- Intel Corporation
- Marie Krysak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...
- Patent number 11,868,046
- Issue date Jan 9, 2024
- Inpria Corporation
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Multi-metal fill with self-aligned patterning and dielectric with v...
- Patent number 11,860,550
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-I Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chain scission photoresists and methods for forming chain scission...
- Patent number 11,846,883
- Issue date Dec 19, 2023
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 11,809,081
- Issue date Nov 7, 2023
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive composition and pattern-forming method
- Patent number 11,796,912
- Issue date Oct 24, 2023
- JSR Corporation
- Motohiro Shiratani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, cured film therefrom, an...
- Patent number 11,789,363
- Issue date Oct 17, 2023
- Toray Industries, Inc.
- Yoshinori Matoba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template manufacturing method and template base member
- Patent number 11,762,286
- Issue date Sep 19, 2023
- Kioxia Corporation
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 11,754,924
- Issue date Sep 12, 2023
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spontaneous-emission type photosensitive resin composition, color f...
- Patent number 11,726,404
- Issue date Aug 15, 2023
- Dongwoo Fine-Chem Co., Ltd.
- Hyung Joo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,693,312
- Issue date Jul 4, 2023
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 11,681,226
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless lithography method to fabricate topographic substrate
- Patent number 11,669,012
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...
- Publication number 20240427237
- Publication date Dec 26, 2024
- INPRIA CORPORATION
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Publication number 20240419081
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Lin ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20240402596
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei IWAMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE
- Publication number 20240402598
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAMATERIAL AND LAMINATE
- Publication number 20240402597
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Yasuyuki SASADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE
- Publication number 20240379376
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Rajesh Prasad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...
- Publication number 20240369922
- Publication date Nov 7, 2024
- FUJIFILM CORPORATION
- Kentaro TOYOOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...
- Publication number 20240369931
- Publication date Nov 7, 2024
- JSR Corporation
- Yuki OZAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...
- Publication number 20240361695
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...
- Publication number 20240337926
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...
- Publication number 20240329538
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Da Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...
- Publication number 20240319603
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- ZHENXING HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...
- Publication number 20240288776
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Christine Y. Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INDIUM BASED SOL-GEL OXIDE PRECURSOR FILMS AS EXTREME ULTRAVIOLET A...
- Publication number 20240288766
- Publication date Aug 29, 2024
- Board of Regents, The University of Texas System
- Julia W.P. Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...
- Publication number 20240280897
- Publication date Aug 22, 2024
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVES FOR METALLIC PHOTORESIST
- Publication number 20240201587
- Publication date Jun 20, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE HARDMASK ON HARDMASK
- Publication number 20240168371
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Da Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20240168374
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240134274
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240111210
- Publication date Apr 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Hsiung LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW...
- Publication number 20240103368
- Publication date Mar 28, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenichi Yamagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...
- Publication number 20240094632
- Publication date Mar 21, 2024
- INPRIA CORPORATION
- Kai Jiang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH V...
- Publication number 20240085803
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-I YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Oxide Resists for EUV Patterning and Methods for Developing t...
- Publication number 20240045337
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Acid for Reactive Development of Metal Oxide Resists
- Publication number 20240027900
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High-performance metal grids for solar cells formed by cracked film...

Film processing method

Photoresist development with halide chemistries

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Vapor phase thermal etch solutions for metal oxo photoresists

Photosensitive compositions, preparation methods thereof, and quant...

Vapor phase thermal etch solutions for metal oxo photoresists

Method for removing resist layer, method of forming a pattern and m...

Organometallic solution based high resolution patterning compositio...

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Radiation based patterning methods

Organometallic solution based high resolution patterning compositions

Method of making a picoscopic scale/ nanoscopic scale circuit pattern

Photoresist composition and method of forming photoresist pattern

Alternating copolymer chain scission photoresists

Deposition of semiconductor integration films

Ligand-capped main group nanoparticles as high absorption extreme u...

Stable solutions of monoalkyl tin alkoxides and their hydrolysis an...

Multi-metal fill with self-aligned patterning and dielectric with v...

Chain scission photoresists and methods for forming chain scission...

Organotin oxide hydroxide patterning compositions, precursors, and...

Radiation-sensitive composition and pattern-forming method

Positive photosensitive resin composition, cured film therefrom, an...

Template manufacturing method and template base member

Organotin oxide hydroxide patterning compositions, precursors, and...

Spontaneous-emission type photosensitive resin composition, color f...

Radiation based patterning methods

Metal-compound-removing solvent and method in lithography

Maskless lithography method to fabricate topographic substrate

Patents Applicationslast 30 patents

RADIATION BASED PATTERNING METHODS

STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS

Compound For Forming Metal-Containing Film, Composition For Forming...

BASE MATERIAL FOR METAMATERIAL, METAMATERIAL, AND LAMINATE

METAMATERIAL AND LAMINATE

IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE

TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...

METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...

EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...

METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...

INDIUM BASED SOL-GEL OXIDE PRECURSOR FILMS AS EXTREME ULTRAVIOLET A...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIO...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

ADDITIVES FOR METALLIC PHOTORESIST

SELECTIVE HARDMASK ON HARDMASK

PHOTORESIST COMPOSITION

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

PHOTORESIST AND FORMATION METHOD THEREOF

NEGATIVE PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING HOLLOW...

STABLE SOLUTIONS OF MONOALKYL TIN ALKOXIDES AND THEIR HYDROLYSIS AN...

MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH V...

Metal Oxide Resists for EUV Patterning and Methods for Developing t...

Acid for Reactive Development of Metal Oxide Resists