characterised by a multi-layered structure

Industry

CPC
B24B37/22

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/22characterised by a multi-layered structure

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method of forming a polishing article that has a desi...
- Patent number 11,964,359
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Ashwin Chockalingham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP pad construction with composite material properties using addit...
- Patent number 11,958,162
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method for producing the same and method of fabricat...
- Patent number 11,951,591
- Issue date Apr 9, 2024
- SK ENPULSE CO., LTD.
- Hye Young Heo
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization pads with constant groove volume
- Patent number 11,938,584
- Issue date Mar 26, 2024
- CMC MATERIALS LLC
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for high temperature processing
- Patent number 11,911,870
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Sivapackia Ganapathiappan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, polishing apparatus and method of manufacturing semi...
- Patent number 11,878,388
- Issue date Jan 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Cheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-based in-situ edge assymetry correction during CMP
- Patent number 11,865,671
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing layer and polishing method
- Patent number 11,858,089
- Issue date Jan 2, 2024
- IV Technologies Co., Ltd.
- Yu-Hao Pan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, manufacturing method of polishing pad and polishing...
- Patent number 11,850,701
- Issue date Dec 26, 2023
- IV Technologies Co., Ltd.
- Liang-Chi Tu
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization pads via vat-based production
- Patent number 11,845,157
- Issue date Dec 19, 2023
- CMC Materials, Inc.
- Eric S. Moyer
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing pad with polishing elements on supports
- Patent number 11,833,638
- Issue date Dec 5, 2023
- Rohm and Haas Electronic Materials Holding, Inc.
- John R. McCormick
- B24 - GRINDING POLISHING
Information Patent Grant
Window in thin polishing pad
- Patent number 11,826,875
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Yongqi Hu
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 11,813,713
- Issue date Nov 14, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Advanced polishing pads and related polishing pad manufacturing met...
- Patent number 11,806,829
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Puneet Narendra Jawali
- B24 - GRINDING POLISHING
Information Patent Grant
Formulations for chemical mechanical polishing pads and CMP pads ma...
- Patent number 11,806,830
- Issue date Nov 7, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bryan E. Barton
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad and method for producing same
- Patent number 11,780,057
- Issue date Oct 10, 2023
- SK ENPULSE CO., LTD.
- Joonsung Ryou
- B24 - GRINDING POLISHING
Information Patent Grant
Porous polishing pad and process for producing the same all fees
- Patent number 11,772,236
- Issue date Oct 3, 2023
- SK ENPULSE CO., LTD.
- Hye Young Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing temperature scanning apparatus for te...
- Patent number 11,752,589
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and precursor formulations for forming advanced polishing p...
- Patent number 11,745,302
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Sivapackia Ganapathiappan
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus and method
- Patent number 11,738,423
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Chin Peng
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads produced by an additive manufacturing process
- Patent number 11,724,362
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Cationic fluoropolymer composite polishing pad
- Patent number 11,712,777
- Issue date Aug 1, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
- Patent number 11,697,187
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using polishing pad
- Patent number 11,691,243
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- ChunHung Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Adhesives for chemical mechanical planarization applications
- Patent number 11,661,532
- Issue date May 30, 2023
- Avery Dennison Corporation
- Josh M. Bogner
- B24 - GRINDING POLISHING
Information Patent Grant
Low-debris fluopolymer composite CMP polishing pad
- Patent number 11,638,978
- Issue date May 2, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing pad, method for manufacturing polishing pad, and polishin...
- Patent number 11,628,535
- Issue date Apr 18, 2023
- SKC SOLMICS CO., LTD.
- Jaein Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad with secondary window seal
- Patent number 11,618,124
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Rajkumar Alagarsamy
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing using polishing pad provided with adsorption l...
- Patent number 11,602,819
- Issue date Mar 14, 2023
- Maruishi Sangyo Co., Ltd.
- Toshiyasu Yajima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method for manufacturing polishing pad, and polishin...
- Patent number 11,597,053
- Issue date Mar 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hao Huang
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CORRECTION OF FABRICATED SHAPES IN ADDITIVE MANUFACTURING
- Publication number 20240149400
- Publication date May 9, 2024
- Applied Materials, Inc.
- Jason Garcheung Fung
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD
- Publication number 20240149390
- Publication date May 9, 2024
- FUJIBO HOLDINGS, INC.
- Yoshihide KAWAMURA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND POLISHING METHOD
- Publication number 20240131654
- Publication date Apr 25, 2024
- FUJIMI INCORPORATED
- Kyosuke Tenko
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD
- Publication number 20240131653
- Publication date Apr 25, 2024
- FUJIBO HOLDINGS, INC.
- Teppei TATENO
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING P...
- Publication number 20240123568
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING PAD
- Publication number 20240091901
- Publication date Mar 21, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
ADVANCED POLISHING PADS AND RELATED POLISHING PAD MANUFACTURING MET...
- Publication number 20240025010
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Puneet Narendra JAWALI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, DOUBLE-SIDE POLISHING DEVICE, AND DOUBLE-SIDE POLISH...
- Publication number 20240009799
- Publication date Jan 11, 2024
- Shin-Etsu Handotai Co., Ltd.
- Junichi UENO
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Planarization Pad Having Polishing Layer with M...
- Publication number 20240009798
- Publication date Jan 11, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CURABLE COMPOSITION AND ABRASIVE ARTICLES MADE USING THE SAME
- Publication number 20230416445
- Publication date Dec 28, 2023
- 3M Innovative Properties Company
- Mario A. Perez
- B24 - GRINDING POLISHING
Information Patent Application
CMP PAD HAVING POLISHING LAYER OF LOW SPECIFIC GRAVITY
- Publication number 20230390889
- Publication date Dec 7, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS
- Publication number 20230390970
- Publication date Dec 7, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD AND METHOD FOR MANUFACTURING POLISHED PRODUCT
- Publication number 20230373055
- Publication date Nov 23, 2023
- FUJIBO HOLDINGS, INC.
- Teppei TATENO
- B24 - GRINDING POLISHING
Information Patent Application
CURABLE COMPOSITION AND CURED ARTICLE THEREOF
- Publication number 20230365739
- Publication date Nov 16, 2023
- Tokuyama Corporation
- Yasutomo SHIMIZU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING PADS WITH IMPROVED PLANARIZATION EFFICIENCY
- Publication number 20230364735
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD
- Publication number 20230364736
- Publication date Nov 16, 2023
- FUJIBO HOLDINGS, INC.
- Yoshihide KAWAMURA
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
- Publication number 20230356351
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF USING POLISHING PAD
- Publication number 20230339068
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- ChunHung CHEN
- B24 - GRINDING POLISHING
Information Patent Application
POROUS CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20230330805
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Sivapackia GANAPATHIAPPAN
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD
- Publication number 20230330810
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Chin PENG
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH IMPROVED WETTABILITY AND METHOD FOR PREPARING SAME
- Publication number 20230330806
- Publication date Oct 19, 2023
- SK enpulse Co., Ltd.
- Chang Gyu IM
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Pad with Secondary Window Seal
- Publication number 20230278158
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Rajkumar Alagarsamy
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, POLISHING DEVICE INCLUDING SAME, AND MANUFACTURING M...
- Publication number 20230226660
- Publication date Jul 20, 2023
- KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Hyoung Jae KIM
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD AND POLISHING...
- Publication number 20230226661
- Publication date Jul 20, 2023
- BESTAC ADVANCED MATERIAL CO., LTD.
- I-PENG YAO
- B24 - GRINDING POLISHING
Information Patent Application
ADDITIVE MANUFACTURING OF POLISHING PADS
- Publication number 20230219190
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Uma Sridhar
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
POLISHING PAD, CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING TH...
- Publication number 20230219191
- Publication date Jul 13, 2023
- Korea Advanced Institute of Science and Technology
- Sanha KIM
- B24 - GRINDING POLISHING
Information Patent Application
LAMINATED POLISHING PAD
- Publication number 20230211454
- Publication date Jul 6, 2023
- Tokuyama Corporation
- Yasutomo SHIMIZU
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PADS AND SYSTEMS FOR AND METHODS OF USING SAME
- Publication number 20230211455
- Publication date Jul 6, 2023
- 3M Innovative Properties Company
- Joseph D. RULE
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, POLISHING UNIT, POLISHING DEVICE, AND METHOD FOR MAN...
- Publication number 20230173637
- Publication date Jun 8, 2023
- FUJIBO HOLDINGS, INC.
- Teppei TATENO
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING PAD WITH POLISHING ELEMENTS ON SUPPORTS
- Publication number 20230166381
- Publication date Jun 1, 2023
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John R. McCormick
- B24 - GRINDING POLISHING

characterised by a multi-layered structure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method of forming a polishing article that has a desi...

CMP pad construction with composite material properties using addit...

Polishing pad, method for producing the same and method of fabricat...

Chemical mechanical planarization pads with constant groove volume

Polishing pads for high temperature processing

Polishing pad, polishing apparatus and method of manufacturing semi...

Temperature-based in-situ edge assymetry correction during CMP

Polishing layer and polishing method

Polishing pad, manufacturing method of polishing pad and polishing...

Chemical mechanical planarization pads via vat-based production

CMP polishing pad with polishing elements on supports

Window in thin polishing pad

Chemical mechanical polishing pad and polishing method

Advanced polishing pads and related polishing pad manufacturing met...

Formulations for chemical mechanical polishing pads and CMP pads ma...

Polishing pad and method for producing same

Porous polishing pad and process for producing the same all fees

Chemical mechanical polishing temperature scanning apparatus for te...

Methods and precursor formulations for forming advanced polishing p...

Chemical mechanical polishing apparatus and method

Polishing pads produced by an additive manufacturing process

Cationic fluoropolymer composite polishing pad

Temperature-based assymetry correction during CMP and nozzle for me...

Method of using polishing pad

Adhesives for chemical mechanical planarization applications

Low-debris fluopolymer composite CMP polishing pad

Polishing pad, method for manufacturing polishing pad, and polishin...

Polishing pad with secondary window seal

Method for polishing using polishing pad provided with adsorption l...

Polishing pad, method for manufacturing polishing pad, and polishin...

Patents Applicationslast 30 patents

CORRECTION OF FABRICATED SHAPES IN ADDITIVE MANUFACTURING

POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD

POLISHING PAD AND POLISHING METHOD

POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD

METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING P...

CMP POLISHING PAD

ADVANCED POLISHING PADS AND RELATED POLISHING PAD MANUFACTURING MET...

POLISHING PAD, DOUBLE-SIDE POLISHING DEVICE, AND DOUBLE-SIDE POLISH...

Chemical Mechanical Planarization Pad Having Polishing Layer with M...

CURABLE COMPOSITION AND ABRASIVE ARTICLES MADE USING THE SAME

CMP PAD HAVING POLISHING LAYER OF LOW SPECIFIC GRAVITY

METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS

POLISHING PAD AND METHOD FOR MANUFACTURING POLISHED PRODUCT

CURABLE COMPOSITION AND CURED ARTICLE THEREOF

POLISHING PADS WITH IMPROVED PLANARIZATION EFFICIENCY

POLISHING PAD

CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...

METHOD OF USING POLISHING PAD

POROUS CHEMICAL MECHANICAL POLISHING PADS

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

POLISHING PAD WITH IMPROVED WETTABILITY AND METHOD FOR PREPARING SAME

Polishing Pad with Secondary Window Seal

POLISHING PAD, POLISHING DEVICE INCLUDING SAME, AND MANUFACTURING M...

POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD AND POLISHING...

ADDITIVE MANUFACTURING OF POLISHING PADS

POLISHING PAD, CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING TH...

LAMINATED POLISHING PAD

POLISHING PADS AND SYSTEMS FOR AND METHODS OF USING SAME

POLISHING PAD, POLISHING UNIT, POLISHING DEVICE, AND METHOD FOR MAN...

CMP POLISHING PAD WITH POLISHING ELEMENTS ON SUPPORTS