characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

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G03F7/0125

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0125characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,971,659
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions, color filter and microlens derived the...
- Patent number 10,915,019
- Issue date Feb 9, 2021
- PROMERUS, LLC
- Pramod F Kandanarachch
- G02 - OPTICS
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,649,330
- Issue date May 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Curable composition for permanent resist films, and permanent resis...
- Patent number 10,179,828
- Issue date Jan 15, 2019
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for direct photopatterning of molecules on surfaces
- Patent number 10,124,312
- Issue date Nov 13, 2018
- The Regents of the University of California
- Matthew B. B. Francis
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photosensitive compound, photosensitive resin, and photosensitive c...
- Patent number 9,223,210
- Issue date Dec 29, 2015
- Toyo Gosei Co., Ltd.
- Toru Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Benzocyclobutene based polymer formulations and methods for process...
- Patent number 8,143,324
- Issue date Mar 27, 2012
- Dow Global Technologies LLC
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photo-sensitive composition
- Patent number 7,695,875
- Issue date Apr 13, 2010
- Koninklijke Philips Electronics
- Fredericus Johannes Touwslager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 7,153,631
- Issue date Dec 26, 2006
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist coatings for copper clad stainless steel printing plates
- Patent number 6,924,085
- Issue date Aug 2, 2005
- Printing Developments, Inc.
- Jeffrey George Zaloom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compound and photosensitive composition
- Patent number 6,908,719
- Issue date Jun 21, 2005
- Sanyo Chemical Industries, Ltd.
- Tetsuya Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition and use thereof
- Patent number 6,727,034
- Issue date Apr 27, 2004
- Sanyo Chemical Industries, Ltd.
- Naohito Ogiso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,444,391
- Issue date Sep 3, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable and photopatternable hydrogel matrix based on azlacton...
- Patent number 6,372,407
- Issue date Apr 16, 2002
- 3M Innovative Properties Company
- Jie Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,342,330
- Issue date Jan 29, 2002
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming pattern theref...
- Patent number 6,291,619
- Issue date Sep 18, 2001
- Hitachi Chemical Co., Ltd.
- Yasunari Maekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hydroxyalkylated high performance curable polymers
- Patent number 6,203,143
- Issue date Mar 20, 2001
- Xerox Corporation
- Ram S. Narang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 6,194,126
- Issue date Feb 27, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers containing N-substituted maleimide units and their use in...
- Patent number 6,190,825
- Issue date Feb 20, 2001
- Agfa-Gevaert N.V.
- Steffen Denzinger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable and photopatternable hydrogel matrix based on azlacton...
- Patent number 6,156,478
- Issue date Dec 5, 2000
- 3M Innovative Properties Company
- Jie Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compositions and pattern formation method
- Patent number 6,140,007
- Issue date Oct 31, 2000
- Toyo Gosei Kogyo Co., Ltd.
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist solution for phosphor slurry applied to color cathode r...
- Patent number 6,127,074
- Issue date Oct 3, 2000
- Samsung Display Devices Co., Ltd.
- Seung-Jun You
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic printing plate
- Patent number 6,093,509
- Issue date Jul 25, 2000
- Toray Industries, Inc.
- Masanao Isono
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Composition of epoxy group-containing cycloolefin resin
- Patent number 6,001,488
- Issue date Dec 14, 1999
- Nippon Zeon Co., Ltd.
- Hideaki Kataoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions for forming resist patterns
- Patent number 5,962,191
- Issue date Oct 5, 1999
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition of epoxy group-containing cycloolefin resin
- Patent number 5,895,800
- Issue date Apr 20, 1999
- Nippon Zeon Co., Ltd.
- Hideaki Kataoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,856,059
- Issue date Jan 5, 1999
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydroxyalkylated high performance curable polymers
- Patent number 5,849,809
- Issue date Dec 15, 1998
- Xerox Corporation
- Ram S. Narang
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Crosslinking type liquid crystal polymer and oriented crosslinking...
- Patent number 5,846,451
- Issue date Dec 8, 1998
- Nitto Denko Corporation
- Shusaku Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Agent for forming a fine pattern of ferroelectric film, and method...
- Patent number 5,846,686
- Issue date Dec 8, 1998
- Rohm Co., Ltd.
- Akira Kamisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230028673
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS
- Publication number 20220365448
- Publication date Nov 17, 2022
- OJI HOLDINGS CORPORATION
- Kazuyo MORITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20200272051
- Publication date Aug 27, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chih HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heat-Sensitive Recording Material
- Publication number 20180345710
- Publication date Dec 6, 2018
- NIPPON KAYAKU KABUSHIKI KAISHA
- Kyohei Miyanaga
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITIONS, COLOR FILTER AND MICROLENS DERIVED THE...
- Publication number 20180284609
- Publication date Oct 4, 2018
- PROMERUS, LLC
- PRAMOD F. KANDANARACHCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20180149973
- Publication date May 31, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...
- Publication number 20170349690
- Publication date Dec 7, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Benzocyclobutene based polymer formulations and methods for process...
- Publication number 20090275673
- Publication date Nov 5, 2009
- Ying Hung So
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photo-sensitive composition
- Publication number 20050089791
- Publication date Apr 28, 2005
- Fredericus Johannes Touwslager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist coatings for copper clad stainless steel printing plates
- Publication number 20040185376
- Publication date Sep 23, 2004
- Jeffrey George Zaloom
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Pattern-forming process using photosensitive resin composition
- Publication number 20040106066
- Publication date Jun 3, 2004
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for the production of anhydride modified polyvinyl acetals u...
- Publication number 20030166750
- Publication date Sep 4, 2003
- Gabor I. Koletar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin composition
- Publication number 20020004177
- Publication date Jan 10, 2002
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010012597
- Publication date Aug 9, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive compositions and pattern formation method
- Publication number 20010003633
- Publication date Jun 14, 2001
- Masaharu Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist composition and method of forming photoresist pattern

Photosensitive compositions, color filter and microlens derived the...

Resist composition, method of forming resist pattern, compound, and...

Curable composition for permanent resist films, and permanent resis...

Method for direct photopatterning of molecules on surfaces

Photosensitive compound, photosensitive resin, and photosensitive c...

Benzocyclobutene based polymer formulations and methods for process...

Photo-sensitive composition

Pattern-forming process using photosensitive resin composition

Photoresist coatings for copper clad stainless steel printing plates

Photosensitive compound and photosensitive composition

Photosensitive composition and use thereof

Photosensitive compositions and pattern formation method

Photocurable and photopatternable hydrogel matrix based on azlacton...

Photosensitive compositions and pattern formation method

Photosensitive resin composition, method for forming pattern theref...

Hydroxyalkylated high performance curable polymers

Pattern-forming process using photosensitive resin composition

Polymers containing N-substituted maleimide units and their use in...

Photocurable and photopatternable hydrogel matrix based on azlacton...

Photosensitive compositions and pattern formation method

Photoresist solution for phosphor slurry applied to color cathode r...

Lithographic printing plate

Composition of epoxy group-containing cycloolefin resin

Resist compositions for forming resist patterns

Composition of epoxy group-containing cycloolefin resin

Photosensitive resin composition

Hydroxyalkylated high performance curable polymers

Crosslinking type liquid crystal polymer and oriented crosslinking...

Agent for forming a fine pattern of ferroelectric film, and method...

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

Heat-Sensitive Recording Material

PHOTOSENSITIVE COMPOSITIONS, COLOR FILTER AND MICROLENS DERIVED THE...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIS...

Benzocyclobutene based polymer formulations and methods for process...

Photo-sensitive composition

Photoresist coatings for copper clad stainless steel printing plates

Pattern-forming process using photosensitive resin composition

Method for the production of anhydride modified polyvinyl acetals u...

Photosensitive resin composition

Photosensitive compositions and pattern formation method

Photosensitive compositions and pattern formation method