Charge carrier lifetime control

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CPC
Y10S438/904

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

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Y10S438/904Charge carrier lifetime control

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Patents Grantslast 30 patents

Information Patent Grant
High voltage non punch through IGBT for switch mode power supplies
- Patent number 7,534,666
- Issue date May 19, 2009
- International Rectifier Corporation
- Richard Francis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to manufacture high-precision RFID straps and RFID antennas...
- Patent number 7,510,985
- Issue date Mar 31, 2009
- LPKF Laser & Electronics AG
- Andreas Boenke
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser annealing method and manufacturing method of a semiconductor...
- Patent number 7,473,622
- Issue date Jan 6, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser apparatus, laser annealing method, and manufacturing method o...
- Patent number 7,179,698
- Issue date Feb 20, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser apparatus, laser annealing method, and manufacturing method o...
- Patent number 6,974,731
- Issue date Dec 13, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,878,579
- Issue date Apr 12, 2005
- Kabushiki Kaisha Toshiba
- Kazuya Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,791,106
- Issue date Sep 14, 2004
- Kabushiki Kaisha Toshiba
- Kazuya Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing contamination of semiconductor substrates
- Patent number 6,759,336
- Issue date Jul 6, 2004
- Lam Research Corporation
- Robert Chebi
- B08 - CLEANING
Information Patent Grant
Laser apparatus, laser annealing method, and manufacturing method o...
- Patent number 6,753,212
- Issue date Jun 22, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser apparatus, laser annealing method, and manufacturing method o...
- Patent number 6,730,550
- Issue date May 4, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,703,327
- Issue date Mar 9, 2004
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,703,326
- Issue date Mar 9, 2004
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,693,048
- Issue date Feb 17, 2004
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,673,726
- Issue date Jan 6, 2004
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,670,289
- Issue date Dec 30, 2003
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing contamination of semiconductor substrates
- Patent number 6,528,427
- Issue date Mar 4, 2003
- Lam Research Corporation
- Robert Chebi
- B08 - CLEANING
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,492,285
- Issue date Dec 10, 2002
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,391,805
- Issue date May 21, 2002
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,387,828
- Issue date May 14, 2002
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 6,352,946
- Issue date Mar 5, 2002
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation of analytical samples, analysis of impurities, preparat...
- Patent number 6,228,651
- Issue date May 8, 2001
- Fujitsu Limited
- Hiroyuki Fukuda
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Anneal technique for reducing amount of electronic trap in gate oxi...
- Patent number 6,187,632
- Issue date Feb 13, 2001
- Kabushiki Kaisha Toshiba
- Susumu Shuto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insitu formation of TiSi2/TiN bi-layer structures using self-aligne...
- Patent number 6,184,135
- Issue date Feb 6, 2001
- Industrial Technology Research Institute
- Tzu-Kun Ku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insitu formation of TiSi.sub.2 /TiN bi-layer structures using self-...
- Patent number 6,071,552
- Issue date Jun 6, 2000
- Industrial Technology Research Institute
- Tzu-Kun Ku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing a semiconductor device using purified phospho...
- Patent number 5,910,257
- Issue date Jun 8, 1999
- Fujitsu Limited
- Hiroyuki Fukuda
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
High-pressure anneal process for integrated circuits
- Patent number 5,895,274
- Issue date Apr 20, 1999
- Micron Technology, Inc.
- Richard Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photonic device and process for fabricating the same
- Patent number 5,861,680
- Issue date Jan 19, 1999
- Sony Corporation
- Hideo Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insitu formation of TiSi2/TiN bi-layer structures using self-aligne...
- Patent number 5,856,237
- Issue date Jan 5, 1999
- Industrial Technology Research Institute
- Tzu-Kun Ku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photonic device and process for fabricating the same
- Patent number 5,851,847
- Issue date Dec 22, 1998
- Sony Corporation
- Hideo Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for manufacturing an integrated bipolar power device and a...
- Patent number 5,468,660
- Issue date Nov 21, 1995
- Consorzio per la Ricerca Sulla Microelettronica Nel Mezzogiorno
- Ferruccio Frisina
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Laser apparatus, laser annealing method, and manufacture method of...
- Publication number 20070148925
- Publication date Jun 28, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High voltage non punch through IGBT for switch mode power supplies
- Publication number 20070026577
- Publication date Feb 1, 2007
- International Rectifier Corp.
- Richard Francis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050012088
- Publication date Jan 20, 2005
- Kabushiki Kaisha Toshiba
- Kazuya Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser apparatus, laser annealing method, and manufacturing method o...
- Publication number 20040224449
- Publication date Nov 11, 2004
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING CONTAMINATION OF SEMICONDUCTOR SUBSTRATES
- Publication number 20040137741
- Publication date Jul 15, 2004
- Robert Chebi
- B08 - CLEANING
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20030201493
- Publication date Oct 30, 2003
- Kabushiki Kaisha Toshiba
- Kazuya Ohuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-pressure anneal process for integrated circuits
- Publication number 20030003672
- Publication date Jan 2, 2003
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-pressure anneal process for integrated circuits
- Publication number 20020151128
- Publication date Oct 17, 2002
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for reducing contamination of semiconductor substrates
- Publication number 20020139388
- Publication date Oct 3, 2002
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-pressure anneal process for integrated circuits
- Publication number 20020127885
- Publication date Sep 12, 2002
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-pressure anneal process for integrated circuits
- Publication number 20020098715
- Publication date Jul 25, 2002
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser apparatus, laser annealing method, and manufacturing method o...
- Publication number 20020048864
- Publication date Apr 25, 2002
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser apparatus, laser annealing method, and manufacturing method o...
- Publication number 20020004292
- Publication date Jan 10, 2002
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS

Charge carrier lifetime control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

High voltage non punch through IGBT for switch mode power supplies

Method to manufacture high-precision RFID straps and RFID antennas...

Laser annealing method and manufacturing method of a semiconductor...

Laser apparatus, laser annealing method, and manufacturing method o...

Laser apparatus, laser annealing method, and manufacturing method o...

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

Methods for reducing contamination of semiconductor substrates

Laser apparatus, laser annealing method, and manufacturing method o...

Laser apparatus, laser annealing method, and manufacturing method o...

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

Methods for reducing contamination of semiconductor substrates

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

Preparation of analytical samples, analysis of impurities, preparat...

Anneal technique for reducing amount of electronic trap in gate oxi...

Insitu formation of TiSi2/TiN bi-layer structures using self-aligne...

Insitu formation of TiSi.sub.2 /TiN bi-layer structures using self-...

Process for producing a semiconductor device using purified phospho...

High-pressure anneal process for integrated circuits

Photonic device and process for fabricating the same

Insitu formation of TiSi2/TiN bi-layer structures using self-aligne...

Photonic device and process for fabricating the same

Process for manufacturing an integrated bipolar power device and a...

Patents Applicationslast 30 patents

Laser apparatus, laser annealing method, and manufacture method of...

High voltage non punch through IGBT for switch mode power supplies

Semiconductor device and method of manufacturing the same

Laser apparatus, laser annealing method, and manufacturing method o...

METHODS FOR REDUCING CONTAMINATION OF SEMICONDUCTOR SUBSTRATES

Semiconductor device and method of manufacturing the same

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

Methods for reducing contamination of semiconductor substrates

High-pressure anneal process for integrated circuits

High-pressure anneal process for integrated circuits

Laser apparatus, laser annealing method, and manufacturing method o...

Laser apparatus, laser annealing method, and manufacturing method o...