combined with ultrasonic means

Industry

CPC
G03F7/3014

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/3014combined with ultrasonic means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods to dispense and mix reagents
- Patent number 10,307,724
- Issue date Jun 4, 2019
- CENTRILLION TECHNOLOGY HOLDINGS CORPORATION
- Filip Crnogorac
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for cleansing nanoimprinting molds
- Patent number 9,073,102
- Issue date Jul 7, 2015
- FUJIFILM Corporation
- Masafumi Yoshida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for development of lithographic printing plate...
- Patent number 7,807,333
- Issue date Oct 5, 2010
- Eastman Kodak Company
- Koji Hayashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Ultrasonic agitation-assisted development of resist layer of master...
- Patent number 7,029,798
- Issue date Apr 18, 2006
- Seagate Technology LLC
- Christopher Formato
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for forming resist pattern
- Patent number 6,896,997
- Issue date May 24, 2005
- Oki Electric Industry Co., Ltd.
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymeric mold for providing a micro-scale part
- Patent number 6,841,306
- Issue date Jan 11, 2005
- Sandia National Laboratories
- Dale R. Boehme
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method and apparatus for forming resist pattern
- Patent number 6,806,005
- Issue date Oct 19, 2004
- Oki Electric Industry Co, Ltd.
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for cleaning a substrate on which a resist pattern is formed
- Patent number 6,692,164
- Issue date Feb 17, 2004
- Oki Electric Industry Co, Ltd.
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for improving resist pattern developing
- Patent number 6,575,645
- Issue date Jun 10, 2003
- Taiwan Semiconductor Manufacturing Company
- Wei-Kay Chiu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for improving resist pattern developing
- Patent number 6,537,734
- Issue date Mar 25, 2003
- Taiwan Semiconductor Manufacturing Company
- Wei-Kay Chiu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liga developer apparatus system
- Patent number 6,517,665
- Issue date Feb 11, 2003
- Sandia National Laboratories
- Dale R. Boehme
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Developing method and developing apparatus
- Patent number 6,491,452
- Issue date Dec 10, 2002
- Tokyo Electron Limited
- Nobuo Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning thin films
- Patent number 6,399,258
- Issue date Jun 4, 2002
- 3M Innovative Properties Company
- Dennis P. O'Brien
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method and apparatus for forming resist pattern
- Patent number 6,372,389
- Issue date Apr 16, 2002
- Oki Electric Industry Co, Ltd.
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for improving resist pattern developing
- Patent number 6,355,397
- Issue date Mar 12, 2002
- Taiwan Semiconductor Manufacturing Company
- Wei-Kay Chiu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Developing method and developing apparatus
- Patent number 6,238,848
- Issue date May 29, 2001
- Tokyo Electron Limited
- Nobuo Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaged article on polymeric substrate
- Patent number 6,203,952
- Issue date Mar 20, 2001
- 3M Innovative Properties Company
- Dennis P. O'Brien
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Acoustic wave enhanced developer
- Patent number 6,010,255
- Issue date Jan 4, 2000
- Taiwan Semiconductor Manufacturing Company
- Wei-Kay Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acoustic wave enhanced developer
- Patent number 5,876,875
- Issue date Mar 2, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Kay Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for ultrasonic etching of printing plates
- Patent number 4,555,302
- Issue date Nov 26, 1985
- John C. Urbanik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing light sensitive plates including use of ultrasonic waves
- Patent number 4,521,092
- Issue date Jun 4, 1985
- Photomeca S.A.
- Mario Ferrante
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing machine for printing
- Patent number 4,517,267
- Issue date May 14, 1985
- Archival Color Technologies
- Charles Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3702795
- Patent number 3,702,795
- Issue date Nov 14, 1972
- B08 - CLEANING
Information Patent Grant
3661660
- Patent number 3,661,660
- Issue date May 9, 1972
- B08 - CLEANING
Information Patent Grant
3619601
- Patent number 3,619,601
- Issue date Nov 9, 1971
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3597080
- Patent number 3,597,080
- Issue date Aug 3, 1971
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3277306
- Patent number 3,277,306
- Issue date Oct 4, 1966
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3267555
- Patent number 3,267,555
- Issue date Aug 23, 1966
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR CLEANSING NANOIMPRINTING MOLDS
- Publication number 20130291890
- Publication date Nov 7, 2013
- Masafumi YOSHIDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS FOR REDUCING COST OF DEVELOPER AND THE METHOD THEREOF
- Publication number 20100227069
- Publication date Sep 9, 2010
- NANYA TECHNOLOGY CORP.
- Chiang-Lin Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Development of Lithographic Printing Plate...
- Publication number 20070298350
- Publication date Dec 27, 2007
- Koji Hayashi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LIGA developer apparatus system
- Publication number 20050155707
- Publication date Jul 21, 2005
- Dale R. Boehme
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method for forming resist pattern
- Publication number 20030129544
- Publication date Jul 10, 2003
- Oki Electric Industry Co., Ltd.
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymeric mold for providing a micro-scale part
- Publication number 20020189756
- Publication date Dec 19, 2002
- Dale R. Boehme
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method and apparatus for improving resist pattern developing
- Publication number 20020144707
- Publication date Oct 10, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Wei-Kay Chiu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Method and apparatus for improving resist pattern developing
- Publication number 20020090575
- Publication date Jul 11, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Wei-Kay Chiu
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Method and apparatus for forming resist pattern
- Publication number 20020055049
- Publication date May 9, 2002
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for forming resist pattern
- Publication number 20010055732
- Publication date Dec 27, 2001
- Minoru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developing method and developing apparatus
- Publication number 20010012456
- Publication date Aug 9, 2001
- Nobuo Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for patterning thin films
- Publication number 20010006766
- Publication date Jul 5, 2001
- 3M Innovative Properties Company
- Dennis P. O'Brien
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

combined with ultrasonic means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods to dispense and mix reagents

Method for cleansing nanoimprinting molds

Method and apparatus for development of lithographic printing plate...

Ultrasonic agitation-assisted development of resist layer of master...

Method for forming resist pattern

Polymeric mold for providing a micro-scale part

Method and apparatus for forming resist pattern

Apparatus for cleaning a substrate on which a resist pattern is formed

Method and apparatus for improving resist pattern developing

Method and apparatus for improving resist pattern developing

Liga developer apparatus system

Developing method and developing apparatus

Method for patterning thin films

Method and apparatus for forming resist pattern

Method and apparatus for improving resist pattern developing

Developing method and developing apparatus

Imaged article on polymeric substrate

Acoustic wave enhanced developer

Acoustic wave enhanced developer

Method and apparatus for ultrasonic etching of printing plates

Developing light sensitive plates including use of ultrasonic waves

Processing machine for printing

3702795

3661660

3619601

3597080

3277306

3267555

Patents Applicationslast 30 patents

METHOD FOR CLEANSING NANOIMPRINTING MOLDS

APPARATUS FOR REDUCING COST OF DEVELOPER AND THE METHOD THEREOF

Method and Apparatus for Development of Lithographic Printing Plate...

LIGA developer apparatus system

Method for forming resist pattern

Polymeric mold for providing a micro-scale part

Method and apparatus for improving resist pattern developing

Method and apparatus for improving resist pattern developing

Method and apparatus for forming resist pattern

Method and apparatus for forming resist pattern

Developing method and developing apparatus

Method for patterning thin films