containing a metal as principal radiation generating component

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CPC
H05G2/005

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Parent Industries

HELECTRICITY H05Electric techniques H05GX-RAY TECHNIQUE H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes

Current Industry

H05G2/005containing a metal as principal radiation generating component

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Target supply control apparatus and method in an extreme ultraviole...
- Patent number 12,232,244
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Theodorus Wilhelmus Driessen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,193,136
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chih Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV vessel perimeter flow auto adjustment
- Patent number 12,189,298
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for generating droplets for EUV photolithography...
- Patent number 12,167,526
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Rotating target for extreme ultraviolet source with liquid metal
- Patent number 12,133,318
- Issue date Oct 29, 2024
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,133,319
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mechanical alignment of x-ray sources
- Patent number 12,120,807
- Issue date Oct 15, 2024
- Excillium AB
- Johan Kronstedt
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Shock wave visualization for extreme ultraviolet plasma optimization
- Patent number 12,114,412
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G01 - MEASURING TESTING
Information Patent Grant
System and method for monitoring and controlling extreme ultraviole...
- Patent number 12,085,860
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for detecting debris in a photolithography system
- Patent number 12,085,865
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle image velocimetry of extreme ultraviolet lithography systems
- Patent number 12,085,585
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- En Hao Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Droplet generator assembly and method of replacing components
- Patent number 12,063,734
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Droplet generator and method of servicing a photolithographic tool
- Patent number 12,055,864
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithography system and operation method thereof
- Patent number 12,025,923
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-brightness laser produced plasma source and method of generati...
- Patent number 12,028,958
- Issue date Jul 2, 2024
- Isteq B.V.
- Samir Ellwi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for EUV lithography
- Patent number 12,028,959
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Shin Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithography apparatus and method
- Patent number 12,007,694
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Chun Yen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vessel for a radiation source
- Patent number 12,007,699
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Sander Kerssemakers
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Replacement and refill method for droplet generator
- Patent number 11,997,778
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Yu Tu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Contamination trap
- Patent number 11,982,947
- Issue date May 14, 2024
- ASML NETHERLAND B.V.
- Sander Catharina Reinier Derks
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,979,971
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV light source with a separation device
- Patent number 11,968,767
- Issue date Apr 23, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Oliver Schlosser
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Modular laser-produced plasma x-ray system
- Patent number 11,930,581
- Issue date Mar 12, 2024
- Brown University
- Daniel John DeCiccio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and operation method thereof
- Patent number 11,899,378
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target debris collection device and extreme ultraviolet light sourc...
- Patent number 11,852,984
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Sunghyup Kim
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 11,832,372
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Foil trap and light source apparatus including the same
- Patent number 11,822,258
- Issue date Nov 21, 2023
- Ushio Denki Kabushiki Kaisha
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Light Source Using Pre-Ionization
- Publication number 20250081319
- Publication date Mar 6, 2025
- Hamamatsu Photonics K. K.
- Frederick Marvin Niell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV SOURCE WITH ROTATION CRUCIBLE AND LASER AND TIN (SN) AUTO-FILLI...
- Publication number 20250063649
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Fu TSENG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS OF GENERATING EXTREME ULTRAVIOLET RADIATION
- Publication number 20240324090
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Shin CHENG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithography Apparatus and Method
- Publication number 20240295825
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chun Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROMAGNETIC PUMP
- Publication number 20240284580
- Publication date Aug 22, 2024
- Excillum AB
- Ulf Lundström
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
A SEED LASER OPTICAL ISOLATOR, SEED ISOLATOR MODULE, EUV RADIATION...
- Publication number 20240275114
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Karel Joop BOSSCHAART
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET SUPPLY DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240260164
- Publication date Aug 1, 2024
- Gigaphoton Inc.
- Masaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PICOSECOND LASER-DRIVEN PLASMA X-RAY SOURCE
- Publication number 20240237183
- Publication date Jul 11, 2024
- Research Instruments Corporation
- Christoph Rose-Petruck
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONNECTION ASSEMBLY
- Publication number 20240196504
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Ivo VANDERHALLEN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MODULAR LASER-PRODUCED PLASMA X-RAY SYSTEM
- Publication number 20240188206
- Publication date Jun 6, 2024
- Research Instruments Corporation
- Daniel John DeCiccio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LIGHT SOURCE WITH A SEPARATION DEVICE
- Publication number 20240057243
- Publication date Feb 15, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Oliver Schlosser
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MECHANICAL ALIGNMENT OF X-RAY SOURCES
- Publication number 20240015875
- Publication date Jan 11, 2024
- Excillum AB
- Johan KRONSTEDT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ROTARY FOIL TRAP AND LIGHT SOURCE DEVICE
- Publication number 20240004317
- Publication date Jan 4, 2024
- Ushio Denki Kabushiki Kaisha
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL
- Publication number 20230403778
- Publication date Dec 14, 2023
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY
- Publication number 20230389168
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION
- Publication number 20230380044
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Shuo SU
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
- Publication number 20230367224
- Publication date Nov 16, 2023
- ASML NETHERLANDS B.V.
- Hrishikesh PATEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
- Publication number 20230363074
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Chih LAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
- Publication number 20230359125
- Publication date Nov 9, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
- Che-Chang HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20230309211
- Publication date Sep 28, 2023
- Gigaphoton Inc.
- Yoshiyuki HONDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20230296992
- Publication date Sep 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
- Publication number 20230296642
- Publication date Sep 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Hao LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID TAMPED TARGETS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20230280656
- Publication date Sep 7, 2023
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Yechiel R. FRANK
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT
- Publication number 20230269858
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Poorya Haghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND SYSTEM FOR GENERATING DROPLETS FOR EUV PHOTOLITHOGRAPHY...
- Publication number 20230189422
- Publication date Jun 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Kuang SUN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURC...
- Publication number 20230185207
- Publication date Jun 15, 2023
- Samsung Electronics Co., Ltd.
- Sunghyup KIM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS
- Publication number 20230164899
- Publication date May 25, 2023
- Ushio Denki Kabushiki Kaisha
- Hideyuki URAKAMI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF
- Publication number 20230161273
- Publication date May 25, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTAMINATION SHIELD FOR MECHANICALLY INSULATING DEVICE
- Publication number 20230156898
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Armin Bernhard Ridinger
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Lithography Apparatus and Method
- Publication number 20230132074
- Publication date Apr 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chun Yen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

containing a metal as principal radiation generating component

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Target supply control apparatus and method in an extreme ultraviole...

Extreme ultraviolet lithography system with heated tin vane bucket...

Apparatus and method for generating extreme ultraviolet radiation

EUV vessel perimeter flow auto adjustment

EUV light source and apparatus for lithography

Method and system for generating droplets for EUV photolithography...

Rotating target for extreme ultraviolet source with liquid metal

Apparatus and method for generating extreme ultraviolet radiation

EUV lithography apparatus

Mechanical alignment of x-ray sources

Shock wave visualization for extreme ultraviolet plasma optimization

System and method for monitoring and controlling extreme ultraviole...

System and method for detecting debris in a photolithography system

Particle image velocimetry of extreme ultraviolet lithography systems

Droplet generator assembly and method of replacing components

Droplet generator and method of servicing a photolithographic tool

Lithography system and operation method thereof

High-brightness laser produced plasma source and method of generati...

EUV light source and apparatus for EUV lithography

Lithography apparatus and method

Vessel for a radiation source

Replacement and refill method for droplet generator

Contamination trap

EUV light source and apparatus for lithography

EUV light source with a separation device

Modular laser-produced plasma x-ray system

Lithography system and operation method thereof

Target debris collection device and extreme ultraviolet light sourc...

EUV light source and apparatus for lithography

Foil trap and light source apparatus including the same

Patents Applicationslast 30 patents

Light Source Using Pre-Ionization

EUV SOURCE WITH ROTATION CRUCIBLE AND LASER AND TIN (SN) AUTO-FILLI...

METHODS OF GENERATING EXTREME ULTRAVIOLET RADIATION

Lithography Apparatus and Method

ELECTROMAGNETIC PUMP

A SEED LASER OPTICAL ISOLATOR, SEED ISOLATOR MODULE, EUV RADIATION...

TARGET SUPPLY DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

PICOSECOND LASER-DRIVEN PLASMA X-RAY SOURCE

CONNECTION ASSEMBLY

MODULAR LASER-PRODUCED PLASMA X-RAY SYSTEM

EUV LIGHT SOURCE WITH A SEPARATION DEVICE

MECHANICAL ALIGNMENT OF X-RAY SOURCES

ROTARY FOIL TRAP AND LIGHT SOURCE DEVICE

ROTATING TARGET FOR EXTREME ULTRAVIOLET SOURCE WITH LIQUID METAL

EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY

SHOCK WAVE VISUALIZATION FOR EXTREME ULTRAVIOLET PLASMA OPTIMIZATION

RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS

LIQUID TAMPED TARGETS FOR EXTREME ULTRAVIOLET LITHOGRAPHY

SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT

METHOD AND SYSTEM FOR GENERATING DROPLETS FOR EUV PHOTOLITHOGRAPHY...

TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURC...

EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS

LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF

CONTAMINATION SHIELD FOR MECHANICALLY INSULATING DEVICE

Lithography Apparatus and Method