Controlling normal operating mode

Industry

CPC
G03F7/70525

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70525Controlling normal operating mode

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment solution supply apparatus, reporting method, and storage...
- Patent number 12,210,292
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Yoshinori Utsunomiya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Aberration impact systems, models, and manufacturing processes
- Patent number 12,210,291
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for diagnosing unobserved operational parameters
- Patent number 12,189,303
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- David Evert Song Kook Sigtermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a dual stage lithographic apparatus and lithographi...
- Patent number 12,153,354
- Issue date Nov 26, 2024
- ASML Netherlands B.V.
- Wouter Jan Cornelis Vijselaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window optimizer
- Patent number 12,141,507
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Stefan Hunsche
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer processing apparatus and wafer transfer method
- Patent number 12,099,309
- Issue date Sep 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Computational wafer inspection
- Patent number 12,067,340
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Christophe David Fouquet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing hydrogen permeation from lithogr...
- Patent number 12,025,922
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,007,698
- Issue date Jun 11, 2024
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 11,996,335
- Issue date May 28, 2024
- Kioxia Corporation
- Masaya Shima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining a correction to a process
- Patent number 11,994,845
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Sarathi Roy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dispatch method for production line in semiconductor process, stora...
- Patent number 11,988,969
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chin-Chang Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process monitoring of deep structures with X-ray scatterometry
- Patent number 11,955,391
- Issue date Apr 9, 2024
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for characterizing a manufacturing process of semiconductor...
- Patent number 11,860,548
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,860,546
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 11,815,819
- Issue date Nov 14, 2023
- Nova Ltd.
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,809,087
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control method and device of overlay accuracy
- Patent number 11,803,128
- Issue date Oct 31, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiaofang Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,796,920
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Writing data generating method, multi charged particle beam writing...
- Patent number 11,774,860
- Issue date Oct 3, 2023
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Induced displacements for improved overlay error metrology
- Patent number 11,774,863
- Issue date Oct 3, 2023
- KLA Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,768,441
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20250053702
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...
- Publication number 20250044704
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi ASAHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD
- Publication number 20250021027
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Keisaku KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20240429672
- Publication date Dec 26, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240404780
- Publication date Dec 5, 2024
- HITACHI HIGH-TECH CORPORATION
- Masahiro KAMIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL WAFER INSPECTION
- Publication number 20240403537
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Christophe David FOUQUET
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HOLDING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240393703
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- KOHEI IMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPH...
- Publication number 20240369948
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...
- Publication number 20240345494
- Publication date Oct 17, 2024
- Canon Kabushiki Kaisha
- NAOKI FUNABASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A CORRECTION TO A PROCESS
- Publication number 20240345569
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD
- Publication number 20240329546
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE
- Publication number 20240319612
- Publication date Sep 26, 2024
- CYMER, LLC
- Russell Allen BURDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...
- Publication number 20240319611
- Publication date Sep 26, 2024
- United Microelectronics Corp.
- Zhi Fan Sun
- G01 - MEASURING TESTING
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...
- Publication number 20240322521
- Publication date Sep 26, 2024
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...
- Publication number 20240310737
- Publication date Sep 19, 2024
- NOVA LTD
- Barak BRINGOLTZ
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...
- Publication number 20240310743
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY SCAN SEQUENCING
- Publication number 20240288778
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Controlling normal operating mode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor manufacturing system, method of manufacturing a semic...

Treatment solution supply apparatus, reporting method, and storage...

Aberration impact systems, models, and manufacturing processes

Methods and apparatus for diagnosing unobserved operational parameters

Digital lithography scan sequencing

Method of using a dual stage lithographic apparatus and lithographi...

Process window optimizer

Method for avoiding a degradation of an optical element, projection...

Wafer processing apparatus and wafer transfer method

Process variability aware adaptive inspection and metrology

Computational wafer inspection

Method of manufacturing devices

Method and apparatus for optimization of lithographic process

Multi-charged-particle-beam writing method, multi-charged-particle-...

Methods and apparatus for reducing hydrogen permeation from lithogr...

Information processing apparatus and information processing method

Manufacturing method of semiconductor device

Determining a correction to a process

Dispatch method for production line in semiconductor process, stora...

Process monitoring of deep structures with X-ray scatterometry

Methods and apparatus for obtaining diagnostic information relating...

Method for characterizing a manufacturing process of semiconductor...

Fluid handling structure for lithographic apparatus

Machine and deep learning methods for spectra-based metrology and p...

Semiconductor processing tool and methods of operation

Control method and device of overlay accuracy

Method for controlling a manufacturing process and associated appar...

Writing data generating method, multi charged particle beam writing...

Induced displacements for improved overlay error metrology

Method for controlling a manufacturing process and associated appar...

Patents Applicationslast 30 patents

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

PROCESS WINDOW OPTIMIZER

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD

LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES

HIGH RESOLUTION PHOTOLITHOGRAPHY

SEMICONDUCTOR PROCESSING APPARATUS

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

COMPUTATIONAL WAFER INSPECTION

HOLDING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPH...

EXPOSURE DEVICE

TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...

DETERMINING A CORRECTION TO A PROCESS

LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD

PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE

LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID...

ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

MACHINE AND DEEP LEARNING METHODS FOR SPECTRA-BASED METROLOGY AND P...

METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGR...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

DIGITAL LITHOGRAPHY SCAN SEQUENCING