Defect inspection

Industry

CPC
G03F7/7065

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7065Defect inspection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Light source generation apparatus, light source generating method,...
- Patent number 12,191,621
- Issue date Jan 7, 2025
- National Tsing Hua University
- Andrew Hing Cheong Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilize machine learning in selecting high quality averaged SEM ima...
- Patent number 12,182,983
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Chen Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus
- Patent number 12,124,176
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Pawel Safinowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining overlay error during semiconductor fabrication
- Patent number 12,117,735
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Kai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device feature specific edge placement error (EPE)
- Patent number 12,092,966
- Issue date Sep 17, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitivity improvement of optical and SEM defection inspection
- Patent number 12,066,763
- Issue date Aug 20, 2024
- KLA Corporation
- Kaushik Sah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computational wafer inspection
- Patent number 12,067,340
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Christophe David Fouquet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method, inspection system, and semiconductor fabrication...
- Patent number 12,055,861
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 11,996,335
- Issue date May 28, 2024
- Kioxia Corporation
- Masaya Shima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stochastic contour prediction system, method of providing the stoch...
- Patent number 11,989,873
- Issue date May 21, 2024
- Samsung Electronics Co., Ltd.
- Wooyong Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Through-focus image-based metrology device, operation method thereo...
- Patent number 11,988,495
- Issue date May 21, 2024
- Samsung Electronics Co., Ltd.
- Kwangsoo Kim
- G01 - MEASURING TESTING
Information Patent Grant
Method for detecting defect in semiconductor fabrication process
- Patent number 11,988,970
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yuan-Ku Lan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting stochastic weak points of layout pattern of se...
- Patent number 11,977,828
- Issue date May 7, 2024
- Samsung Electronics Co., Ltd.
- Seungjin Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic patterning method
- Patent number 11,977,337
- Issue date May 7, 2024
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Diederik Jan Maas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Predicting defect rate based on lithographic model parameters
- Patent number 11,914,306
- Issue date Feb 27, 2024
- Synopsys, Inc.
- Erik A. Verduijn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection apparatus lithographic apparatus measurement method
- Patent number 11,914,307
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Bas Johannes Petrus Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Method for characterizing a manufacturing process of semiconductor...
- Patent number 11,860,548
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for detecting rare stochastic defects
- Patent number 11,860,551
- Issue date Jan 2, 2024
- Applied Materials Israel Ltd.
- Guy Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate processing apparatus, sub...
- Patent number 11,823,922
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Akiko Kiyotomi
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
- Publication number 20240427253
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...
- Publication number 20240402617
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Spencer ALEXANDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...
- Publication number 20240402093
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Xiaodong MENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL WAFER INSPECTION
- Publication number 20240403537
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Christophe David FOUQUET
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY
- Publication number 20240377759
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE
- Publication number 20240377758
- Publication date Nov 14, 2024
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SIMULATION APPARATUS, SIMULATION METHOD, PROGRAM RECORDING MEDIUM,...
- Publication number 20240353762
- Publication date Oct 24, 2024
- Canon Kabushiki Kaisha
- HIROMU KIJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND METROLOGY DEVICE
- Publication number 20240345489
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING
Information Patent Application
OPTIMIZATION METHOD OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASU...
- Publication number 20240312847
- Publication date Sep 19, 2024
- AUROS TECHNOLOGY, INC.
- Seung Soo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND MEASURING DEVICE FOR INSPECTING PHOTOMASKS, AND EUV CAMERA
- Publication number 20240295828
- Publication date Sep 5, 2024
- Carl Zeiss SMT GMBH
- Senthil Lakshmanan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280915
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION DATA FILTERING SYSTEMS AND METHODS
- Publication number 20240264539
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Lingling LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET SUPPLY DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240260164
- Publication date Aug 1, 2024
- Gigaphoton Inc.
- Masaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240231242
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REAL-TIME PATTERNING HOTSPOT ANALYZER
- Publication number 20240219847
- Publication date Jul 4, 2024
- Siemens Industry Software Inc.
- Young Chang Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
- Publication number 20240210336
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20240184220
- Publication date Jun 6, 2024
- Gigaphoton Inc.
- Yuichi NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD TO ENSURE PARAMETER MEASUREMENT MATCHING ACROSS M...
- Publication number 20240184219
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINATION METHOD, FORMING METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240168389
- Publication date May 23, 2024
- Canon Kabushiki Kaisha
- SHINGO ISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)
- Publication number 20240168391
- Publication date May 23, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...
- Publication number 20240134289
- Publication date Apr 25, 2024
- ASML NETHERLANDS B.V.
- Bram Paul Theodoor VAN GOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PATTERN FOR A PATTERNING PROCESS, AND METHOD AND SYST...
- Publication number 20240118628
- Publication date Apr 11, 2024
- Prosemi Co., Ltd.
- Chen-Kun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20240112933
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jeonghee Choi
- H01 - BASIC ELECTRIC ELEMENTS

Defect inspection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology data correction using image quality metric

Light source generation apparatus, light source generating method,...

Utilize machine learning in selecting high quality averaged SEM ima...

Metrology method and apparatus for of determining a complex-valued...

Method for measuring critical dimension

Inspection apparatus

Method of determining overlay error during semiconductor fabrication

Method for measuring critical dimension

Process variability aware adaptive inspection and metrology

Device feature specific edge placement error (EPE)

Wavelet system and method for ameliorating misregistration and asym...

Sensitivity improvement of optical and SEM defection inspection

Computational wafer inspection

Inspection method, inspection system, and semiconductor fabrication...

Assembly for collimating broadband radiation

Manufacturing method of semiconductor device

Stochastic contour prediction system, method of providing the stoch...

Through-focus image-based metrology device, operation method thereo...

Method for detecting defect in semiconductor fabrication process

Method for detecting stochastic weak points of layout pattern of se...

Lithographic patterning method

Method for improving a process for a patterning process

Method for producing overlay results with absolute reference for se...

EUV mask defect tool apparatus

Predicting defect rate based on lithographic model parameters

Inspection apparatus lithographic apparatus measurement method

Inspection device for masks for semiconductor lithography and method

Method for characterizing a manufacturing process of semiconductor...

System and method for detecting rare stochastic defects

Substrate inspection apparatus, substrate processing apparatus, sub...

Patents Applicationslast 30 patents

OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS

PHOTODETECTOR

SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...

METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...

COMPUTATIONAL WAFER INSPECTION

INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY

METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

SIMULATION APPARATUS, SIMULATION METHOD, PROGRAM RECORDING MEDIUM,...

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

METROLOGY METHOD AND METROLOGY DEVICE

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...

OPTIMIZATION METHOD OF OVERLAY MEASUREMENT DEVICE AND OVERLAY MEASU...

METHOD AND MEASURING DEVICE FOR INSPECTING PHOTOMASKS, AND EUV CAMERA

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

INSPECTION DATA FILTERING SYSTEMS AND METHODS

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

TARGET SUPPLY DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

REAL-TIME PATTERNING HOTSPOT ANALYZER

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

SYSTEM AND METHOD TO ENSURE PARAMETER MEASUREMENT MATCHING ACROSS M...

DETERMINATION METHOD, FORMING METHOD, ARTICLE MANUFACTURING METHOD,...

DEVICE FEATURE SPECIFIC EDGE PLACEMENT ERROR (EPE)

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS T...

SEMICONDUCTOR PATTERN FOR A PATTERNING PROCESS, AND METHOD AND SYST...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...