Defect inspection

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CPC
G03F7/7065

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7065Defect inspection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic patterning method and system therefore
- Patent number 12,332,574
- Issue date Jun 17, 2025
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Diederik Jan Maas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for automatic diagnostics and monitoring of semiconductor de...
- Patent number 12,332,182
- Issue date Jun 17, 2025
- KLA Corporation
- David W. Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining defectiveness of pattern based on after deve...
- Patent number 12,332,573
- Issue date Jun 17, 2025
- ASML Netherlands B.V.
- Marleen Kooiman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection system, lithographic apparatus, and inspection method
- Patent number 12,313,980
- Issue date May 27, 2025
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation apparatus, computer-readable storage medium, evaluation...
- Patent number 12,293,505
- Issue date May 6, 2025
- Canon Kabushiki Kaisha
- Fuma Kizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for controlling a semiconductor manufacturing process
- Patent number 12,276,919
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to detect a defect on a lithographic sample and metrology sy...
- Patent number 12,271,115
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer registration and overlay measurement systems and related methods
- Patent number 12,230,546
- Issue date Feb 18, 2025
- Micron Technology, Inc.
- Nikolay A. Mirin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for efficient high harmonic generation
- Patent number 12,196,688
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- G01 - MEASURING TESTING
Information Patent Grant
Light source generation apparatus, light source generating method,...
- Patent number 12,191,621
- Issue date Jan 7, 2025
- National Tsing Hua University
- Andrew Hing Cheong Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology data correction using image quality metric
- Patent number 12,189,307
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Fuming Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Utilize machine learning in selecting high quality averaged SEM ima...
- Patent number 12,182,983
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Chen Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus
- Patent number 12,124,176
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Pawel Safinowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining overlay error during semiconductor fabrication
- Patent number 12,117,735
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Kai Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device feature specific edge placement error (EPE)
- Patent number 12,092,966
- Issue date Sep 17, 2024
- KLA Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitivity improvement of optical and SEM defection inspection
- Patent number 12,066,763
- Issue date Aug 20, 2024
- KLA Corporation
- Kaushik Sah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computational wafer inspection
- Patent number 12,067,340
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Christophe David Fouquet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method, inspection system, and semiconductor fabrication...
- Patent number 12,055,861
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 11,996,335
- Issue date May 28, 2024
- Kioxia Corporation
- Masaya Shima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...
- Publication number 20250208520
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...
- Publication number 20250208499
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
- Publication number 20250199521
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...
- Publication number 20250189903
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Komei HIRAHARA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20250155817
- Publication date May 15, 2025
- SEMES CO., LTD.
- Ki Sang EUM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
- Publication number 20250147429
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...
- Publication number 20250147433
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Tsung-Pao FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology in the Presence of CMOS Under Array (CUA) Structures Util...
- Publication number 20250147434
- Publication date May 8, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...
- Publication number 20250147432
- Publication date May 8, 2025
- Resonac Corporation
- Tetsuya KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
- Publication number 20250102923
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Lingling PU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...
- Publication number 20250078244
- Publication date Mar 6, 2025
- ASML NETHERLANDS B.V.
- Chen ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELEMENT OF AN AFM TOOL
- Publication number 20250067768
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Mustafa Ümit ARABUL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
- Publication number 20250044709
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Willem Louis VAN MIERLO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT
- Publication number 20250036030
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Haoyi LIANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING DEFECTS IN SEMICONDUCTOR STRUCTURE AND METHOD...
- Publication number 20250028253
- Publication date Jan 23, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YEN-FONG CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
- Publication number 20240427253
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTODETECTOR
- Publication number 20240402592
- Publication date Dec 5, 2024
- Lasertec Corporation
- Keita SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...
- Publication number 20240402617
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Spencer ALEXANDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...
- Publication number 20240402093
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Xiaodong MENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL WAFER INSPECTION
- Publication number 20240403537
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Christophe David FOUQUET
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY
- Publication number 20240377759
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE
- Publication number 20240377758
- Publication date Nov 14, 2024
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK
- Publication number 20240377728
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIEN-HUNG LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SIMULATION APPARATUS, SIMULATION METHOD, PROGRAM RECORDING MEDIUM,...
- Publication number 20240353762
- Publication date Oct 24, 2024
- Canon Kabushiki Kaisha
- HIROMU KIJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND METROLOGY DEVICE
- Publication number 20240345489
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING

Defect inspection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithographic patterning method and system therefore

System for automatic diagnostics and monitoring of semiconductor de...

Method for determining defectiveness of pattern based on after deve...

Inspection system, lithographic apparatus, and inspection method

Evaluation apparatus, computer-readable storage medium, evaluation...

Method for controlling a semiconductor manufacturing process

Method to detect a defect on a lithographic sample and metrology sy...

Matching process controllers for improved matching of process

Determining hot spot ranking based on wafer measurement

Process window qualification modulation layouts

Selection of measurement locations for patterning processes

Wafer registration and overlay measurement systems and related methods

Optical mode optimization for wafer inspection

Method and apparatus for efficient high harmonic generation

Light source generation apparatus, light source generating method,...

Metrology data correction using image quality metric

Utilize machine learning in selecting high quality averaged SEM ima...

Metrology method and apparatus for of determining a complex-valued...

Method for measuring critical dimension

Inspection apparatus

Method of determining overlay error during semiconductor fabrication

Method for measuring critical dimension

Process variability aware adaptive inspection and metrology

Device feature specific edge placement error (EPE)

Wavelet system and method for ameliorating misregistration and asym...

Sensitivity improvement of optical and SEM defection inspection

Computational wafer inspection

Inspection method, inspection system, and semiconductor fabrication...

Assembly for collimating broadband radiation

Manufacturing method of semiconductor device

Patents Applicationslast 30 patents

A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...

METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS

INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETT...

SUBSTRATE TREATING APPARATUS

DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD

FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...

Metrology in the Presence of CMOS Under Array (CUA) Structures Util...

RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METH...

A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...

UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...

ELEMENT OF AN AFM TOOL

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

METHOD AND APPARATUS TO DETERMINE OVERLAY

AUTO PARAMETER TUNING FOR CHARGED PARTICLE INSPECTION IMAGE ALIGNMENT

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

METHOD FOR DETECTING DEFECTS IN SEMICONDUCTOR STRUCTURE AND METHOD...

OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS

PHOTODETECTOR

SYSTEMS AND METHODS FOR GENERATING SEM-QUALITY METROLOGY DATA FROM...

METHOD AND SYSTEM OF SAMPLE EDGE DETECTION AND SAMPLE POSITIONING F...

COMPUTATIONAL WAFER INSPECTION

INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY

METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE

PHOTOMASK AND METHOD FOR INSPECTING PHOTOMASK

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

SIMULATION APPARATUS, SIMULATION METHOD, PROGRAM RECORDING MEDIUM,...

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

METROLOGY METHOD AND METROLOGY DEVICE

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...