Doping, graded, for tapered etching

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CPC
Y10S148/042

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/042Doping, graded, for tapered etching

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Doping, graded, for tapered etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Microstructure processing method and microstructure processing appa...

Atomic layer etching of tungsten and other metals

Bottom processing

Fabrication method for horizontal direction semiconductor PN juncti...

Semiconductor devices with low dislocation defects

Method for making semiconductor devices with low dislocation defects

Method of fabricating a semiconductor device

Ultra-thin semiconductor membranes

Ultra-thin semiconductor membranes

Schottky barrier device and method of manufacture

Method of forming through holes by differential etching of stacked...

3892606

3769109

3675319

3631303

3589946

3460240

3456209

Patents Applicationslast 30 patents