Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Industry

CPC
G03F7/2037

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2037Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,061,418
- Issue date Aug 13, 2024
- FUJIFILM Corporation
- Hideyuki Ishihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 12,032,287
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition that contains triaryldia...
- Patent number 12,025,916
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material and patterning process
- Patent number 11,994,798
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,914,291
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple patterning with organometallic photopatternable layers wit...
- Patent number 11,886,116
- Issue date Jan 30, 2024
- Inpria Corporation
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and template manufacturing method
- Patent number 11,809,082
- Issue date Nov 7, 2023
- Kioxia Corporation
- Mitsuru Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a patterned structure and device thereof
- Patent number 11,803,125
- Issue date Oct 31, 2023
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive composition and pattern-forming method
- Patent number 11,796,912
- Issue date Oct 24, 2023
- JSR Corporation
- Motohiro Shiratani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Laminate for patterned substrates
- Patent number 11,732,098
- Issue date Aug 22, 2023
- LG Chem, Ltd.
- Mi Sook Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 11,681,224
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Mutsuko Higo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, aci...
- Patent number 11,667,605
- Issue date Jun 6, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yamazaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,656,548
- Issue date May 23, 2023
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,650,497
- Issue date May 16, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 11,650,505
- Issue date May 16, 2023
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Random copolymer, laminate, and method for forming pattern
- Patent number 11,643,488
- Issue date May 9, 2023
- SK Innovation Co., Ltd.
- Nam Kyu Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,635,690
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,688
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,579,529
- Issue date Feb 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Matsui
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,567,406
- Issue date Jan 31, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multiple charged particle beam writing apparatus and multiple charg...
- Patent number 11,556,061
- Issue date Jan 17, 2023
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
- Patent number 11,548,844
- Issue date Jan 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic photoresist adhesion to metal oxide hardmasks
- Patent number 11,543,751
- Issue date Jan 3, 2023
- International Business Machines Corporation
- Abraham Arceo de la Pena
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer compositions for self-assembly applications
- Patent number 11,518,730
- Issue date Dec 6, 2022
- Merck Patent GmbH
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Conductive Polymer Composition, Coated Product, And Patterning Process
- Publication number 20240219836
- Publication date Jul 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240192598
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20240118614
- Publication date Apr 11, 2024
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...
- Publication number 20240118623
- Publication date Apr 11, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PHASE ARRAY ANTENNA BASED ON OPTICAL WAVEGUIDE TYPE WITH HY...
- Publication number 20240077594
- Publication date Mar 7, 2024
- GIST (Gwangju Institute of Science and Technology)
- Nan Ei YU
- G01 - MEASURING TESTING
Information Patent Application
CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION O...
- Publication number 20240061335
- Publication date Feb 22, 2024
- UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Bong Soo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist Material And Patterning Process
- Publication number 20240027903
- Publication date Jan 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PATTERNED BASE MEMBER, PROCESSING METHOD, A...
- Publication number 20240012331
- Publication date Jan 11, 2024
- Nichia Corporation.
- Tsutomu YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TANTALA-RING-RESONATOR-BASED PHOTONIC DEVICE AND FREQUENCY-COMB GEN...
- Publication number 20240004262
- Publication date Jan 4, 2024
- The Regents of the University of Colorado, a body corporate
- Su-Peng Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20230418156
- Publication date Dec 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE
- Publication number 20230359118
- Publication date Nov 9, 2023
- ASML HOLDING N.V.
- Sotrios LYRINTZIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD
- Publication number 20230176479
- Publication date Jun 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20230118534
- Publication date Apr 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...
- Publication number 20230103682
- Publication date Apr 6, 2023
- JSR Corporation
- Kazuki KASAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004082
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004083
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004081
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20220365429
- Publication date Nov 17, 2022
- Inrpia Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...
- Publication number 20220107569
- Publication date Apr 7, 2022
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METASURFACE PRIMARY LENS AND METASURFACE SECONDARY LENS, MANUFACTUR...
- Publication number 20220050225
- Publication date Feb 17, 2022
- SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Guixin Li
- G02 - OPTICS
Information Patent Application
Laminate For Patterned Substrates
- Publication number 20220025138
- Publication date Jan 27, 2022
- LG CHEM, LTD.
- Mi Sook Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF FORMING A PATTERNED STRUCTURE AND DEVICE THEREOF
- Publication number 20210405532
- Publication date Dec 30, 2021
- Singapore University of Technology and Design
- You Sin Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Random Copolymer, Laminate, and Method for Forming Pattern
- Publication number 20210389673
- Publication date Dec 16, 2021
- SK INNOVATION CO., LTD.
- Nam Kyu Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
- Publication number 20210349390
- Publication date Nov 11, 2021
- INPRIA CORPORATION
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS
- Publication number 20210325784
- Publication date Oct 21, 2021
- International Business Machines Corporation
- Abraham Arceo de la Pena
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20210302840
- Publication date Sep 30, 2021
- KIOXIA Corporation
- Mitsuru KONDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20210103217
- Publication date Apr 8, 2021
- FUJIFILM CORPORATION
- Hideyuki Ishihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Resist material and patterning process

Resist underlayer film-forming composition that contains triaryldia...

Resist material and patterning process

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Resist composition and patterning process

Multiple patterning with organometallic photopatternable layers wit...

Pattern forming method and template manufacturing method

Method of forming a patterned structure and device thereof

Radiation-sensitive composition and pattern-forming method

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Method of making semiconductor device and semiconductor device

Laminate for patterned substrates

Sulfonium compound, chemically amplified resist composition, and pa...

Resin, resist composition and method for producing resist pattern

Resist composition, method of forming resist pattern, compound, aci...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Resist composition and method of forming resist pattern

Resist underlayer film-forming composition containing novolac resin...

Random copolymer, laminate, and method for forming pattern

Positive resist composition and patterning process

Resist composition and patterning process

Positive resist composition and patterning process

Positive resist composition and patterning process

Multiple charged particle beam writing apparatus and multiple charg...

Monomer, polymer, negative resist composition, photomask blank, and...

Organic photoresist adhesion to metal oxide hardmasks

Polymer compositions for self-assembly applications

Patents Applicationslast 30 patents

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

Composition For Forming Silicon-Containing Resist Underlayer Film A...

Conductive Polymer Composition, Coated Product, And Patterning Process

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PRO...

OPTICAL PHASE ARRAY ANTENNA BASED ON OPTICAL WAVEGUIDE TYPE WITH HY...

CROSSLINKABLE COMPOUND, COMPOSITION CONTAINING SAME FOR FORMATION O...

Resist Material And Patterning Process

METHOD OF MANUFACTURING PATTERNED BASE MEMBER, PROCESSING METHOD, A...

TANTALA-RING-RESONATOR-BASED PHOTONIC DEVICE AND FREQUENCY-COMB GEN...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE

NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COM...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARG...

METASURFACE PRIMARY LENS AND METASURFACE SECONDARY LENS, MANUFACTUR...

Laminate For Patterned Substrates

METHOD OF FORMING A PATTERNED STRUCTURE AND DEVICE THEREOF

Random Copolymer, Laminate, and Method for Forming Pattern

MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...

ORGANIC PHOTORESIST ADHESION TO METAL OXIDE HARDMASKS

PATTERN FORMING METHOD AND TEMPLATE MANUFACTURING METHOD

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...