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H01J37/32642

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32642Focus rings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma baffle, substrate processing apparatus including the same, a...
- Patent number 12,322,577
- Issue date Jun 3, 2025
- Samsung Electronics Co., Ltd.
- Hakyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,315,708
- Issue date May 27, 2025
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and method for installing edge ring
- Patent number 12,308,221
- Issue date May 20, 2025
- Tokyo Electron Limited
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,300,476
- Issue date May 13, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate transfer position adju...
- Patent number 12,288,678
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,266,511
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 12,249,492
- Issue date Mar 11, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting unit, apparatus for treating substrate includi...
- Patent number 12,243,726
- Issue date Mar 4, 2025
- Semes Co., Ltd.
- Jae-Won Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,237,154
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable edge ring designs
- Patent number 12,230,482
- Issue date Feb 18, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 12,211,728
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250174433
- Publication date May 29, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250157797
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Katsuyuki Koizumi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Composite Structures for Semiconductor Process Chambers
- Publication number 20250149305
- Publication date May 8, 2025
- Tianshu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149291
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149309
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE TILT AND ETCH RATE UNIFORMITY
- Publication number 20250149306
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Pratik Mankidy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
- Publication number 20250140536
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Changheon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM AND MIDDLE EDGE RINGS
- Publication number 20250132135
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Hiran Rajitha RATHNASINGHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250132136
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT
- Publication number 20250118592
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Nick Ray Linebarger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250104979
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME
- Publication number 20250104978
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Dong Mok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250096020
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ALIGNMENT APPARATUS
- Publication number 20250087464
- Publication date Mar 13, 2025
- Samsung Electronics Co., LTD
- Jaehyun SOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING
- Publication number 20250079138
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079133
- Publication date Mar 6, 2025
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250079134
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...
- Publication number 20250069869
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20250069871
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...
- Publication number 20250069861
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Myeongsoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250069865
- Publication date Feb 27, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250069851
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250054793
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20250054735
- Publication date Feb 13, 2025
- Samsung Electronics Co., Ltd.
- Wookhyeon Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250046585
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250046583
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS

Focus rings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma baffle, substrate processing apparatus including the same, a...

Apparatus for treating substrate

Plasma processing apparatus, and method and program for controlling...

Carrier device, semiconductor apparatus, and residual charge detect...

Plasma processing apparatus and methods of manufacturing semiconduc...

Substrate processing system and method for installing edge ring

Stage, plasma processing apparatus, and cleaning method

Plasma processing apparatus, calculation method, and calculation pr...

Plasma processing apparatus and method

Wafer placement table

Plasma processing apparatus

Substrate support and plasma processing apparatus

Plasma processing apparatus and mounting table thereof

Process kit for a substrate support

Substrate processing apparatus including shower head and edge ring...

Substrate processing apparatus and substrate transfer position adju...

Stage and plasma processing apparatus

Substrate support and substrate processing apparatus

Plasma treatment apparatus, lower electrode assembly and forming me...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Electrostatic chuck device

Substrate supporting unit, apparatus for treating substrate includi...

Plasma processing apparatus

Bottom and middle edge rings

Plasma reactor having array of coaxial multiple pins and processing...

Moveable edge ring designs

Semiconductor manufacturing system, method of manufacturing a semic...

High power cable for heated components in RF environment

Electrostatic chuck design with improved chucking and arcing perfor...

Patents Applicationslast 30 patents

METHOD OF PROCESSING A SUBSTRATE

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

Composite Structures for Semiconductor Process Chambers

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

WAFER EDGE TILT AND ETCH RATE UNIFORMITY

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

BOTTOM AND MIDDLE EDGE RINGS

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

APPARATUSES FOR BACKSIDE WAFER PROCESSING WITH EDGE-ONLY WAFER CONTACT

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

SUBSTRATE PROCESSING SYSTEM

RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME

SUBSTRATE PROCESSING APPARATUS

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

FOCUS RING ALIGNMENT APPARATUS

SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...

MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

SUBSTRATE PROCESSING SYSTEM