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H01J37/32642

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32642Focus rings

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device
- Patent number 12,249,492
- Issue date Mar 11, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting unit, apparatus for treating substrate includi...
- Patent number 12,243,726
- Issue date Mar 4, 2025
- Semes Co., Ltd.
- Jae-Won Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,237,154
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having array of coaxial multiple pins and processing...
- Patent number 12,230,481
- Issue date Feb 18, 2025
- HANGZHOU CITY UNIVERSITY
- Qi Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable edge ring designs
- Patent number 12,230,482
- Issue date Feb 18, 2025
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 12,211,728
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control method in semiconductor wafer fabrication
- Patent number 12,205,844
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Huang-Shao Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,198,952
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,198,906
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for physical vapor deposition and method for forming a layer
- Patent number 12,191,127
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsin-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom and middle edge rings
- Patent number 12,183,554
- Issue date Dec 31, 2024
- Lam Research Corporation
- Hiran Rajitha Rathnasinghe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,183,555
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Seunghan Baek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover ring to mitigate carbon contamination in plasma doping chamber
- Patent number 12,165,852
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 12,165,849
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and transfer method
- Patent number 12,165,893
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 12,148,645
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing leakage of heat transfer gas and plasma processi...
- Patent number 12,142,462
- Issue date Nov 12, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated transfer of edge ring requiring rotational alignment
- Patent number 12,142,466
- Issue date Nov 12, 2024
- Lam Research Corporation
- Damon Tyrone Genetti
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conditioning semiconductor processing chamber components
- Patent number 12,129,569
- Issue date Oct 29, 2024
- Lam Research Corporation
- Lin Xu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250104979
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME
- Publication number 20250104978
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Dong Mok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250096020
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masahiro Dogome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ALIGNMENT APPARATUS
- Publication number 20250087464
- Publication date Mar 13, 2025
- Samsung Electronics Co., LTD
- Jaehyun SOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING
- Publication number 20250079138
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079133
- Publication date Mar 6, 2025
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250079134
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...
- Publication number 20250069869
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20250069871
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...
- Publication number 20250069861
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Myeongsoo Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250069865
- Publication date Feb 27, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250069851
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250054793
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20250054735
- Publication date Feb 13, 2025
- Samsung Electronics Co., Ltd.
- Wookhyeon Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250046585
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250046583
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250046573
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250037971
- Publication date Jan 30, 2025
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS STACK FOR CVD PLASMA TREATMENT
- Publication number 20250037976
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Anirudh K. Alewoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING OF AN EDGE RING ASSEMBLY FOR AN ETCHING SYSTEM
- Publication number 20250022690
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi Chiuan Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION
- Publication number 20240429089
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Peter MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTROLLING IMPEDANCE AND SYSTEM FOR TREATING SUBSTRA...
- Publication number 20240420936
- Publication date Dec 19, 2024
- SEMES CO., LTD.
- Hyo Seong Seong
- H01 - BASIC ELECTRIC ELEMENTS

Focus rings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma treatment apparatus, lower electrode assembly and forming me...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Electrostatic chuck device

Substrate supporting unit, apparatus for treating substrate includi...

Plasma processing apparatus

Bottom and middle edge rings

Plasma reactor having array of coaxial multiple pins and processing...

Moveable edge ring designs

Semiconductor manufacturing system, method of manufacturing a semic...

High power cable for heated components in RF environment

Electrostatic chuck design with improved chucking and arcing perfor...

Plasma control method in semiconductor wafer fabrication

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Substrate support and plasma processing apparatus

Apparatus for physical vapor deposition and method for forming a layer

Bottom and middle edge rings

Substrate processing apparatus and method of manufacturing semicond...

Cleaning method and plasma processing apparatus

Plasma processing method for manufacturing semiconductor structure

Cover ring to mitigate carbon contamination in plasma doping chamber

Plasma processing apparatus and etching method

Substrate processing system and transfer method

Plasma uniformity control in pulsed DC plasma chamber

Calibration jig and calibration method

Method of reducing leakage of heat transfer gas and plasma processi...

Automated transfer of edge ring requiring rotational alignment

Plasma processing chambers configured for tunable substrate and edg...

Method for conditioning semiconductor processing chamber components

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM

RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME

SUBSTRATE PROCESSING APPARATUS

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

FOCUS RING ALIGNMENT APPARATUS

SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...

MAGNETIC ELEMENT ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUD...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE

PROCESS STACK FOR CVD PLASMA TREATMENT

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

RING OF AN EDGE RING ASSEMBLY FOR AN ETCHING SYSTEM

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION

PLASMA PROCESSING APPARATUS

APPARATUS FOR CONTROLLING IMPEDANCE AND SYSTEM FOR TREATING SUBSTRA...