from the gas phase, by plasma deposition

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/167from the gas phase, by plasma deposition

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry development of resists
- Patent number 12,211,691
- Issue date Jan 28, 2025
- Lam Research Corporation
- Boris Volosskiy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, mask fabrication method, and mask assembly
- Patent number 12,116,660
- Issue date Oct 15, 2024
- Samsung Display Co., Ltd.
- Ji-Hee Son
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor phase photoresists deposition
- Patent number 12,084,764
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Macromolecular sieves from semiconductor membranes for shape-based...
- Patent number 12,002,674
- Issue date Jun 4, 2024
- WiSys Technology Foundation, Inc.
- Gokul Gopalakrishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardmask composition and method of forming patterns
- Patent number 11,932,715
- Issue date Mar 19, 2024
- Samsung SDI Co., Ltd.
- Donghoon Won
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Imprint compositions with passivated nanoparticles and materials an...
- Patent number 11,868,043
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Amita Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 11,809,081
- Issue date Nov 7, 2023
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 11,754,924
- Issue date Sep 12, 2023
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 11,650,500
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organometallic compounds and purification of such organometallic co...
- Patent number 11,643,422
- Issue date May 9, 2023
- SEASTAR CHEMICALS ULC
- Rajesh Odedra
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High-resolution shadow masks
- Patent number 11,638,388
- Issue date Apr 25, 2023
- The Hong Kong University of Science and Technology
- Shoucheng Dong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing metal wire and metal wire grid, wire grid p...
- Patent number 11,619,773
- Issue date Apr 4, 2023
- BOE Technology Group Co., Ltd.
- Shuilang Dong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-noise biomolecular sensors
- Patent number 11,604,183
- Issue date Mar 14, 2023
- Roche Sequencing Solutions, Inc.
- Chao Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 11,537,048
- Issue date Dec 27, 2022
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method using multiline patterning
- Patent number 11,515,160
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Akiteru Ko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for plasmonic-based high resolution color printing
- Patent number 11,513,438
- Issue date Nov 29, 2022
- Agency for Science, Technology and Research
- Joel Kwang Wei Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and precursors for producing oxostannate rich films
- Patent number 11,459,656
- Issue date Oct 4, 2022
- Gelest, Inc.
- Barry C. Arkles
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-level substrate coating film-forming composition containing p...
- Patent number 11,385,546
- Issue date Jul 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,314,168
- Issue date Apr 26, 2022
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor manu...
- Patent number 11,217,431
- Issue date Jan 4, 2022
- Kioxia Corporation
- Ryuichi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 11,209,729
- Issue date Dec 28, 2021
- Lam Research Corporation
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment apparatus, substrate treatment method, and comp...
- Patent number 11,126,086
- Issue date Sep 21, 2021
- Tokyo Electron Limited
- Teruhiko Kodama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 10,942,455
- Issue date Mar 9, 2021
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...
- Publication number 20250054759
- Publication date Feb 13, 2025
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20250028242
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...
- Publication number 20250020996
- Publication date Jan 16, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS
- Publication number 20240419068
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Daniele Piumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20240411227
- Publication date Dec 12, 2024
- Korea Advanced Institute of Science and Technology
- Sung Gap Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20240411228
- Publication date Dec 12, 2024
- JSR Corporation
- Ken MARUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240385523
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...
- Publication number 20240377751
- Publication date Nov 14, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY
- Publication number 20240369933
- Publication date Nov 7, 2024
- David Howard Fairbrother
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...
- Publication number 20240361695
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...
- Publication number 20240337925
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Adhesive Film, Patterning Process, And Method...
- Publication number 20240310731
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOUND FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FO...
- Publication number 20240295818
- Publication date Sep 5, 2024
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...
- Publication number 20240210821
- Publication date Jun 27, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST
- Publication number 20240201586
- Publication date Jun 20, 2024
- Intel Corporation
- James Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and related systems for depositing EUV sensitive films
- Publication number 20240201596
- Publication date Jun 20, 2024
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...
- Publication number 20240192590
- Publication date Jun 13, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20240160100
- Publication date May 16, 2024
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
- Publication number 20240152055
- Publication date May 9, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240134274
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

from the gas phase, by plasma deposition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device and pattern formatio...

Dry development of resists

Metal oxide resist patterning with electrical field guided post-exp...

Integrated dry processes for patterning radiation photoresist patte...

Mask, mask fabrication method, and mask assembly

Photoresist development with halide chemistries

Vapor phase photoresists deposition

Macromolecular sieves from semiconductor membranes for shape-based...

Underlayer for photoresist adhesion and dose reduction

Hardmask composition and method of forming patterns

Manufacturing method of semiconductor chip, and kit

Deposition of semiconductor integration films

Imprint compositions with passivated nanoparticles and materials an...

Organotin oxide hydroxide patterning compositions, precursors, and...

Organotin oxide hydroxide patterning compositions, precursors, and...

Photoresist and method of formation and use

Organometallic compounds and purification of such organometallic co...

High-resolution shadow masks

Method of manufacturing metal wire and metal wire grid, wire grid p...

Low-noise biomolecular sensors

Organotin oxide hydroxide patterning compositions, precursors, and...

Substrate processing method using multiline patterning

Process for plasmonic-based high resolution color printing

Method and precursors for producing oxostannate rich films

Multi-level substrate coating film-forming composition containing p...

Underlayer for photoresist adhesion and dose reduction

Method of manufacturing semiconductor device and semiconductor manu...

Vacuum-integrated hardmask processes and apparatus

Substrate treatment apparatus, substrate treatment method, and comp...

Manufacturing method of semiconductor chip, and kit

Patents Applicationslast 30 patents

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

METAL OXIDE RESIST LAYERS INCLUDING BISMUTH AND PHOSPHORUS AND RELA...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES

Material For Forming Organic Film, Patterning Process, And Organic...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...

MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...

ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHO...

Optical Device and Method of Manufacture

Composition For Forming Silicon-Containing Resist Underlayer Film A...

Material For Forming Adhesive Film, Patterning Process, And Method...

UNDERLAYER COMPOUND FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FO...

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...

PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST

Methods and related systems for depositing EUV sensitive films

APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...