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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Composition containing a heterocyclic compound having a dicyanostyr...
- Patent number 12,366,804
- Issue date Jul 22, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming adhesive film, patterning process, and method...
- Patent number 12,351,742
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Mamoru Watabe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Process tool for dry removal of photoresist
- Patent number 12,346,035
- Issue date Jul 1, 2025
- Lam Research Corporation
- Dries Dictus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 12,332,565
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced directed self-assembly in the presence of low Tg oligomers...
- Patent number 12,319,810
- Issue date Jun 3, 2025
- Merck Patent GmbH
- Durairaj Baskaran
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Lithography system and methods
- Patent number 12,287,572
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic device and method for manufacturing target substrate
- Patent number 12,287,577
- Issue date Apr 29, 2025
- Innolux Corporation
- Chien-Hsing Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cyclic method for reactive development of photoresists
- Patent number 12,287,578
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating structured membranes
- Patent number 12,259,656
- Issue date Mar 25, 2025
- UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA.
- Elissa Williams
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry development of resists
- Patent number 12,211,691
- Issue date Jan 28, 2025
- Lam Research Corporation
- Boris Volosskiy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal display device and manufacturing method thereof
- Patent number 12,072,581
- Issue date Aug 27, 2024
- Japan Display Inc.
- Shoichi Uchino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of manufacturing at least a portion of a magnetic layer of...
- Patent number 11,948,614
- Issue date Apr 2, 2024
- Seagate Technology LLC
- Xiaomin Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
- Patent number 11,914,301
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterned photoresist
- Patent number 11,886,121
- Issue date Jan 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chih Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deep etching substrates using a bi-layer etch mask
- Patent number 11,886,122
- Issue date Jan 30, 2024
- Fraunhofer USA, Inc.
- Jung-Hun Seo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 11,822,238
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Relief precursor having low cupping and fluting
- Patent number 11,822,246
- Issue date Nov 21, 2023
- Flint Group Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Adhesive Film And Patterning Process
- Publication number 20250237955
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Metal-Containing Film And Patterning Process
- Publication number 20250237954
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231486
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...
- Publication number 20250231487
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250224683
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLLOIDAL PARTICLE INK COMPOSITION, METHOD OF FORMING COLLOIDAL PAR...
- Publication number 20250228116
- Publication date Jul 10, 2025
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Bong Soo KIM
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250164886
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST
- Publication number 20250138429
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Qi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLEXIBLE MICROPOROUS MULTI-RESONANT PLASMONICS MESHES
- Publication number 20250116800
- Publication date Apr 10, 2025
- Virginia Tech Intellectual Properties, Inc.
- Aditya Garg
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRY DEVELOPMENT OF RESISTS
- Publication number 20250112045
- Publication date Apr 3, 2025
- LAM RESEARCH CORPORATION
- Boris Volosskiy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250093775
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
- Publication number 20250060674
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Da LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20250053080
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS
- Publication number 20250053084
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST
- Publication number 20250053092
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Nizan Kenane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20250028242
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING APPARATUS, SUBSTRATE TREATMENT SYSTEM, AND DEVELOPING ME...
- Publication number 20240402609
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Kenji IIZUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...
- Publication number 20240329538
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Da Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...
- Publication number 20240280518
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Hideo NAGASAKI
- G01 - MEASURING TESTING
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Imagewise removal not covered by groups G03F7/30 - G03F7/34

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Composition containing a heterocyclic compound having a dicyanostyr...

Material for forming adhesive film, patterning process, and method...

Process tool for dry removal of photoresist

Thermosetting iodine- and silicon-containing material, composition...

Metal oxide resists for EUV patterning and methods for developing t...

Enhanced directed self-assembly in the presence of low Tg oligomers...

Insulating layer for multilayer printed circuit board, multilayer p...

Lithography system and methods

Electronic device and method for manufacturing target substrate

Cyclic method for reactive development of photoresists

Integrated dry processes for patterning radiation photoresist patte...

Method of fabricating structured membranes

Silicon-containing resist underlayer film-forming composition inclu...

Dry development of resists

Photoresist composition and method of forming photoresist pattern

Integrated dry processes for patterning radiation photoresist patte...

Extreme ultraviolet photolithography method with developer composition

Photoresist development with halide chemistries

Liquid crystal display device and manufacturing method thereof

Vapor phase thermal etch solutions for metal oxo photoresists

Vapor phase thermal etch solutions for metal oxo photoresists

Semiconductor devices and methods of manufacturing

Photoresist composition and method of manufacturing a semiconductor...

Methods of manufacturing at least a portion of a magnetic layer of...

Thermosetting iodine- and silicon-containing material, composition...

Photoresist, method of manufacturing a semiconductor device and met...

Method for forming patterned photoresist

Deep etching substrates using a bi-layer etch mask

Extreme ultraviolet photolithography method with developer composition

Relief precursor having low cupping and fluting

Patents Applicationslast 30 patents

Composition For Forming Adhesive Film And Patterning Process

Composition For Forming Metal-Containing Film And Patterning Process

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FI...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

COLLOIDAL PARTICLE INK COMPOSITION, METHOD OF FORMING COLLOIDAL PAR...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST

FLEXIBLE MICROPOROUS MULTI-RESONANT PLASMONICS MESHES

DRY DEVELOPMENT OF RESISTS

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS

AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

DEVELOPING APPARATUS, SUBSTRATE TREATMENT SYSTEM, AND DEVELOPING ME...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...

ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...