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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/36Imagewise removal not covered by groups G03F7/30 - G03F7/34

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal display device and manufacturing method thereof
- Patent number 12,072,581
- Issue date Aug 27, 2024
- Japan Display Inc.
- Shoichi Uchino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of manufacturing at least a portion of a magnetic layer of...
- Patent number 11,948,614
- Issue date Apr 2, 2024
- Seagate Technology LLC
- Xiaomin Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
- Patent number 11,914,301
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chieh-Hsin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterned photoresist
- Patent number 11,886,121
- Issue date Jan 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chih Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deep etching substrates using a bi-layer etch mask
- Patent number 11,886,122
- Issue date Jan 30, 2024
- Fraunhofer USA, Inc.
- Jung-Hun Seo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 11,822,238
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Relief precursor having low cupping and fluting
- Patent number 11,822,246
- Issue date Nov 21, 2023
- Flint Group Germany GmbH
- Matthias Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic cluster photoresists for EUV lithography
- Patent number 11,767,336
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Kai Chang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition, method for preparing the same, and pattern...
- Patent number 11,762,290
- Issue date Sep 19, 2023
- Beijing Asahi Electronic Materials Co., Ltd
- Teng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for thermally developing relief precursors
- Patent number 11,718,085
- Issue date Aug 8, 2023
- Flint Group Germany GmbH
- Peter Fronczkiewicz
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 11,714,355
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Po Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,703,765
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,698,587
- Issue date Jul 11, 2023
- Samsung SDI Co., Ltd.
- Shinhyo Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Liquid crystal display device and manufacturing method thereof
- Patent number 11,681,184
- Issue date Jun 20, 2023
- Japan Display Inc.
- Shoichi Uchino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 11,621,172
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing coating agent for pattern reversal
- Patent number 11,609,499
- Issue date Mar 21, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low-noise biomolecular sensors
- Patent number 11,604,183
- Issue date Mar 14, 2023
- Roche Sequencing Solutions, Inc.
- Chao Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Organometallic cluster photoresists for EUV lithography
- Patent number 11,579,531
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Kai Chang
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation sensitive composition
- Patent number 11,561,472
- Issue date Jan 24, 2023
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanoimprint lithography material with switchable mechanical properties
- Patent number 11,415,880
- Issue date Aug 16, 2022
- Facebook Technologies, LLC
- Austin Lane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal display device and manufacturing method thereof
- Patent number 11,391,993
- Issue date Jul 19, 2022
- Japan Display Inc.
- Shoichi Uchino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
System for thermal development of flexographic printing plates
- Patent number 11,325,369
- Issue date May 10, 2022
- MacDermid Graphics Solutions, LLC
- Gary T. Markhart
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method for producing pictorial relief structures
- Patent number 11,325,368
- Issue date May 10, 2022
- Flint Group Germany GmbH
- Thomas Telser
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming process
- Patent number 11,256,174
- Issue date Feb 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING APPARATUS, SUBSTRATE TREATMENT SYSTEM, AND DEVELOPING ME...
- Publication number 20240402609
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Kenji IIZUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...
- Publication number 20240329538
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Da Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...
- Publication number 20240280518
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Hideo NAGASAKI
- G01 - MEASURING TESTING
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF
- Publication number 20240192600
- Publication date Jun 13, 2024
- Darwin Precisions Corporation
- Cheng-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240196505
- Publication date Jun 13, 2024
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MONODISPERSE GRANULAR FILM, METHOD FOR FORMING THE MONODISPERSE GRA...
- Publication number 20240192603
- Publication date Jun 13, 2024
- ZHEJIANG JINKO SOLAR CO., LTD
- Yuanfang ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPMENT MEDIUM, HEAT DEVELOPMENT METHOD, AND HEAT DEVELOPMENT S...
- Publication number 20240184210
- Publication date Jun 6, 2024
- Asahi Kasei Kabushiki Kaisha
- Hiroki AKIYAMA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...
- Publication number 20240160100
- Publication date May 16, 2024
- Applied Materials, Inc.
- Tzu Shun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240134274
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20240112933
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jeonghee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED PHOTORESIST
- Publication number 20240103375
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chih HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE
- Publication number 20240096596
- Publication date Mar 21, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Method for Reactive Development of Photoresists
- Publication number 20240053684
- Publication date Feb 15, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal Oxide Resists for EUV Patterning and Methods for Developing t...
- Publication number 20240045337
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...
- Publication number 20240038546
- Publication date Feb 1, 2024
- SHOWA DENKO K.K.
- Kazuma MATSUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
- Publication number 20240036474
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM
- Publication number 20240036473
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Seiji FUJIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structured Film and Method of Using Same to Form a Pattern on a Sub...
- Publication number 20240004282
- Publication date Jan 4, 2024
- 3M Innovative Properties Company
- Martin B. Wolk
- G02 - OPTICS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR
- Publication number 20230416606
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Dries DICTUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS-BASED DEVELOPMENT OF ORGANOMETALLIC RESIST IN AN OXIDIZING HALO...
- Publication number 20230408916
- Publication date Dec 21, 2023
- Inpria Corpoartion
- Peter de Schepper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20230400763
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM
- Publication number 20230393483
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Shinichiro Kawakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Imagewise removal not covered by groups G03F7/30 - G03F7/34

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist development with halide chemistries

Liquid crystal display device and manufacturing method thereof

Vapor phase thermal etch solutions for metal oxo photoresists

Vapor phase thermal etch solutions for metal oxo photoresists

Semiconductor devices and methods of manufacturing

Photoresist composition and method of manufacturing a semiconductor...

Methods of manufacturing at least a portion of a magnetic layer of...

Thermosetting iodine- and silicon-containing material, composition...

Photoresist, method of manufacturing a semiconductor device and met...

Method for forming patterned photoresist

Deep etching substrates using a bi-layer etch mask

Extreme ultraviolet photolithography method with developer composition

Relief precursor having low cupping and fluting

Organometallic cluster photoresists for EUV lithography

Photoresist composition, method for preparing the same, and pattern...

Method for thermally developing relief precursors

Photoresist composition and method of forming photoresist pattern

Photoresist composition and method of manufacturing a semiconductor...

Resist underlayer composition, and method of forming patterns using...

Liquid crystal display device and manufacturing method thereof

Vapor phase thermal etch solutions for metal oxo photoresists

Silicon-containing coating agent for pattern reversal

Low-noise biomolecular sensors

Organometallic cluster photoresists for EUV lithography

Radiation sensitive composition

Nanoimprint lithography material with switchable mechanical properties

Liquid crystal display device and manufacturing method thereof

System for thermal development of flexographic printing plates

Method for producing pictorial relief structures

Pattern forming process

Patents Applicationslast 30 patents

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

DEVELOPING APPARATUS, SUBSTRATE TREATMENT SYSTEM, AND DEVELOPING ME...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...

ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

MONODISPERSE GRANULAR FILM, METHOD FOR FORMING THE MONODISPERSE GRA...

DEVELOPMENT MEDIUM, HEAT DEVELOPMENT METHOD, AND HEAT DEVELOPMENT S...

INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTOR...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

METHOD FOR FORMING PATTERNED PHOTORESIST

PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE

Cyclic Method for Reactive Development of Photoresists

Metal Oxide Resists for EUV Patterning and Methods for Developing t...

PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

SUBSTRATE TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM

Structured Film and Method of Using Same to Form a Pattern on a Sub...

PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR

GAS-BASED DEVELOPMENT OF ORGANOMETALLIC RESIST IN AN OXIDIZING HALO...

LITHOGRAPHY SYSTEM AND METHODS

HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM