Information management and control, including software

Industry

CPC
G03F7/70491

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70491Information management and control, including software

Industries

Patents Grantslast 30 patents

Information Patent Grant
Liquid amount measuring method and computer-readable recording medium
- Patent number 12,174,549
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Yuichiro Kunugimoto
- B08 - CLEANING
Information Patent Grant
Storage for extreme ultraviolet light lithography
- Patent number 12,169,369
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Guancyun Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to manufacture nano ridges in hard ceramic coatings
- Patent number 12,111,581
- Issue date Oct 8, 2024
- ASML Holding N.V.
- Mehmet Ali Akbas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography contamination control
- Patent number 12,055,867
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh Hsieh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Beam position image optimization
- Patent number 12,044,978
- Issue date Jul 23, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 12,013,646
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Verification metrology targets and their design
- Patent number 11,874,605
- Issue date Jan 16, 2024
- KLA Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 11,829,676
- Issue date Nov 28, 2023
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calibration method for a lithographic system
- Patent number 11,774,861
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Cornelis Melchior Brouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 11,748,551
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing system, liquid amount measuring method, comput...
- Patent number 11,726,409
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Yuichiro Kunugimoto
- B08 - CLEANING
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning method and apparatus for particles on reticle, storage...
- Patent number 11,675,275
- Issue date Jun 13, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuang Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography contamination control
- Patent number 11,662,668
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chieh Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 11,614,691
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Development environment deployment for multiple developer types
- Patent number 11,604,632
- Issue date Mar 14, 2023
- Fastly, Inc.
- Eric Hodel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Parallel scatterometry overlay metrology
- Patent number 11,531,275
- Issue date Dec 20, 2022
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing an apparatus for multi-stage processing of product units
- Patent number 11,520,238
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Jelle Nije
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanoimprint lithography material with switchable mechanical properties
- Patent number 11,415,880
- Issue date Aug 16, 2022
- Facebook Technologies, LLC
- Austin Lane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance management method for lithography system, maintenance m...
- Patent number 11,353,801
- Issue date Jun 7, 2022
- Gigaphoton Inc.
- Kunihiko Abe
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 11,347,926
- Issue date May 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scaling metric for quantifying metrology sensitivity to process var...
- Patent number 11,333,982
- Issue date May 17, 2022
- KLA Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanoimprint lithography processes for switching mechanical properti...
- Patent number 11,249,393
- Issue date Feb 15, 2022
- Facebook Technologies, LLC
- Austin Lane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detection apparatus, position detection method, lithograph...
- Patent number 11,249,401
- Issue date Feb 15, 2022
- Canon Kabushiki Kaisha
- Genki Murayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of operating semiconductor apparatus and semiconductor appar...
- Patent number 11,243,479
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiang Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Imprint device and method for manufacturing article
- Patent number 11,209,731
- Issue date Dec 28, 2021
- Canon Kabushiki Kaisha
- Hirotoshi Torii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS
- Publication number 20240369947
- Publication date Nov 7, 2024
- ASML Holding N.V.
- Mehmet Ali AKBAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...
- Publication number 20240369943
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Kedir Mohammed ADAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20240361708
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20240295826
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240053941
- Publication date Feb 15, 2024
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL...
- Publication number 20240036464
- Publication date Feb 1, 2024
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...
- Publication number 20240027916
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- RUIYING HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM POSITION IMAGE OPTIMIZATION
- Publication number 20240012336
- Publication date Jan 11, 2024
- Mycronic AB
- Anders SVENSSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIQUID AMOUNT MEASURING METHOD AND COMPUTER-READABLE RECORDING MEDIUM
- Publication number 20230418166
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Yuichiro KUNUGIMOTO
- B08 - CLEANING
Information Patent Application
Optical Mode Optimization for Wafer Inspection
- Publication number 20230367951
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230367230
- Publication date Nov 16, 2023
- Nikon Corporation
- Koichi MURAKAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE OPTIMIZATION APPARATUS AND LIGHT SOURCE OPTIMIZATION M...
- Publication number 20230325641
- Publication date Oct 12, 2023
- WINBOND ELECTRONICS CORP.
- Tung-Yu Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR...
- Publication number 20230305384
- Publication date Sep 28, 2023
- PHOTRONICS, INC.
- Christopher Progler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20230273534
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20230251581
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20230066297
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20230060899
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20230049308
- Publication date Feb 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FIELD-OF-VIEW SETTING
- Publication number 20230023153
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM
- Publication number 20220390855
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Cornelis Melchior BROUWER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20220342319
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Method and Method for Training a Data Structure for Use i...
- Publication number 20220309645
- Publication date Sep 29, 2022
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Mode Optimization for Wafer Inspection
- Publication number 20220284167
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS FOR AND METHOD OF MODULATING A LIGHT SOURCE WAVELENGTH
- Publication number 20220231474
- Publication date Jul 21, 2022
- CYMER, LLC
- Kuo-Tai Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, LIQUID AMOUNT MEASURING METHOD, AND CO...
- Publication number 20220171294
- Publication date Jun 2, 2022
- TOKYO ELECTRON LIMITED
- Yuichiro KUNUGIMOTO
- B08 - CLEANING
Information Patent Application
POSITIONING METHOD AND APPARATUS FOR PARTICLES ON RETICLE, STORAGE...
- Publication number 20220137521
- Publication date May 5, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Shuang XIA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Non-Destructive Coupon Generation via Direct Write Lithography for...
- Publication number 20220113635
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Anthony R. Schepis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
- Publication number 20220026799
- Publication date Jan 27, 2022
- Facebook Technologies, LLC
- Austin Lane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS
- Publication number 20220004108
- Publication date Jan 6, 2022
- ASML NETHERLANDS B.V.
- Jelle NIJE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Information management and control, including software

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Liquid amount measuring method and computer-readable recording medium

Storage for extreme ultraviolet light lithography

Method to manufacture nano ridges in hard ceramic coatings

Lithography contamination control

Beam position image optimization

High throughput and high position accurate method for particle insp...

Method for controlling a manufacturing process and associated appar...

Verification metrology targets and their design

Information processing apparatus and information processing method

Calibration method for a lithographic system

Optical mode optimization for wafer inspection

Substrate processing system, liquid amount measuring method, comput...

Method to predict yield of a device manufacturing process

Positioning method and apparatus for particles on reticle, storage...

Lithography contamination control

High throughput and high position accurate method for particle insp...

Development environment deployment for multiple developer types

Parallel scatterometry overlay metrology

Optimizing an apparatus for multi-stage processing of product units

Methods and apparatus for monitoring a lithographic manufacturing p...

Nanoimprint lithography material with switchable mechanical properties

Method for determining contribution to a fingerprint

Maintenance management method for lithography system, maintenance m...

Optical mode optimization for wafer inspection

Scaling metric for quantifying metrology sensitivity to process var...

Systems and methods using mask pattern measurements performed with...

Nanoimprint lithography processes for switching mechanical properti...

Position detection apparatus, position detection method, lithograph...

Method of operating semiconductor apparatus and semiconductor appar...

Imprint device and method for manufacturing article

Patents Applicationslast 30 patents

METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS

METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...

LITHOGRAPHY CONTAMINATION CONTROL

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD

SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL...

FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...

BEAM POSITION IMAGE OPTIMIZATION

LIQUID AMOUNT MEASURING METHOD AND COMPUTER-READABLE RECORDING MEDIUM

Optical Mode Optimization for Wafer Inspection

EXPOSURE APPARATUS

LIGHT SOURCE OPTIMIZATION APPARATUS AND LIGHT SOURCE OPTIMIZATION M...

LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR...

LITHOGRAPHY CONTAMINATION CONTROL

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

LITHOGRAPHY CONTAMINATION CONTROL

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

METHOD FOR DETERMINING A FIELD-OF-VIEW SETTING

CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

Metrology Method and Method for Training a Data Structure for Use i...

Optical Mode Optimization for Wafer Inspection

APPARATUS FOR AND METHOD OF MODULATING A LIGHT SOURCE WAVELENGTH

SUBSTRATE PROCESSING SYSTEM, LIQUID AMOUNT MEASURING METHOD, AND CO...

POSITIONING METHOD AND APPARATUS FOR PARTICLES ON RETICLE, STORAGE...

Non-Destructive Coupon Generation via Direct Write Lithography for...

NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK

OPTIMIZING AN APPARATUS FOR MULTI-STAGE PROCESSING OF PRODUCT UNITS