Macromolecular compounds which are photodegradable

Industry

CPC
G03F7/039

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/039Macromolecular compounds which are photodegradable

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PAG-free positive chemically amplified resist composition and metho...
- Patent number 12,360,453
- Issue date Jul 15, 2025
- Merck Patent GmbH
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing indium-containing organic polymer film, pa...
- Patent number 12,353,131
- Issue date Jul 8, 2025
- Kioxia Corporation
- Koji Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 12,345,903
- Issue date Jul 1, 2025
- Materion Corporation
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing resin composition and preparation method thereo...
- Patent number 12,346,025
- Issue date Jul 1, 2025
- XI'AN MANARECO NEW MATERIALS CO., LTD.
- Yang Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method and composition
- Patent number 12,332,563
- Issue date Jun 17, 2025
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing microstructure including cured products of...
- Patent number 12,326,662
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing high-density in-line carbon nanotube thin...
- Patent number 12,303,930
- Issue date May 20, 2025
- BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD
- Jie Han
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mask for EUV lithography and method of manufacturing the same
- Patent number 12,298,662
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography
- Patent number 12,298,667
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Che Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow cells and methods for making the same
- Patent number 12,298,665
- Issue date May 13, 2025
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,276,911
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer material in a redistribution structure of a semiconductor p...
- Patent number 12,265,330
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sih-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electronic system of specimen qualification
- Patent number 12,253,473
- Issue date Mar 18, 2025
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih Chang
- G01 - MEASURING TESTING
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and pattern forming method
- Patent number 12,248,249
- Issue date Mar 11, 2025
- Oji Holdings Corporation
- Kimiko Hattori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Print process for color conversion layer using porous host or posit...
- Patent number 12,237,445
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Hou T. Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN,...
- Publication number 20250237950
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250237951
- Publication date Jul 24, 2025
- FUJIFILM CORPORATION
- Kotaro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20250231482
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...
- Publication number 20250231484
- Publication date Jul 17, 2025
- Sumitomo Chemical Company, Limited
- Masaru HATABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250231481
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231483
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
- Publication number 20250224675
- Publication date Jul 10, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250224671
- Publication date Jul 10, 2025
- FUJIFILM CORPORATION
- Takahiro Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF
- Publication number 20250224674
- Publication date Jul 10, 2025
- Chang Chun Plastics Co., Ltd.
- Zih-I CHUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...
- Publication number 20250216763
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250216780
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER
- Publication number 20250216783
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20250199406
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...
- Publication number 20250199402
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Susumu TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION
- Publication number 20250204164
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Yugo TANIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...
- Publication number 20250199405
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...
- Publication number 20250199401
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Kenta AOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250199404
- Publication date Jun 19, 2025
- FUJIFILM CORPORATION
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING PLATED ARTICLE
- Publication number 20250189895
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...
- Publication number 20250188223
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...
- Publication number 20250189889
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sih-Hao Liao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE SURFACE TREATING AGENT, LAMINATE, PATTERN FORMATION...
- Publication number 20250180990
- Publication date Jun 5, 2025
- Nikon Corporation
- Yusuke KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20250180988
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Macromolecular compounds which are photodegradable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film-forming composition

PAG-free positive chemically amplified resist composition and metho...

Method for manufacturing indium-containing organic polymer film, pa...

Photo resist as opaque aperture mask on multispectral filter arrays

Fluorine-containing resin composition and preparation method thereo...

Pattern-forming method and composition

Method for manufacturing microstructure including cured products of...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Method for manufacturing high-density in-line carbon nanotube thin...

Photoacid generator for chemically amplified photoresists for deep...

Mask for EUV lithography and method of manufacturing the same

Lithography

Flow cells and methods for making the same

Photoresist and method of formation and use

Photoresist compositions and pattern formation methods

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Positive resist composition and pattern forming process

Radiation-sensitive resin composition and method for forming resist...

Polymer material in a redistribution structure of a semiconductor p...

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Electronic system of specimen qualification

Positive resist composition and pattern forming process

Resist material and pattern forming method

Print process for color conversion layer using porous host or posit...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN,...

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN AND METHOD...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF

PHOTORESIST AND METHOD OF FORMATION AND USE

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...

DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD OF MANUFACTURING PLATED ARTICLE

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE SURFACE TREATING AGENT, LAMINATE, PATTERN FORMATION...

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD