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Macromolecular compounds which are photodegradable
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PHYSICS
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Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
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Macromolecular compounds which are photodegradable
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Patents Grants
last 30 patents
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Patent Grant
Substrate treating apparatus and substrate treating method
Patent number
11,977,332
Issue date
May 7, 2024
Semes Co., Ltd.
Hae-Won Choi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor devices and methods of manufacturing
Patent number
11,977,333
Issue date
May 7, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polybenzoxazole precursor and application thereof
Patent number
11,976,170
Issue date
May 7, 2024
Microcosm Technology Co., Ltd.
Steve Lien-chung Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cross-linked polymer for resist
Patent number
11,971,660
Issue date
Apr 30, 2024
Maruzen Petrochemical Co., LTD
Tomohiro Masukawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer containing photoacid generator
Patent number
11,970,557
Issue date
Apr 30, 2024
LG Chem, Ltd.
Jihye Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
Patent number
11,966,162
Issue date
Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Radiation-sensitive resin composition and method for forming pattern
Patent number
11,966,160
Issue date
Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
Patent number
11,966,161
Issue date
Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist composition, coated substrate including the photoresist...
Patent number
11,960,206
Issue date
Apr 16, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and resist film
Patent number
11,960,207
Issue date
Apr 16, 2024
Zeon Corporation
Manabu Hoshino
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Two-stage bake photoresist with releasable quencher
Patent number
11,955,343
Issue date
Apr 9, 2024
Intel Corporation
Robert L. Bristol
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,953,832
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
Patent number
11,947,258
Issue date
Apr 2, 2024
Rohm and Hass Electronic Materials LLC
Emad Aqad
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist compositions and pattern formation methods
Patent number
11,940,730
Issue date
Mar 26, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Monomers, polymers and lithographic compositions comprising same
Patent number
11,932,713
Issue date
Mar 19, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
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Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,934,099
Issue date
Mar 19, 2024
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Copolymer and positive resist composition
Patent number
11,919,985
Issue date
Mar 5, 2024
Zeon Corporation
Manabu Hoshino
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,914,294
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Controlling porosity of an interference lithography process by fine...
Patent number
11,914,304
Issue date
Feb 27, 2024
Toyota Motor Engineering & Manufacturing North America, Inc.
Shailesh N. Joshi
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Photo-patternable organic semiconductor (OSC) polymers for organic...
Patent number
11,917,897
Issue date
Feb 27, 2024
Corning Incorporated
Mingqian He
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist, method of manufacturing a semiconductor device and met...
Patent number
11,914,301
Issue date
Feb 27, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Chieh-Hsin Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Manufacturing method of semiconductor chip, and kit
Patent number
11,914,300
Issue date
Feb 27, 2024
FUJIFILM Corporation
Tetsuya Kamimura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemically amplified positive photoresist composition for improving...
Patent number
11,906,900
Issue date
Feb 20, 2024
YOUNG CHANG CHEMICAL CO., LTD
Su Jin Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Colored film, manufacturing method of same, and solid-state imaging...
Patent number
11,908,877
Issue date
Feb 20, 2024
FUJIFILM Corporation
Daisuke Hamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Alternating copolymer chain scission photoresists
Patent number
11,906,901
Issue date
Feb 20, 2024
International Business Machines Corporation
Dario Goldfarb
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Manufacturing method of semiconductor device and semiconductor proc...
Patent number
11,899,368
Issue date
Feb 13, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Kai Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Infrared detector and infrared imager based on carbon nanotube
Patent number
11,895,429
Issue date
Feb 6, 2024
Tsinghua University
Yuan-Hao Jin
C01 - INORGANIC CHEMISTRY
Information
Patent Grant
Lithography
Patent number
11,892,774
Issue date
Feb 6, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Meng-Che Tu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
Publication number
20240152055
Publication date
May 9, 2024
FUJIFILM CORPORATION
Tetsuya KAMIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240149197
Publication date
May 9, 2024
FUJIFILM CORPORATION
Hiroyuki YONEZAWA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
Publication number
20240152050
Publication date
May 9, 2024
JSR Corporation
Ken MARUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Publication number
20240152048
Publication date
May 9, 2024
JSR Corporation
Ken MARUYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240139686
Publication date
May 2, 2024
FUJIFILM CORPORATION
Hiroyuki YONEZAWA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
NON-CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD OF MANUFACTU...
Publication number
20240142874
Publication date
May 2, 2024
Samsung Electronics Co., Ltd.
Chawon KOH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Publication number
20240134279
Publication date
Apr 25, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chieh-Hsin HSIEH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20240126167
Publication date
Apr 18, 2024
JSR Corporation
Ken MARUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST UNDERLAYER COMPOSITION
Publication number
20240126172
Publication date
Apr 18, 2024
Rohm and Haas Electronic Materials L.L.C.
Anton CHAVEZ
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
LITHOGRAPHY
Publication number
20240126174
Publication date
Apr 18, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Meng-Che Tu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR...
Publication number
20240117102
Publication date
Apr 11, 2024
Mitsubishi Gas Chemical Company, Inc.
Kodai MATSUURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION
Publication number
20240118611
Publication date
Apr 11, 2024
FUJIFILM CORPORATION
Kunihiko KODAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, Resist Composition, And Patterning Process
Publication number
20240118617
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
Publication number
20240117101
Publication date
Apr 11, 2024
Mitsubishi Gas Chemical Company, Inc.
Hiroaki YAMAMOTO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING...
Publication number
20240118616
Publication date
Apr 11, 2024
DONGJIN SEMICHEM CO., LTD.
Kyoungsoon SHIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240118613
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240111212
Publication date
Apr 4, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Composition For Forming Adhesive Film, Patterning Process, And Meth...
Publication number
20240103370
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Pattern Forming Method
Publication number
20240103365
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Seiichiro TACHIBANA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
Publication number
20240103369
Publication date
Mar 28, 2024
NISSAN CHEMICAL CORPORATION
Masahisa ENDO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240103364
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20240094634
Publication date
Mar 21, 2024
JSR Corporation
Katsuaki NISHIKORI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240094635
Publication date
Mar 21, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, Resist Composition, Method for Manufacturing Substrate Hav...
Publication number
20240092956
Publication date
Mar 21, 2024
MITSUBISHI CHEMICAL CORPORATION
Kazuaki Mukai
C07 - ORGANIC CHEMISTRY