Macromolecular compounds which are rendered insoluble or differentially wettable

Industry

CPC
G03F7/038

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,360,451
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern,...
- Patent number 12,360,450
- Issue date Jul 15, 2025
- Sumitomo Chemical Company, Limited
- Yuji Kita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming adhesive film, patterning process, and method...
- Patent number 12,351,742
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Mamoru Watabe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Flow cell coating methods
- Patent number 12,353,136
- Issue date Jul 8, 2025
- Illumina, Inc.
- Neil Brahma
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 12,345,903
- Issue date Jul 1, 2025
- Materion Corporation
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition for flexographic printing
- Patent number 12,332,564
- Issue date Jun 17, 2025
- Nippon Soda Co., Ltd.
- Shota Osumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing microstructure including cured products of...
- Patent number 12,326,662
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Microcapsule imaging system including non-photopolymerizable reacti...
- Patent number 12,321,095
- Issue date Jun 3, 2025
- POLAROID IP B.V.
- Wei You
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of removing photoresist, laminate, method of forming metalli...
- Patent number 12,321,097
- Issue date Jun 3, 2025
- ECHEM SOLUTIONS CORP.
- Tz-Jin Yang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic radiation curable polymeric mixtures, cured polymeric mixtu...
- Patent number 12,312,432
- Issue date May 27, 2025
- Bridgestone Americas Tire Operations, LLC
- Joshua P. Abell
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mask for EUV lithography and method of manufacturing the same
- Patent number 12,298,662
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flow cells and methods for making the same
- Patent number 12,298,665
- Issue date May 13, 2025
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resin composition and flow cells incorporating the same
- Patent number 12,287,574
- Issue date Apr 29, 2025
- Illumina, Inc.
- Yekaterina Rokhlenko
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition
- Patent number 12,282,253
- Issue date Apr 22, 2025
- JSR Corporation
- Kimiyuki Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
- Patent number 12,275,008
- Issue date Apr 15, 2025
- Rutgers, The State University of New Jersey
- Umer Hassan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,271,112
- Issue date Apr 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Stabilized matrix-filled liquid radiation curable resin composition...
- Patent number 12,269,933
- Issue date Apr 8, 2025
- Stratasys, Inc.
- Mingbo He
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polymer material in a redistribution structure of a semiconductor p...
- Patent number 12,265,330
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sih-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive dry film, and printed wiring board with photosensiti...
- Patent number 12,259,652
- Issue date Mar 25, 2025
- Tamura Corporation
- Ryoya Takashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography with a bilayer resist
- Patent number 12,248,248
- Issue date Mar 11, 2025
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20250237948
- Publication date Jul 24, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250237952
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD...
- Publication number 20250230283
- Publication date Jul 17, 2025
- FUJIFILM CORPORATION
- Atsuyasu NOZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231480
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250231483
- Publication date Jul 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
- Publication number 20250224675
- Publication date Jul 10, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi ONISHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF
- Publication number 20250224674
- Publication date Jul 10, 2025
- Chang Chun Plastics Co., Ltd.
- Zih-I CHUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND METHOD OF FORMATION AND USE
- Publication number 20250224673
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Keng-Chu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKING PROCESS USING SWITCHABLE POLYMER
- Publication number 20250216782
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...
- Publication number 20250216781
- Publication date Jul 3, 2025
- TAIYO HOLDINGS CO., LTD.
- Daiki YUKIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250216780
- Publication date Jul 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION...
- Publication number 20250197634
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Yuki Katsurada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMPOSITION INCLUDING ALKALINE-SOLUBLE POLYMER AND COLORANT
- Publication number 20250199403
- Publication date Jun 19, 2025
- Merck Patent GmbH
- Seishi Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...
- Publication number 20250199401
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Kenta AOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...
- Publication number 20250188223
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...
- Publication number 20250189892
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20250189887
- Publication date Jun 12, 2025
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...
- Publication number 20250189889
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sih-Hao Liao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UV-stabilized Photo Nanoimprint Lithography Resin
- Publication number 20250189890
- Publication date Jun 12, 2025
- Addison Clear Wave Coatings, Inc.
- Chau Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE RESIN PRECURSOR
- Publication number 20250189891
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuaki EBISAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...
- Publication number 20250180991
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...
- Publication number 20250185235
- Publication date Jun 5, 2025
- NANYA TECHNOLOGY CORPORATION
- CHIH-YING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...
- Publication number 20250172869
- Publication date May 29, 2025
- NISSAN CHEMICAL CORPORATION
- Shunsuke MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250172870
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20250172871
- Publication date May 29, 2025
- DUK SAN NEOLUX CO., LTD.
- Hye Jung CHOI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250172874
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...
- Publication number 20250164880
- Publication date May 22, 2025
- TORAY INDUSTRIES, INC.
- Keigo Kato
- H01 - BASIC ELECTRIC ELEMENTS

Macromolecular compounds which are rendered insoluble or differentially wettable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Resin, resist composition and method for producing resist pattern,...

Material for forming adhesive film, patterning process, and method...

Flow cell coating methods

Photo resist as opaque aperture mask on multispectral filter arrays

Photosensitive resin composition for flexographic printing

Method for manufacturing microstructure including cured products of...

Microcapsule imaging system including non-photopolymerizable reacti...

Method of removing photoresist, laminate, method of forming metalli...

Actinic radiation curable polymeric mixtures, cured polymeric mixtu...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Photoacid generator for chemically amplified photoresists for deep...

Mask for EUV lithography and method of manufacturing the same

Flow cells and methods for making the same

Photoresist and method of formation and use

Resin composition and flow cells incorporating the same

Photosensitive resin composition

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...

Negative resist composition and pattern forming process

Stabilized matrix-filled liquid radiation curable resin composition...

Polymer material in a redistribution structure of a semiconductor p...

Photosensitive dry film, and printed wiring board with photosensiti...

Solution, solution storage body, actinic ray-sensitive or radiation...

Electron beam lithography with a bilayer resist

Onium salt, chemically amplified resist composition and patterning...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Pattern formation methods

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND

PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF

PHOTORESIST AND METHOD OF FORMATION AND USE

MASKING PROCESS USING SWITCHABLE POLYMER

NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRO...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

COMPOSITION INCLUDING ALKALINE-SOLUBLE POLYMER AND COLORANT

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PH...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...

UV-stabilized Photo Nanoimprint Lithography Resin

POLYIMIDE RESIN PRECURSOR

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...

METHOD OF PROCESSING A SUBSTRATE AND METHOD OF FABRICATING BIT LINE...

WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MAN...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

METHOD FOR PREPARING PIXEL DEFINE LAYER

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RESIN COMPOSITION, RESIN COMPOSITION FILM AND SEMICONDUCTOR DEVICE...