Maintaining constant desired temperature

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CPC
H01J2237/2001

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2001Maintaining constant desired temperature

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for thermally conditioning a wafer in a charged...
- Patent number 12,217,930
- Issue date Feb 4, 2025
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,215,430
- Issue date Feb 4, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 12,211,672
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vibration-free cryogenic cooling
- Patent number 12,123,816
- Issue date Oct 22, 2024
- FEI Company
- Ronald Lamers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for temperature monitoring in cryo-electron microscopy
- Patent number 12,070,753
- Issue date Aug 27, 2024
- FEI Company
- Jakub Drahotsky
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Temperature adjustment method
- Patent number 12,068,143
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitriding apparatus and nitriding method
- Patent number 12,033,836
- Issue date Jul 9, 2024
- Kobe Steel, Ltd.
- Maiko Abe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching an etch layer
- Patent number 12,020,944
- Issue date Jun 25, 2024
- Lam Research Corporation
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal management hardware for uniform temperature control for enh...
- Patent number 12,002,668
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Srinivasa Rao Yedla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid transfer system in a charged particle system
- Patent number 11,996,262
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Vacuum transfer assembly
- Patent number 11,994,663
- Issue date May 28, 2024
- HennyZ B.V.
- Hendrik Willem Zandbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 11,984,304
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction data creating method, substrate processing method, and s...
- Patent number 11,923,211
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryotransfer holder and workstation
- Patent number 11,908,655
- Issue date Feb 20, 2024
- Gatan, Inc.
- Alexander Jozef Gubbens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method and etching processing apparatus
- Patent number 11,901,192
- Issue date Feb 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroto Otake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and plasma processing apparatus
- Patent number 11,881,410
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 11,837,446
- Issue date Dec 5, 2023
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlling apparatus, temperature controlling method,...
- Patent number 11,837,480
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- Katsuyuki Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotatable stage
- Patent number 11,810,750
- Issue date Nov 7, 2023
- Quorum Technologies Ltd.
- Robert Morrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature and bias control of edge ring
- Patent number 11,810,768
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for thermally conditioning a wafer in a charged...
- Patent number 11,804,358
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for preparing samples for imaging or diffra...
- Patent number 11,796,432
- Issue date Oct 24, 2023
- Universiteit Maastricht
- Franciscus Johannes Theresia Nijpels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for atomic layer etching
- Patent number 11,784,029
- Issue date Oct 10, 2023
- Wonik IPS Co., Ltd.
- Kwang Seon Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,735,392
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit with adjustable tuning ring for edge uniformity control
- Patent number 11,728,143
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VIBRATION-FREE CRYOGENIC COOLING
- Publication number 20250003845
- Publication date Jan 2, 2025
- FEI Company
- Ronald Lamers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...
- Publication number 20240429020
- Publication date Dec 26, 2024
- Hitachi, Ltd
- Akira SUGAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...
- Publication number 20240420933
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240414919
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Sung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...
- Publication number 20240379334
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES
- Publication number 20240352575
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Timothy J. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sample Holder and Sample Processing Apparatus
- Publication number 20240331970
- Publication date Oct 3, 2024
- JEOL Ltd.
- Jun Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240331971
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
- Publication number 20240331975
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Shuchi Sunil Ojha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING...
- Publication number 20240312770
- Publication date Sep 19, 2024
- Applied Materials, Inc.
- Jian LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20240297050
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPROVED TEMPERATURE CONTROL IN LIQUID PHASE TRANSMISSION ELECTRON...
- Publication number 20240290573
- Publication date Aug 29, 2024
- Danmarks Tekniske Universitet
- Murat Nulati YESIBOLATI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Gap Formation by Physical Vapor Deposition
- Publication number 20240271266
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Chengyu LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUID TRANSFER SYSTEM IN A CHARGED PARTICLE SYSTEM
- Publication number 20240274400
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MAGNETIZATION DEVICE FOR AN ELECTRON MICROSCOPE AND METHOD
- Publication number 20240258064
- Publication date Aug 1, 2024
- FORSCHUNGSZENTRUM JULICH GmbH
- Amir Hossein TAVABI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20240258084
- Publication date Aug 1, 2024
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS
- Publication number 20240222068
- Publication date Jul 4, 2024
- FEI Company
- Jing Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED METHOD OF DEPOSITING MOLYBDENUM
- Publication number 20240213027
- Publication date Jun 27, 2024
- ASM IP HOLDING B.V.
- YoungChol Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240203702
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- SUNGIK PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PROCESS WITH PLASMA TREATMENT
- Publication number 20240203706
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20240177963
- Publication date May 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Yuki UCHIOKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20240177976
- Publication date May 30, 2024
- SEMES CO., LTD.
- Hyoungkyu SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20240170281
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Yuya TAKAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...
- Publication number 20240153734
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20240145220
- Publication date May 2, 2024
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
- Publication number 20240112888
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
- Publication number 20240112887
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Maintaining constant desired temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for thermally conditioning a wafer in a charged...

Pedestal thermal profile tuning using multiple heated zones and the...

High power cable for heated components in RF environment

Method for increasing the surface roughness of a metal layer

Apparatus and method for plasma etching

Atomic layer etch process using plasma in conjunction with a rapid...

Vacuum apparatus

Vibration-free cryogenic cooling

Method for temperature monitoring in cryo-electron microscopy

Temperature adjustment method

Nitriding apparatus and nitriding method

Method for etching an etch layer

Thermal management hardware for uniform temperature control for enh...

Fluid transfer system in a charged particle system

Vacuum transfer assembly

Apparatus and method for plasma etching

Correction data creating method, substrate processing method, and s...

Plasma processing method

Cryotransfer holder and workstation

Etching processing method and etching processing apparatus

Substrate processing apparatus and plasma processing apparatus

High power cable for heated components in RF environment

Temperature controlling apparatus, temperature controlling method,...

Rotatable stage

Temperature and bias control of edge ring

System and methods for thermally conditioning a wafer in a charged...

Method of and apparatus for preparing samples for imaging or diffra...

Method and apparatus for atomic layer etching

Plasma processing apparatus

Process kit with adjustable tuning ring for edge uniformity control

Patents Applicationslast 30 patents

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

VIBRATION-FREE CRYOGENIC COOLING

SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...

RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...

PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES

Sample Holder and Sample Processing Apparatus

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES

APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING...

METHOD FOR ETCHING AN ETCH LAYER

IMPROVED TEMPERATURE CONTROL IN LIQUID PHASE TRANSMISSION ELECTRON...

Air Gap Formation by Physical Vapor Deposition

FLUID TRANSFER SYSTEM IN A CHARGED PARTICLE SYSTEM

MAGNETIZATION DEVICE FOR AN ELECTRON MICROSCOPE AND METHOD

APPARATUS AND METHOD FOR PLASMA ETCHING

CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS

PLASMA-ENHANCED METHOD OF DEPOSITING MOLYBDENUM

SUBSTRATE PROCESSING APPARATUS

ALD PROCESS WITH PLASMA TREATMENT

Charged Particle Beam Apparatus

LINER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

DEPOSITION METHOD AND DEPOSITION APPARATUS

SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

ELECTROSTATIC CHUCK ASSEMBLY

In-Situ Adsorbate Formation for Dielectric Etch

In-Situ Adsorbate Formation for Plasma Etch Process