Maintaining constant desired temperature

Industry

CPC
H01J2237/2001

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2001Maintaining constant desired temperature

Industries

Patents Grantslast 30 patents

Information Patent Grant
Correction data creating method, substrate processing method, and s...
- Patent number 11,923,211
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryotransfer holder and workstation
- Patent number 11,908,655
- Issue date Feb 20, 2024
- Gatan, Inc.
- Alexander Jozef Gubbens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method and etching processing apparatus
- Patent number 11,901,192
- Issue date Feb 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroto Otake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and plasma processing apparatus
- Patent number 11,881,410
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 11,837,446
- Issue date Dec 5, 2023
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlling apparatus, temperature controlling method,...
- Patent number 11,837,480
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- Katsuyuki Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotatable stage
- Patent number 11,810,750
- Issue date Nov 7, 2023
- Quorum Technologies Ltd.
- Robert Morrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature and bias control of edge ring
- Patent number 11,810,768
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for thermally conditioning a wafer in a charged...
- Patent number 11,804,358
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for preparing samples for imaging or diffra...
- Patent number 11,796,432
- Issue date Oct 24, 2023
- Universiteit Maastricht
- Franciscus Johannes Theresia Nijpels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for atomic layer etching
- Patent number 11,784,029
- Issue date Oct 10, 2023
- Wonik IPS Co., Ltd.
- Kwang Seon Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,735,392
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Daisuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit with adjustable tuning ring for edge uniformity control
- Patent number 11,728,143
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Designer atomic layer etching
- Patent number 11,721,558
- Issue date Aug 8, 2023
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for controlling radicals using a radical filter
- Patent number 11,721,530
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Examining, analyzing and/or processing an object using an object re...
- Patent number 11,721,518
- Issue date Aug 8, 2023
- Carl Zeiss Microscopy GmbH
- Andreas Schertel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,694,881
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Super-resolution microscopy
- Patent number 11,676,794
- Issue date Jun 13, 2023
- United Kingdom Research and Innovation
- Lin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power wafer cooling
- Patent number 11,670,483
- Issue date Jun 6, 2023
- Axcelis Technologies, Inc.
- Joseph Ferrara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,651,936
- Issue date May 16, 2023
- Jeol Ltd.
- Naoki Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,637,002
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for non line-of-sight doping
- Patent number 11,631,588
- Issue date Apr 18, 2023
- Varian Semiconductor Equipment Associates, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 11,581,168
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Kazuhito Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of temperature measurement used in radio-frequency processin...
- Patent number 11,562,891
- Issue date Jan 24, 2023
- PIOTECH CO., LTD.
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion resistant ground shield of processing chamber
- Patent number 11,562,890
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,557,498
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Toru Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,538,707
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Toru Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate fixing device
- Patent number 11,521,885
- Issue date Dec 6, 2022
- Shinko Electric Industries Co., Ltd.
- Tadayoshi Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Operating a particle beam device
- Patent number 11,501,948
- Issue date Nov 15, 2022
- Carl Zeiss Microscopy GmbH
- Luyang Han
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...
- Publication number 20240153734
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY
- Publication number 20240145220
- Publication date May 2, 2024
- Applied Materials, Inc.
- Jaeyong CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
- Publication number 20240112888
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
- Publication number 20240112887
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20240105429
- Publication date Mar 28, 2024
- Lam Reseach Corporation
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20240087885
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR THERMALLY CONDITIONING A WAFER IN A CHARGED...
- Publication number 20240079202
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Martijn Petrus, Christianus VAN HEUMEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU BIASING AND FREEZING OF CYROGENIC ELECTRON MICROSCOPY SAMPLES
- Publication number 20240060864
- Publication date Feb 22, 2024
- ALLIANCE FOR SUSTAINABLE ENERGY, LLC
- Nikita Susan Dutta FITZCHARLES
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ESC TEMPERATURE CONTROL UNIT AND SUBSTRATE TREATING APPARATUS INCLU...
- Publication number 20240055241
- Publication date Feb 15, 2024
- SEMES CO., LTD.
- Byeong Hyeon KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE MICROSCOPY MEMS SAMPLE SUPPORT
- Publication number 20240038483
- Publication date Feb 1, 2024
- UNIVERSITEIT ANTWERPEN
- Adrian Pedrazo Tardajos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...
- Publication number 20240035195
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Qinghua ZHAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240030010
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH
- Publication number 20240014072
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Tsung-Han YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING SILICON OXIDE
- Publication number 20230411147
- Publication date Dec 21, 2023
- ASM IP HOLDING, B.V.
- Jihee Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230402258
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yunhwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230395371
- Publication date Dec 7, 2023
- TOKYO ELECTRON LIMITED
- Kazumasa IGARASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE AND BIAS CONTROL OF EDGE RING
- Publication number 20230360892
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CARBON GAPFILL
- Publication number 20230360924
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Apparatus for Plasma Processing
- Publication number 20230330619
- Publication date Oct 19, 2023
- Haydale Graphene Industries PLC
- John-Mark Seymour
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PASSIVATION CHEMISTRY FOR PLASMA ETCHING
- Publication number 20230335378
- Publication date Oct 19, 2023
- LAM RESEARCH CORPORATION
- Eric A. HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXAMINING, ANALYZING AND/OR PROCESSING AN OBJECT USING AN OBJECT RE...
- Publication number 20230326707
- Publication date Oct 12, 2023
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schertel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230317418
- Publication date Oct 5, 2023
- Samsung Electronics Co., Ltd.
- Jungmin KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAL STRUCTURE, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFA...
- Publication number 20230274916
- Publication date Aug 31, 2023
- Kokusai Electric Corporation
- Takayuki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...
- Publication number 20230257869
- Publication date Aug 17, 2023
- QORVO BIOTECHNOLOGIES, LLC
- Derya Deniz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ANALYZING INTERMOLECULAR INTERACTIONS IN MICROCRYSTALS
- Publication number 20230228695
- Publication date Jul 20, 2023
- The Regents of the University of California
- Tamir Gonen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Cartridge Carrier Apparatus and Carrier Base
- Publication number 20230207287
- Publication date Jun 29, 2023
- JEOL Ltd.
- Masashi Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PERFORMING PLASMA ENHANCED ATOMIC LAYER DE...
- Publication number 20230203661
- Publication date Jun 29, 2023
- AJOU UNIVERSITY INDUSTRY- ACADEMIC COOPERATION FOUNDATION
- Il Kwon OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAPID AND AUTOMATIC VIRUS IMAGING AND ANALYSIS SYSTEM AS WELL AS ME...
- Publication number 20230170178
- Publication date Jun 1, 2023
- BORRIES PTE. LTD.
- Zhongwei Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTROSTATIC CHUCK WITH DETACHABLE SHAFT
- Publication number 20230162955
- Publication date May 25, 2023
- Applied Materials, Inc.
- Vijay D. PARKHE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Maintaining constant desired temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Correction data creating method, substrate processing method, and s...

Plasma processing method

Cryotransfer holder and workstation

Etching processing method and etching processing apparatus

Substrate processing apparatus and plasma processing apparatus

High power cable for heated components in RF environment

Temperature controlling apparatus, temperature controlling method,...

Rotatable stage

Temperature and bias control of edge ring

System and methods for thermally conditioning a wafer in a charged...

Method of and apparatus for preparing samples for imaging or diffra...

Method and apparatus for atomic layer etching

Plasma processing apparatus

Process kit with adjustable tuning ring for edge uniformity control

Designer atomic layer etching

System for controlling radicals using a radical filter

Examining, analyzing and/or processing an object using an object re...

Stage and plasma processing apparatus

Super-resolution microscopy

High power wafer cooling

Charged particle beam apparatus

Methods and systems to enhance process uniformity

Method and apparatus for non line-of-sight doping

Plasma processing apparatus and method

Method of temperature measurement used in radio-frequency processin...

Corrosion resistant ground shield of processing chamber

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate fixing device

Operating a particle beam device

Patents Applicationslast 30 patents

SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

ELECTROSTATIC CHUCK ASSEMBLY

In-Situ Adsorbate Formation for Dielectric Etch

In-Situ Adsorbate Formation for Plasma Etch Process

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

SYSTEMS AND METHODS FOR THERMALLY CONDITIONING A WAFER IN A CHARGED...

IN SITU BIASING AND FREEZING OF CYROGENIC ELECTRON MICROSCOPY SAMPLES

ESC TEMPERATURE CONTROL UNIT AND SUBSTRATE TREATING APPARATUS INCLU...

CHARGED PARTICLE MICROSCOPY MEMS SAMPLE SUPPORT

METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CR...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

NITROGEN PLASMA TREATMENT FOR BOTTOM-UP GROWTH

METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING SILICON OXIDE

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

TEMPERATURE AND BIAS CONTROL OF EDGE RING

LOW TEMPERATURE CARBON GAPFILL

Methods and Apparatus for Plasma Processing

PASSIVATION CHEMISTRY FOR PLASMA ETCHING

EXAMINING, ANALYZING AND/OR PROCESSING AN OBJECT USING AN OBJECT RE...

SUBSTRATE PROCESSING APPARATUS

SEAL STRUCTURE, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFA...

SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING TH...

METHODS FOR ANALYZING INTERMOLECULAR INTERACTIONS IN MICROCRYSTALS

Sample Cartridge Carrier Apparatus and Carrier Base

APPARATUS AND METHOD FOR PERFORMING PLASMA ENHANCED ATOMIC LAYER DE...

RAPID AND AUTOMATIC VIRUS IMAGING AND ANALYSIS SYSTEM AS WELL AS ME...

ELECTROSTATIC CHUCK WITH DETACHABLE SHAFT