Maintaining constant desired temperature

Industry

CPC
H01J2237/2001

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2001Maintaining constant desired temperature

Industries

Patents Grantslast 30 patents

Information Patent Grant
In-situ adsorbate formation for plasma etch process
- Patent number 12,308,212
- Issue date May 20, 2025
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid transfer system in a charged particle system
- Patent number 12,249,480
- Issue date Mar 11, 2025
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for thermally conditioning a wafer in a charged...
- Patent number 12,217,930
- Issue date Feb 4, 2025
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,215,430
- Issue date Feb 4, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 12,211,672
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 12,142,512
- Issue date Nov 12, 2024
- NuFlare Technology, Inc.
- Yoshiaki Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vibration-free cryogenic cooling
- Patent number 12,123,816
- Issue date Oct 22, 2024
- FEI Company
- Ronald Lamers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for temperature monitoring in cryo-electron microscopy
- Patent number 12,070,753
- Issue date Aug 27, 2024
- FEI Company
- Jakub Drahotsky
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Temperature adjustment method
- Patent number 12,068,143
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitriding apparatus and nitriding method
- Patent number 12,033,836
- Issue date Jul 9, 2024
- Kobe Steel, Ltd.
- Maiko Abe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching an etch layer
- Patent number 12,020,944
- Issue date Jun 25, 2024
- Lam Research Corporation
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal management hardware for uniform temperature control for enh...
- Patent number 12,002,668
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Srinivasa Rao Yedla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid transfer system in a charged particle system
- Patent number 11,996,262
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Vacuum transfer assembly
- Patent number 11,994,663
- Issue date May 28, 2024
- HennyZ B.V.
- Hendrik Willem Zandbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 11,984,304
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction data creating method, substrate processing method, and s...
- Patent number 11,923,211
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cryotransfer holder and workstation
- Patent number 11,908,655
- Issue date Feb 20, 2024
- Gatan, Inc.
- Alexander Jozef Gubbens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processing method and etching processing apparatus
- Patent number 11,901,192
- Issue date Feb 13, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroto Otake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and plasma processing apparatus
- Patent number 11,881,410
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 11,837,446
- Issue date Dec 5, 2023
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlling apparatus, temperature controlling method,...
- Patent number 11,837,480
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- Katsuyuki Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotatable stage
- Patent number 11,810,750
- Issue date Nov 7, 2023
- Quorum Technologies Ltd.
- Robert Morrison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature and bias control of edge ring
- Patent number 11,810,768
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for thermally conditioning a wafer in a charged...
- Patent number 11,804,358
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Martijn Petrus Christianus Van Heumen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for preparing samples for imaging or diffra...
- Patent number 11,796,432
- Issue date Oct 24, 2023
- Universiteit Maastricht
- Franciscus Johannes Theresia Nijpels
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20250183015
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...
- Publication number 20250179633
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Gary B. LIND
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250174442
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Yasuhisa KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...
- Publication number 20250166974
- Publication date May 22, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149310
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...
- Publication number 20250132134
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Taeil Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...
- Publication number 20250132120
- Publication date Apr 24, 2025
- Ohio State Innovation Foundation
- Alexander REIFSNYDER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118525
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM WITH COOLING SYSTEM
- Publication number 20250118526
- Publication date Apr 10, 2025
- CARL ZEISS MICROSCOPY GMBH
- Andreas Schmaunz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYO-ELECTRON MICROSCOPY IMAGE PROCESSING METHOD AND APPARATUS, TER...
- Publication number 20250112021
- Publication date Apr 3, 2025
- Beijing Youzhuju Network Technology Co., Ltd.
- Jing YUAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...
- Publication number 20250069895
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Anatoli Chlenov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED PEDESTAL WITH LOW IMPEDANCE RF ROD
- Publication number 20250062104
- Publication date Feb 20, 2025
- Sudhir R. GONDHALEKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT
- Publication number 20250054723
- Publication date Feb 13, 2025
- FEI Company
- Rens van Alebeek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VIBRATION-FREE CRYOGENIC COOLING
- Publication number 20250003845
- Publication date Jan 2, 2025
- FEI Company
- Ronald Lamers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...
- Publication number 20240429020
- Publication date Dec 26, 2024
- Hitachi, Ltd
- Akira SUGAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...
- Publication number 20240420933
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240414919
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Sung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...
- Publication number 20240379334
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES
- Publication number 20240352575
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Timothy J. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sample Holder and Sample Processing Apparatus
- Publication number 20240331970
- Publication date Oct 3, 2024
- JEOL Ltd.
- Jun Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240331971
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
- Publication number 20240331975
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Shuchi Sunil Ojha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING...
- Publication number 20240312770
- Publication date Sep 19, 2024
- Applied Materials, Inc.
- Jian LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20240297050
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPROVED TEMPERATURE CONTROL IN LIQUID PHASE TRANSMISSION ELECTRON...
- Publication number 20240290573
- Publication date Aug 29, 2024
- Danmarks Tekniske Universitet
- Murat Nulati YESIBOLATI
- H01 - BASIC ELECTRIC ELEMENTS

Maintaining constant desired temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

In-situ adsorbate formation for plasma etch process

Fluid transfer system in a charged particle system

Low temperature manifold assembly for substrate processing systems

Systems and methods for thermally conditioning a wafer in a charged...

Pedestal thermal profile tuning using multiple heated zones and the...

High power cable for heated components in RF environment

Method for increasing the surface roughness of a metal layer

Apparatus and method for plasma etching

Atomic layer etch process using plasma in conjunction with a rapid...

Vacuum apparatus

Vibration-free cryogenic cooling

Method for temperature monitoring in cryo-electron microscopy

Temperature adjustment method

Nitriding apparatus and nitriding method

Method for etching an etch layer

Thermal management hardware for uniform temperature control for enh...

Fluid transfer system in a charged particle system

Vacuum transfer assembly

Apparatus and method for plasma etching

Correction data creating method, substrate processing method, and s...

Plasma processing method

Cryotransfer holder and workstation

Etching processing method and etching processing apparatus

Substrate processing apparatus and plasma processing apparatus

High power cable for heated components in RF environment

Temperature controlling apparatus, temperature controlling method,...

Rotatable stage

Temperature and bias control of edge ring

System and methods for thermally conditioning a wafer in a charged...

Method of and apparatus for preparing samples for imaging or diffra...

Patents Applicationslast 30 patents

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...

DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER...

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

PARTICLE BEAM SYSTEM WITH COOLING SYSTEM

CRYO-ELECTRON MICROSCOPY IMAGE PROCESSING METHOD AND APPARATUS, TER...

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

HEATED PEDESTAL WITH LOW IMPEDANCE RF ROD

THERMAL CONDITIONING ENCLOSURE FOR A CHARGED PARTICLE INSTRUMENT

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

VIBRATION-FREE CRYOGENIC COOLING

SAMPLE HOLDER, ELECTRON MICROSCOPE SYSTEM AND SAMPLE OBSERVATION ME...

RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

COOLANT TUBE BLOCK ASSEMBLY AND SEMICONDUCTOR PROCESSING DEVICE INC...

PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES

Sample Holder and Sample Processing Apparatus

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES

APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING...

METHOD FOR ETCHING AN ETCH LAYER

IMPROVED TEMPERATURE CONTROL IN LIQUID PHASE TRANSMISSION ELECTRON...