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G03F9/7076

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7076Mark details

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,199,093
- Issue date Jan 14, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Display device having magnetic alignment marks
- Patent number 12,164,237
- Issue date Dec 10, 2024
- Samsung Display Co., Ltd.
- Young Sang Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment mark structure and method for making
- Patent number 12,033,951
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Hao Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 12,032,305
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,027,518
- Issue date Jul 2, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mark detection method and apparatus, and computer-readable storage...
- Patent number 12,007,703
- Issue date Jun 11, 2024
- Changxin Memory Technologies, Inc.
- Yan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mark, mask and display substrate motherboard
- Patent number 11,994,810
- Issue date May 28, 2024
- BOE Technology Group Co., Ltd.
- Li Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure and method for manufacturing same
- Patent number 11,984,406
- Issue date May 14, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yunsheng Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 11,984,445
- Issue date May 14, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment using form birefringence of targets or product
- Patent number 11,971,665
- Issue date Apr 30, 2024
- ASML Holding N.V.
- Joshua Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay alignment mark and method for measuring overlay error
- Patent number 11,934,109
- Issue date Mar 19, 2024
- Zhongke Jingyuan Electron Limited, Beijing (CN)
- Weimin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 11,927,892
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embedded high-Z marker material and process for alignment of multil...
- Patent number 11,823,864
- Issue date Nov 21, 2023
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for disposing substrate and method for manufacturing article
- Patent number 11,774,850
- Issue date Oct 3, 2023
- Canon Kabushiki Kaisha
- Naoki Funabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure
- Patent number 11,768,443
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ching Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 11,726,412
- Issue date Aug 15, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay marks for reducing effect of bottom layer asymmetry
- Patent number 11,726,413
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chih Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable diffraction grating
- Patent number 11,703,771
- Issue date Jul 18, 2023
- ASML Holding N.V.
- Ali Alsaqqa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus, lithography apparatus and article manufactur...
- Patent number 11,693,328
- Issue date Jul 4, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selecting a set of locations associated with a measurement or featu...
- Patent number 11,681,231
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Pierluigi Frisco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of alignment, overlay, configuration of marks, manufacturin...
- Patent number 11,675,281
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Jin Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring a position of a mark
- Patent number 11,650,513
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 11,646,309
- Issue date May 9, 2023
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D integrated circuit device and structure with hybrid bonding
- Patent number 11,605,630
- Issue date Mar 14, 2023
- Monolithic 3D Inc.
- Zvi Or-Bach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20250098325
- Publication date Mar 20, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF
- Publication number 20250096146
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao Chu Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER ALIGNMENT SYSTEM AND WAFER ALIGNMENT METHOD
- Publication number 20250060685
- Publication date Feb 20, 2025
- Samsung Electronics Co., Ltd.
- Sangyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...
- Publication number 20250054873
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sung-Hsin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...
- Publication number 20240369738
- Publication date Nov 7, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Chao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING
- Publication number 20240321767
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Hao Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240304617
- Publication date Sep 12, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20240241455
- Publication date Jul 18, 2024
- InnoLux Corporation
- Kuang-Ming FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240222368
- Publication date Jul 4, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20240210841
- Publication date Jun 27, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALIGNMENT MARK AND IMPRINTING METHOD
- Publication number 20240203894
- Publication date Jun 20, 2024
- KIOXIA Corporation
- Kazuhiro TAKAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY TARGET SIMULATION
- Publication number 20240118625
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Markus Gerardus Martinus Maria VAN KRAAIJ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240120332
- Publication date Apr 11, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME
- Publication number 20240096813
- Publication date Mar 21, 2024
- Micron Technology, Inc.
- KAZUKO YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20240036480
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PLATE, ALIGNMENT MARK AND PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240004320
- Publication date Jan 4, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Wei Hua SANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TECHNOLOGIES FOR OVERLAY METROLOGY MARKS
- Publication number 20230420381
- Publication date Dec 28, 2023
- Intel Corporation
- Martin N. Weiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE BODY AND METHOD FOR MANUFACTURING SEMICONDU...
- Publication number 20230408936
- Publication date Dec 21, 2023
- KIOXIA Corporation
- Manabu TAKAKUWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY
- Publication number 20230359135
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...
- Publication number 20230359134
- Publication date Nov 9, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-ALIGNED MULTIPLE PATTERNING MARK
- Publication number 20230307377
- Publication date Sep 28, 2023
- WINBOND ELECTRONICS CORP.
- Chiao-Ling Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...
- Publication number 20230288823
- Publication date Sep 14, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photomask, Optical-Waveguide, Optical Circuit and Method of Manufac...
- Publication number 20230259017
- Publication date Aug 17, 2023
- Nippon Telegraph and Telephone Corporation
- Takashi Go
- G02 - OPTICS
Information Patent Application
SUBSTRATE, PATTERNING DEVICE AND METROLOGY APPARATUSES
- Publication number 20230205097
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Mattia MARELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE TARGETS ON SUBSTRATE LAYERS FOR LAYER ALIGNMENT
- Publication number 20230205104
- Publication date Jun 29, 2023
- Shakul TANDON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230168595
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL MASK, EVAPORATION METHOD, DISPLAY PANEL AND DISPLAY DEVICE
- Publication number 20230167537
- Publication date Jun 1, 2023
- MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO.,LTD.
- Hsinju HO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mark details

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Alignment-overlay mark and method using the same

Embedded high-z marker material and process for alignment of multil...

Semiconductor marks and forming methods thereof

3D semiconductor devices and structures with metal layers

Lithography measurement machine and operating method thereof

Display device having magnetic alignment marks

Processing system, processing method, measurement apparatus, substr...

Alignment mark structure and method for making

Alignment method and associated alignment and lithographic apparatuses

3D semiconductor devices and structures with metal layers

Mark detection method and apparatus, and computer-readable storage...

Alignment mark, mask and display substrate motherboard

Semiconductor structure and method for manufacturing same

3D semiconductor devices and structures with metal layers

Wafer alignment using form birefringence of targets or product

Overlay alignment mark and method for measuring overlay error

Alignment method and associated alignment and lithographic apparatuses

Embedded high-Z marker material and process for alignment of multil...

Method for disposing substrate and method for manufacturing article

Method for manufacturing semiconductor structure

Processing system, processing method, measurement apparatus, substr...

Overlay marks for reducing effect of bottom layer asymmetry

Variable diffraction grating

Measurement apparatus, lithography apparatus and article manufactur...

Selecting a set of locations associated with a measurement or featu...

Methods of alignment, overlay, configuration of marks, manufacturin...

Self-referencing and self-calibrating interference pattern overlay...

Apparatus and method for measuring a position of a mark

3D semiconductor devices and structures with metal layers

3D integrated circuit device and structure with hybrid bonding

Patents Applicationslast 30 patents

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

WAFER ALIGNMENT SYSTEM AND WAFER ALIGNMENT METHOD

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...

ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

ELECTRONIC DEVICE

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

ALIGNMENT MARK AND IMPRINTING METHOD

METROLOGY TARGET SIMULATION

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

MASK PLATE, ALIGNMENT MARK AND PHOTOLITHOGRAPHY SYSTEM

TECHNOLOGIES FOR OVERLAY METROLOGY MARKS

SEMICONDUCTOR STRUCTURE BODY AND METHOD FOR MANUFACTURING SEMICONDU...

OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...

SELF-ALIGNED MULTIPLE PATTERNING MARK

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...

Photomask, Optical-Waveguide, Optical Circuit and Method of Manufac...

SUBSTRATE, PATTERNING DEVICE AND METROLOGY APPARATUSES

MULTIPLE TARGETS ON SUBSTRATE LAYERS FOR LAYER ALIGNMENT

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

METAL MASK, EVAPORATION METHOD, DISPLAY PANEL AND DISPLAY DEVICE