Materials

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CPC
G03F7/7095

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7095Materials

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,971,656
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
- Patent number 11,947,256
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Evgenia Kurganova
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Intermediate layer for mechanical interface
- Patent number 11,927,889
- Issue date Mar 12, 2024
- ASML Holding N.V.
- Kushal Sandeep Doshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system in particular for microlithography
- Patent number 11,906,753
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Johannes Kraus
- G02 - OPTICS
Information Patent Grant
Optical element and lithography system
- Patent number 11,874,525
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrodeposition compatible anti-reflection coatings for laser int...
- Patent number 11,815,822
- Issue date Nov 14, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus
- Patent number 11,740,566
- Issue date Aug 29, 2023
- ASML Netherlands B.V.
- Paulus Albertus Van Hal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for generating extreme ultraviolet (EUV), method of manuf...
- Patent number 11,729,896
- Issue date Aug 15, 2023
- Samsung Electronics Co., Ltd.
- Jihoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for in-situ dynamic protection of a surface and optical asse...
- Patent number 11,681,236
- Issue date Jun 20, 2023
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Object in a lithographic apparatus
- Patent number 11,550,234
- Issue date Jan 10, 2023
- ASML Netherlands B.V.
- Andrey Nikipelov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wide field of view hybrid holographic display
- Patent number 11,543,773
- Issue date Jan 3, 2023
- Real View Imaging Ltd.
- Shaul Alexander Gelman
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method for in situ protection of an aluminum layer and optical arra...
- Patent number 11,525,946
- Issue date Dec 13, 2022
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilayer mirror for reflecting EUV radiation and method for produ...
- Patent number 11,500,137
- Issue date Nov 15, 2022
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Philipp Naujok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Anti-reflection coating
- Patent number 11,422,289
- Issue date Aug 23, 2022
- ASML Holding N.V.
- Parag Vinayak Kelkar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflecting optical element of a projection e...
- Patent number 11,415,892
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Matthias Kaes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device, and method for preventing contamination of optical...
- Patent number 11,353,802
- Issue date Jun 7, 2022
- Lasertec Corporation
- Haruhiko Kusunose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination optical system for projection lithography
- Patent number 11,327,403
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Tian Gang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ light detection methods and apparatus for ultraviolet semic...
- Patent number 11,215,934
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Ralph Peter Antonio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective optical element for EUV lithography and method for adapt...
- Patent number 11,199,780
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical assembly having a thermally conductive component
- Patent number 11,194,119
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Julian Kaller
- G02 - OPTICS
Information Patent Grant
Method for figure correction of optical element by reactive ion etc...
- Patent number 11,163,237
- Issue date Nov 2, 2021
- The Institute of Optics and Electronics, The Chinese Academy of Science
- Zhiwei Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning system for a lithographic apparatus
- Patent number 11,156,925
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Maarten Hartger Kimman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Optical lithography system for patterning semiconductor devices and...
- Patent number 11,143,965
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for a mirror array for EUV lithography
- Patent number 11,126,087
- Issue date Sep 21, 2021
- Carl Zeiss SMT GmbH
- Eric Eva
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
- Publication number 20250044711
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Andreas Raba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20250044712
- Publication date Feb 6, 2025
- Carl Zeiss SMT GMBH
- Thomas IRTENKAUF
- G02 - OPTICS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS
- Publication number 20250028257
- Publication date Jan 23, 2025
- Samsung Electronics Co., Ltd.
- Kyoungwhan Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS
- Publication number 20250021010
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Eduard Schweigert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENT...
- Publication number 20250004389
- Publication date Jan 2, 2025
- CHYI DING TECHNOLOGIES CO., LTD.
- Shih-Chia CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLAMP FOR HOLDING AN OBJECT AND METHOD
- Publication number 20240385536
- Publication date Nov 21, 2024
- ASML Netherlands B.V.
- Thomas Poiesz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY APPARATUS
- Publication number 20240353764
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Kyung Chin YI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...
- Publication number 20240288786
- Publication date Aug 29, 2024
- Nanoscribe Holding GmbH
- Marc Hippler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODULAR WAFER TABLE AND METHODS OF MANUFACTURING THEREOF
- Publication number 20240248415
- Publication date Jul 25, 2024
- ASML Holding N.V.
- Shahab SHERVIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240241448
- Publication date Jul 18, 2024
- Gigaphoton Inc.
- Atsushi UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...
- Publication number 20240219844
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20240159988
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Rodolfo Guglielmi Rabe
- G02 - OPTICS
Information Patent Application
EUV MIRROR WITH IMPROVED OPTICAL STABILITY
- Publication number 20240019786
- Publication date Jan 18, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Yung-Yao Lee
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...
- Publication number 20230417961
- Publication date Dec 28, 2023
- Carl Zeiss SMT GMBH
- Thomas SCHICKETANZ
- B24 - GRINDING POLISHING
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD
- Publication number 20230400761
- Publication date Dec 14, 2023
- Canon Kabushiki Kaisha
- Toshihiko Nishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM SHEET BOND FIXTURING AND FLEXIBLE BURL APPLICATIONS FOR SUBS...
- Publication number 20230384694
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Abdullah ALIKHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID PURGING SYSTEM
- Publication number 20230314964
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- José Nilton FONSECA JUNIOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...
- Publication number 20230314965
- Publication date Oct 5, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...
- Publication number 20230257866
- Publication date Aug 17, 2023
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20230213851
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Johan Hendrik KLOOTWIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...
- Publication number 20230205090
- Publication date Jun 29, 2023
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...
- Publication number 20230138850
- Publication date May 4, 2023
- Carl Zeiss SMT GMBH
- Johannes Kimling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDING BOARD, MANUFACTURING METHOD OF DEVICE, AND EXPOSU...
- Publication number 20230125632
- Publication date Apr 27, 2023
- Canon Kabushiki Kaisha
- Shinji Fukui
- B32 - LAYERED PRODUCTS
Information Patent Application
COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...
- Publication number 20230126240
- Publication date Apr 27, 2023
- FUJIFILM CORPORATION
- Yushi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM WITH AN APERTURE STOP
- Publication number 20230123115
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING PELLICLE
- Publication number 20230111608
- Publication date Apr 13, 2023
- SK HYNIX INC.
- Tae Joong HA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER
- Publication number 20230116213
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Hao LEE
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for producing a mirror of a microlithographic projection exp...

Optical system with an aperture stop

Optical element having a coating for influencing heating radiation...

Method for manufacturing a membrane assembly

Simultaneous double-side coating of multilayer graphene pellicle by...

Intermediate layer for mechanical interface

Optical system in particular for microlithography

Optical element and lithography system

Electrodeposition compatible anti-reflection coatings for laser int...

Membrane for EUV lithography

Lithography apparatus

Apparatus for generating extreme ultraviolet (EUV), method of manuf...

Method for in-situ dynamic protection of a surface and optical asse...

Object in a lithographic apparatus

Wide field of view hybrid holographic display

Method for in situ protection of an aluminum layer and optical arra...

Multilayer mirror for reflecting EUV radiation and method for produ...

Anti-reflection coating

Method for producing a reflecting optical element of a projection e...

Optical device, and method for preventing contamination of optical...

Method for treating a reflective optical element for the EUV wavele...

Illumination optical system for projection lithography

In-situ light detection methods and apparatus for ultraviolet semic...

Photomask design for generating plasmonic effect

Reflective optical element for EUV lithography and method for adapt...

Optical assembly having a thermally conductive component

Method for figure correction of optical element by reactive ion etc...

Positioning system for a lithographic apparatus

Optical lithography system for patterning semiconductor devices and...

Component for a mirror array for EUV lithography

Patents Applicationslast 30 patents

TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR

OPTICAL COMPONENT FOR A LITHOGRAPHY APPARATUS

SEMICONDUCTOR PROCESS APPARATUS

DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS

EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENT...

CLAMP FOR HOLDING AN OBJECT AND METHOD

LITHOGRAPHY APPARATUS

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...

MODULAR WAFER TABLE AND METHODS OF MANUFACTURING THEREOF

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

SUPPORT FOR AN OPTICAL ELEMENT

EUV MIRROR WITH IMPROVED OPTICAL STABILITY

MEMBRANE FOR EUV LITHOGRAPHY

PROCESS FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR THE EXTREME...

IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

VACUUM SHEET BOND FIXTURING AND FLEXIBLE BURL APPLICATIONS FOR SUBS...

FLUID PURGING SYSTEM

ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...

METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY

REFLECTIVE OPTICAL ELEMENT, ILLUMINATION OPTICAL UNIT, PROJECTION E...

OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR...

SUBSTRATE HOLDING BOARD, MANUFACTURING METHOD OF DEVICE, AND EXPOSU...

COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...

OPTICAL SYSTEM WITH AN APERTURE STOP

PHOTOMASK INCLUDING PELLICLE

EXTREME ULTRAVIOLET MASK WITH CAPPING LAYER