Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

CPC
G03F7/705

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industries

Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,366,811
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for correcting photomask and method thereof
- Patent number 12,366,799
- Issue date Jul 22, 2025
- Semes Co., Ltd.
- Hyo Won Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for controlling a lithographic process
- Patent number 12,366,809
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Roy Werkman
- G05 - CONTROLLING REGULATING
Information Patent Grant
Radiation source
- Patent number 12,366,810
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Identification of hot spots or defects by machine learning
- Patent number 12,360,461
- Issue date Jul 15, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 12,360,467
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintenance of modules for light sources used in semiconductor phot...
- Patent number 12,360,466
- Issue date Jul 15, 2025
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,353,140
- Issue date Jul 8, 2025
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for determining feature contribution to perfor...
- Patent number 12,353,967
- Issue date Jul 8, 2025
- ASML Netherlands B.V.
- Vahid Bastani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Gas laser apparatus and electronic device manufacturing method
- Patent number 12,355,204
- Issue date Jul 8, 2025
- Gigaphoton Inc.
- Keisuke Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cell control
- Patent number 12,344,855
- Issue date Jul 1, 2025
- CELLINO BIOTECH, INC.
- Stan Wang
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Device and method for regulating and controlling incident angle of...
- Patent number 12,346,030
- Issue date Jul 1, 2025
- Tsinghua University
- Leijie Wang
- G01 - MEASURING TESTING
Information Patent Grant
Method for thermo-mechanical control of a heat sensitive element an...
- Patent number 12,339,592
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Victor Sebastiaan Dolk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,340,164
- Issue date Jun 24, 2025
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus for and method of monitoring droplets in a droplet stream
- Patent number 12,339,214
- Issue date Jun 24, 2025
- ASML Netherlands B.V.
- Joshua Mark Lukens
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology for improving DUV laser alignment
- Patent number 12,332,569
- Issue date Jun 17, 2025
- Cymer, LLC
- Zhong Quan Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target control in extreme ultraviolet lithography systems using abe...
- Patent number 12,332,571
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic patterning method and system therefore
- Patent number 12,332,574
- Issue date Jun 17, 2025
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Diederik Jan Maas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining defectiveness of pattern based on after deve...
- Patent number 12,332,573
- Issue date Jun 17, 2025
- ASML Netherlands B.V.
- Marleen Kooiman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical component
- Patent number 12,326,663
- Issue date Jun 10, 2025
- Carl Zeiss SMT GmbH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose mapper method
- Patent number 12,326,664
- Issue date Jun 10, 2025
- Shanghai Huali Integrated Circuit Corporation
- Shuo Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination apparatus and associated metrology and lithographic ap...
- Patent number 12,326,669
- Issue date Jun 10, 2025
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for applying a deposition model in a semiconductor manufactu...
- Patent number 12,321,101
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of generating a set of illumination patterns for...
- Patent number 12,321,103
- Issue date Jun 3, 2025
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine and deep learning methods for spectra-based metrology and p...
- Patent number 12,321,102
- Issue date Jun 3, 2025
- Nova Ltd.
- Barak Bringoltz
- G05 - CONTROLLING REGULATING
Information Patent Grant
State monitoring method, state monitoring apparatus and state monit...
- Patent number 12,321,157
- Issue date Jun 3, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xiaojun Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Method and device for evaluating a statistically distributed measur...
- Patent number 12,307,334
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Dirk Seidel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical imaging method, device and system for photolithography system
- Patent number 12,306,543
- Issue date May 20, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining lithographic matching performance
- Patent number 12,306,545
- Issue date May 20, 2025
- ASML Netherlands B.V.
- Yingchao Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250233382
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Takamitsu KOMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS
- Publication number 20250231494
- Publication date Jul 17, 2025
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...
- Publication number 20250234445
- Publication date Jul 17, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PHOTORESIST MODEL FOR GENERATI...
- Publication number 20250216798
- Publication date Jul 3, 2025
- Tencent Technology ( Shenzhen) Company Limited
- Xingyu MA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF USING LITHOGRAPHY APPARATUS
- Publication number 20250216795
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Ahyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...
- Publication number 20250208524
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Eva Linda MATHIEU
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
EXPOSURE EQUIPMENT
- Publication number 20250208519
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Jisu KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PULSE STRETCHER APPARATUS
- Publication number 20250208404
- Publication date Jun 26, 2025
- CYMER, LLC
- Thao Trieu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD...
- Publication number 20250208518
- Publication date Jun 26, 2025
- HUNAN UNIVERSITY
- Koichi MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...
- Publication number 20250201577
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Jiyeon YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF METROLOGY AND ASSOCIATED DEVICES
- Publication number 20250199419
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
- Publication number 20250199521
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...
- Publication number 20250199422
- Publication date Jun 19, 2025
- Carl Zeiss SMT GMBH
- Stefan LIPPOLDT
- G02 - OPTICS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20250202184
- Publication date Jun 19, 2025
- CYMER, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffraction-Based Illumination Sampling
- Publication number 20250198836
- Publication date Jun 19, 2025
- KLA Corporation
- Florian Melsheimer
- G02 - OPTICS
Information Patent Application
LEARNING CONTROL SYSTEM AND METHOD FOR ULTRA-PRECISION LITHOGRAPHIC...
- Publication number 20250199417
- Publication date Jun 19, 2025
- HARBIN INSTITUTE OF TECHNOLOGY
- Fazhi SONG
- G05 - CONTROLLING REGULATING
Information Patent Application
LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS
- Publication number 20250189881
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Ya LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20250181941
- Publication date Jun 5, 2025
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HIGH-CLEANLINESS RETICLE CLAMPING MODULE
- Publication number 20250181000
- Publication date Jun 5, 2025
- GUDENG EQUIPMENT CO., LTD.
- AN-PANG WANG
- G01 - MEASURING TESTING
Information Patent Application
LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250180933
- Publication date Jun 5, 2025
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...
- Publication number 20250174956
- Publication date May 29, 2025
- TRUMPF LASER GMBH
- Jonathan Brons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES
- Publication number 20250172886
- Publication date May 29, 2025
- CYMER, LLC
- Spencer Ryan Williams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20250172881
- Publication date May 29, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...
- Publication number 20250164894
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Sunghoon Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...
- Publication number 20250164893
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Steffen VAAS
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
In-Situ In-Band and Out-of-Band Spectral Measurement for EUV Tools
- Publication number 20250164895
- Publication date May 22, 2025
- KLA Corporation
- Rajeev Rajendran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES
- Publication number 20250164240
- Publication date May 22, 2025
- Corning Incorporated
- Thomas James Dunn
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF FORMING A PLANARIZATION LAYER INCLUDING EXPOSING AT DIFFE...
- Publication number 20250164896
- Publication date May 22, 2025
- Canon Kabushiki Kaisha
- Timothy Brian STACHOWIAK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMO...
- Publication number 20250164900
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20250155824
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G05 - CONTROLLING REGULATING

Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Apparatus for correcting photomask and method thereof

Methods and apparatus for controlling a lithographic process

Radiation source

Identification of hot spots or defects by machine learning

Dynamic generation of layout adaptive packaging

Maintenance of modules for light sources used in semiconductor phot...

Information processing apparatus and information processing method

Method and apparatus for determining feature contribution to perfor...

Gas laser apparatus and electronic device manufacturing method

Systems for cell control

Device and method for regulating and controlling incident angle of...

Method for thermo-mechanical control of a heat sensitive element an...

Methods and systems for reticle enhancement technology of a design...

Apparatus for and method of monitoring droplets in a droplet stream

Metrology for improving DUV laser alignment

Target control in extreme ultraviolet lithography systems using abe...

Lithographic patterning method and system therefore

Method for determining defectiveness of pattern based on after deve...

Optical component

Dose mapper method

Illumination apparatus and associated metrology and lithographic ap...

Method for applying a deposition model in a semiconductor manufactu...

System and method of generating a set of illumination patterns for...

Machine and deep learning methods for spectra-based metrology and p...

State monitoring method, state monitoring apparatus and state monit...

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Method and device for evaluating a statistically distributed measur...

Optical imaging method, device and system for photolithography system

Determining lithographic matching performance

Patents Applicationslast 30 patents

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

COMPREHENSIVE INSPECTION EQUIPMENT FOR EUV EXPOSURE PROCESS

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVIC...

METHOD AND APPARATUS FOR DETERMINING PHOTORESIST MODEL FOR GENERATI...

METHOD OF USING LITHOGRAPHY APPARATUS

HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE W...

EXPOSURE EQUIPMENT

OPTICAL PULSE STRETCHER APPARATUS

ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD...

METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...

METHODS OF METROLOGY AND ASSOCIATED DEVICES

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS

INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FO...

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

Diffraction-Based Illumination Sampling

LEARNING CONTROL SYSTEM AND METHOD FOR ULTRA-PRECISION LITHOGRAPHIC...

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

LASER SYSTEM AND METHOD FOR PROVIDING A PULSED LASER BEAM INTENDED...

STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

METHOD OF CORRECTING REGISTRATION ERRORS, METHOD OF MANUFACTURING M...

APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM...

In-Situ In-Band and Out-of-Band Spectral Measurement for EUV Tools

FLATNESS ERROR RESISTANT PHOTOMASK MEASUREMENT TECHNIQUES

METHOD OF FORMING A PLANARIZATION LAYER INCLUDING EXPOSING AT DIFFE...

SYSTEM AND METHOD FOR DYNAMICALLY CONTROLLING TEMPERATURE OF THERMO...

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS