Non-optical

Industry

CPC
G03F9/7053

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7053Non-optical

Industries

Patents Grantslast 30 patents

Information Patent Grant
Sensor apparatus for lithographic measurements
- Patent number 11,761,929
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Alessandro Polo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Current measurement system
- Patent number RE48901
- Issue date Jan 25, 2022
- ASML Netherlands B.V.
- Cor Verburg
Information Patent Grant
Distance sensor, alignment system and method
- Patent number 11,221,214
- Issue date Jan 11, 2022
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Hamed Sadeghian Marnani
- G01 - MEASURING TESTING
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 11,048,164
- Issue date Jun 29, 2021
- Molecular Imprints, Inc.
- Vikramjit Singh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Alignment measurement system
- Patent number 11,042,096
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Configuring optical layers in imprint lithography processes
- Patent number 10,747,107
- Issue date Aug 18, 2020
- Molecular Imprints, Inc.
- Vikramjit Singh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Current measurement system
- Patent number 9,644,995
- Issue date May 9, 2017
- Mapper Lithography IP B.V.
- Cor Verburg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask manufacturing method, mask substrate, and charged beam drawing...
- Patent number 9,581,893
- Issue date Feb 28, 2017
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active shield for capacitive measurement system
- Patent number 9,400,195
- Issue date Jul 26, 2016
- Mapper Lithography IP B.V.
- Cor Verburg
- G01 - MEASURING TESTING
Information Patent Grant
Gas gauge compatible with vacuum environments
- Patent number 9,222,847
- Issue date Dec 29, 2015
- ASML Holding N.V.
- Geoffrey Alan Schultz
- G01 - MEASURING TESTING
Information Patent Grant
Focus control apparatus for photolithography
- Patent number 9,110,386
- Issue date Aug 18, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Pan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electroactive polymers for lithography
- Patent number 8,872,135
- Issue date Oct 28, 2014
- The Invention Science Fund I, LLC
- Roderick A. Hyde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Capacitive sensing system
- Patent number 8,841,920
- Issue date Sep 23, 2014
- Mapper Lithography IP B.V.
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Grant
Focus control method for photolithography
- Patent number 8,772,054
- Issue date Jul 8, 2014
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Pan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas gauge compatible with vacuum environments
- Patent number 8,675,168
- Issue date Mar 18, 2014
- ASML Holding N.V.
- Geoffrey Alan Schultz
- G01 - MEASURING TESTING
Information Patent Grant
Capacitive sensing system with differential pairs
- Patent number 8,638,109
- Issue date Jan 28, 2014
- Mapper Lithography IP B.V.
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Grant
Lithography apparatus and device manufacturing method
- Patent number 8,618,515
- Issue date Dec 31, 2013
- Canon Kabushiki Kaisha
- Koichi Sentoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Capacitive sensing system
- Patent number 8,570,055
- Issue date Oct 29, 2013
- Mapper Lithography IP B.V.
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Grant
Integrated sensor system
- Patent number 8,513,959
- Issue date Aug 20, 2013
- Mapper Lithography IP B.V.
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Grant
Imprint device and imprint method
- Patent number 8,475,702
- Issue date Jul 2, 2013
- Kabushiki Kaisha Toshiba
- Yohko Furutono
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Flexural mechanism for passive angle alignment and locking
- Patent number 8,410,798
- Issue date Apr 2, 2013
- Massachusetts Institute of Technology
- Vijay Shilpiekandula
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High resolution flexural stage for in-plane position and out-of-pla...
- Patent number 8,390,233
- Issue date Mar 5, 2013
- Massachusetts Institute of Technology
- Vijay Shilpiekandula
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment method and method for manufacturing flat panel display
- Patent number 8,318,392
- Issue date Nov 27, 2012
- Panasonic Corporation
- Ryota Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate alignment
- Patent number 8,231,821
- Issue date Jul 31, 2012
- Molecular Imprints, Inc.
- Byung-Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure device
- Patent number 8,223,319
- Issue date Jul 17, 2012
- Ushio Denki Kabushiki Kaisha
- Yoshihiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electroactive polymers for lithography
- Patent number 8,076,227
- Issue date Dec 13, 2011
- The Invention Science Fund I, LLC
- Roderick A. Hyde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer active mask lithography
- Patent number 7,993,800
- Issue date Aug 9, 2011
- The Invention Science Fund I, LLC
- Roderick A. Hyde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer active mask lithography
- Patent number 7,993,801
- Issue date Aug 9, 2011
- The Invention Science Fund I, LLC
- Roderick A. Hyde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment for imprint lithography
- Patent number 7,943,080
- Issue date May 17, 2011
- ASML Netherlands B.V.
- Johan Frederik Dijksman
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, device manufacturing method and device manu...
- Patent number 7,940,392
- Issue date May 10, 2011
- ASML Netherlands B.V.
- Yim Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensor Apparatus for Lithographic Measurements
- Publication number 20210239654
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Alessandro POLO
- G01 - MEASURING TESTING
Information Patent Application
CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
- Publication number 20200348589
- Publication date Nov 5, 2020
- Molecular Imprints, Inc.
- Vikramjit Singh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Alignment Measurement System
- Publication number 20200142319
- Publication date May 7, 2020
- ASML Netherlands B.V.
- Stefan Michiel WITTE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISTANCE SENSOR, ALIGNMENT SYSTEM AND METHOD
- Publication number 20190178641
- Publication date Jun 13, 2019
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Hamed Sadeghian Marnani
- G01 - MEASURING TESTING
Information Patent Application
CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES
- Publication number 20180157170
- Publication date Jun 7, 2018
- Molecular Imprints, Inc.
- Vikramjit Singh
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
FOCUS CONTROL APPARATUS FOR PHOTOLITHOGRAPHY
- Publication number 20140293250
- Publication date Oct 2, 2014
- Jen-Pan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas Gauge Compatible With Vacuum Environments
- Publication number 20140096614
- Publication date Apr 10, 2014
- ASML Holding N.V.
- Geoffrey Alan SCHULTZ
- G01 - MEASURING TESTING
Information Patent Application
REGISTRATION SYSTEM FOR PHOTOTOOLS
- Publication number 20140099480
- Publication date Apr 10, 2014
- Charles Jonathan Kennett
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CAPACITIVE SENSING SYSTEM
- Publication number 20140049276
- Publication date Feb 20, 2014
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
FOCUS CONTROL METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20130065328
- Publication date Mar 14, 2013
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Pan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURRENT MEASUREMENT SYSTEM
- Publication number 20130009626
- Publication date Jan 10, 2013
- MAPPER LITHOGRAPHY IP BV
- COR VERBURG
- G01 - MEASURING TESTING
Information Patent Application
Active Shield for Capacitive Measurement System
- Publication number 20130003034
- Publication date Jan 3, 2013
- MAPPER LITHOGRAPHY IP BV
- COR VERBURG
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY
- Publication number 20120292820
- Publication date Nov 22, 2012
- NIL Technology ApS
- Kristian Smistrup
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METH...
- Publication number 20120268724
- Publication date Oct 25, 2012
- Guido De Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, AND A...
- Publication number 20120268725
- Publication date Oct 25, 2012
- Guido De Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY
- Publication number 20120015289
- Publication date Jan 19, 2012
- PANASONIC CORPORATION
- Ryota Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110310373
- Publication date Dec 22, 2011
- Canon Kabushiki Kaisha
- Koichi SENTOKU
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE METHOD
- Publication number 20110261344
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
CAPACITIVE SENSING SYSTEM WITH DIFFERENTIAL PAIRS
- Publication number 20110254565
- Publication date Oct 20, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Application
CAPACITIVE SENSING SYSTEM
- Publication number 20110193574
- Publication date Aug 11, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED SENSOR SYSTEM
- Publication number 20110193573
- Publication date Aug 11, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS OF FIELD-INDUCED PRESSURE IMPRINT LITHOGRAPHY
- Publication number 20110042861
- Publication date Feb 24, 2011
- Stephen Y. Chou
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
FLEXURAL MECHANISM FOR PASSIVE ANGLE ALIGNMENT AND LOCKING
- Publication number 20110037488
- Publication date Feb 17, 2011
- Vijay Shilpiekandula
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT DEVICE AND IMPRINT METHOD
- Publication number 20110018173
- Publication date Jan 27, 2011
- Yohko FURUTONO
- B82 - NANO-TECHNOLOGY
Information Patent Application
LEVELING DEVICES AND METHODS
- Publication number 20110014378
- Publication date Jan 20, 2011
- NanoInk, Inc.
- John Edward BUSSAN
- G01 - MEASURING TESTING
Information Patent Application
Gas Gauge Compatible With Vacuum Environments
- Publication number 20100309445
- Publication date Dec 9, 2010
- Geoffrey Alan Schultz
- G01 - MEASURING TESTING
Information Patent Application
RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY
- Publication number 20100233309
- Publication date Sep 16, 2010
- Stephen Y. Chou
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
HIGH RESOLUTION FLEXURAL STAGE FOR IN-PLANE POSITION AND OUT-OF-PLA...
- Publication number 20100116161
- Publication date May 13, 2010
- Vijay Shilpiekandula
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20100118290
- Publication date May 13, 2010
- Ushio Denki Kabushiki Kaisha
- Yoshihiko SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Non-optical

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sensor apparatus for lithographic measurements

Current measurement system

Distance sensor, alignment system and method

Configuring optical layers in imprint lithography processes

Alignment measurement system

Configuring optical layers in imprint lithography processes

Current measurement system

Mask manufacturing method, mask substrate, and charged beam drawing...

Active shield for capacitive measurement system

Gas gauge compatible with vacuum environments

Focus control apparatus for photolithography

Electroactive polymers for lithography

Capacitive sensing system

Focus control method for photolithography

Gas gauge compatible with vacuum environments

Capacitive sensing system with differential pairs

Lithography apparatus and device manufacturing method

Capacitive sensing system

Integrated sensor system

Imprint device and imprint method

Flexural mechanism for passive angle alignment and locking

High resolution flexural stage for in-plane position and out-of-pla...

Alignment method and method for manufacturing flat panel display

Substrate alignment

Exposure device

Electroactive polymers for lithography

Multilayer active mask lithography

Multilayer active mask lithography

Alignment for imprint lithography

Lithographic apparatus, device manufacturing method and device manu...

Patents Applicationslast 30 patents

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

Sensor Apparatus for Lithographic Measurements

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

Alignment Measurement System

DISTANCE SENSOR, ALIGNMENT SYSTEM AND METHOD

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

FOCUS CONTROL APPARATUS FOR PHOTOLITHOGRAPHY

Gas Gauge Compatible With Vacuum Environments

REGISTRATION SYSTEM FOR PHOTOTOOLS

CAPACITIVE SENSING SYSTEM

FOCUS CONTROL METHOD FOR PHOTOLITHOGRAPHY

CURRENT MEASUREMENT SYSTEM

Active Shield for Capacitive Measurement System

METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY

LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METH...

LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, AND A...

ALIGNMENT METHOD AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY

LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE METHOD

CAPACITIVE SENSING SYSTEM WITH DIFFERENTIAL PAIRS

CAPACITIVE SENSING SYSTEM

INTEGRATED SENSOR SYSTEM

METHODS AND APPARATUS OF FIELD-INDUCED PRESSURE IMPRINT LITHOGRAPHY

FLEXURAL MECHANISM FOR PASSIVE ANGLE ALIGNMENT AND LOCKING

IMPRINT DEVICE AND IMPRINT METHOD

LEVELING DEVICES AND METHODS

Gas Gauge Compatible With Vacuum Environments

RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY

HIGH RESOLUTION FLEXURAL STAGE FOR IN-PLANE POSITION AND OUT-OF-PLA...

EXPOSURE DEVICE